DE68911659D1 - Verfahren zur Dünnschichtdickenmessung. - Google Patents

Verfahren zur Dünnschichtdickenmessung.

Info

Publication number
DE68911659D1
DE68911659D1 DE89202969T DE68911659T DE68911659D1 DE 68911659 D1 DE68911659 D1 DE 68911659D1 DE 89202969 T DE89202969 T DE 89202969T DE 68911659 T DE68911659 T DE 68911659T DE 68911659 D1 DE68911659 D1 DE 68911659D1
Authority
DE
Germany
Prior art keywords
coating
thickness
beams
polarized light
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE89202969T
Other languages
English (en)
Other versions
DE68911659T2 (de
Inventor
Jonge Marinus Willem Cornel De
Tamis Lambertus Maria Ir Leek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tata Steel Ijmuiden BV
Original Assignee
Hoogovens Groep BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoogovens Groep BV filed Critical Hoogovens Groep BV
Publication of DE68911659D1 publication Critical patent/DE68911659D1/de
Application granted granted Critical
Publication of DE68911659T2 publication Critical patent/DE68911659T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Insulated Conductors (AREA)
  • Organic Insulating Materials (AREA)
  • Magnetic Heads (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE89202969T 1988-11-28 1989-11-23 Verfahren zur Dünnschichtdickenmessung. Expired - Fee Related DE68911659T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8802920A NL8802920A (nl) 1988-11-28 1988-11-28 Laagdiktemeter.

Publications (2)

Publication Number Publication Date
DE68911659D1 true DE68911659D1 (de) 1994-02-03
DE68911659T2 DE68911659T2 (de) 1994-05-05

Family

ID=19853294

Family Applications (1)

Application Number Title Priority Date Filing Date
DE89202969T Expired - Fee Related DE68911659T2 (de) 1988-11-28 1989-11-23 Verfahren zur Dünnschichtdickenmessung.

Country Status (11)

Country Link
US (1) US5170049A (de)
EP (1) EP0371550B1 (de)
JP (1) JPH0678892B2 (de)
AT (1) ATE99046T1 (de)
AU (1) AU629265B2 (de)
CA (1) CA2003983C (de)
DE (1) DE68911659T2 (de)
ES (1) ES2047108T3 (de)
MX (1) MX172398B (de)
NL (1) NL8802920A (de)
TR (1) TR26149A (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5243185A (en) * 1992-07-31 1993-09-07 Loral Aerospace Corp. Apparatus and method for ice detection
ES2076083B1 (es) * 1993-06-04 1996-06-01 Fuesca Sl Aparato y metodo de medida y control de la densidad de reticulacion de los tratamientos en caliente y frio del vidrio aligerado.
US5650610A (en) * 1995-03-15 1997-07-22 National Research Council Of Canada Apparatus and method for remote detection of ice or other birefringent material on a surface
US5557399A (en) * 1995-03-22 1996-09-17 Zygo Corporation Optical gap measuring apparatus and method
CN1131741A (zh) * 1995-03-22 1996-09-25 载歌公司 光学间隙测量装置和方法
US5953125A (en) * 1995-09-01 1999-09-14 Zygo Corporation Optical gap measuring apparatus and method
US6483580B1 (en) 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
JP3893868B2 (ja) * 2000-10-11 2007-03-14 東京エレクトロン株式会社 電界効果トランジスタの製造方法、並びに、半導体デバイスの製造方法及びその装置
US6908774B2 (en) * 2002-08-12 2005-06-21 S.O. I. Tec Silicon On Insulator Technologies S.A. Method and apparatus for adjusting the thickness of a thin layer of semiconductor material
EP1619465A1 (de) * 2004-07-19 2006-01-25 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Vorrichtung und Verfahren zur optischen Überwachung von Schichten
US7515253B2 (en) * 2005-01-12 2009-04-07 Kla-Tencor Technologies Corporation System for measuring a sample with a layer containing a periodic diffracting structure
US7370525B1 (en) 2006-10-31 2008-05-13 Swan International Sensors Pty. Ltd. Inflight ice detection system
AT504136B1 (de) * 2006-12-29 2008-03-15 Univ Linz Verfahren zur bestimmung der dicke einer metallisierungsschicht auf einer polymerfolie
CN100470193C (zh) * 2007-06-08 2009-03-18 中国科学院上海光学精密机械研究所 石英波片厚度的测量装置和测量方法
US20090002686A1 (en) * 2007-06-29 2009-01-01 The Material Works, Ltd. Sheet Metal Oxide Detector
DE102008021199A1 (de) 2008-04-28 2009-10-29 Focke & Co.(Gmbh & Co. Kg) Verfahren und Vorrichtung zum Prüfen von mit Folie umwickelten Zigarettenpackungen
JP2012032239A (ja) * 2010-07-29 2012-02-16 Horiba Ltd 試料検査装置及び試料検査方法
ES2808550T3 (es) * 2013-03-15 2021-03-01 Sensory Analytics Método y sistema para la medición en tiempo real durante el proceso del espesor de recubrimiento
JP6355066B2 (ja) * 2013-08-29 2018-07-11 株式会社リコー センサ装置及び画像形成装置
EP3714231B1 (de) * 2017-11-24 2024-07-03 ABB Schweiz AG System und verfahren zur charakterisierung einer beschichtung wie einem lackfilm und lackierungsanlage mit solch einem system
CN113155040B (zh) * 2021-03-04 2023-02-28 上海精测半导体技术有限公司 一种探测反射光束角度变化的装置、方法及膜厚测量装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3426201A (en) * 1965-10-12 1969-02-04 Texas Instruments Inc Method and apparatus for measuring the thickness of films by means of elliptical polarization of reflected infrared radiation
US3906844A (en) * 1974-05-28 1975-09-23 Int Envelope Limited Method and apparatus for producing envelopes having a closure flap
US3908508A (en) * 1974-09-23 1975-09-30 Modulus Corp Strain indicator
JPS51129279A (en) * 1975-05-02 1976-11-10 Nippon Kogaku Kk <Nikon> Polarizing analyzer
EP0075689A1 (de) * 1981-09-28 1983-04-06 International Business Machines Corporation Optische Geräte zur Beobachtung einer Probenoberfläche
US4585348A (en) * 1981-09-28 1986-04-29 International Business Machines Corporation Ultra-fast photometric instrument
US4850711A (en) * 1986-06-13 1989-07-25 Nippon Kokan Kabushiki Kaisha Film thickness-measuring apparatus using linearly polarized light

Also Published As

Publication number Publication date
AU629265B2 (en) 1992-10-01
TR26149A (tr) 1994-01-14
JPH0678892B2 (ja) 1994-10-05
CA2003983C (en) 1993-12-14
EP0371550A1 (de) 1990-06-06
DE68911659T2 (de) 1994-05-05
JPH02263105A (ja) 1990-10-25
ES2047108T3 (es) 1994-02-16
EP0371550B1 (de) 1993-12-22
US5170049A (en) 1992-12-08
CA2003983A1 (en) 1990-05-28
NL8802920A (nl) 1990-06-18
ATE99046T1 (de) 1994-01-15
MX172398B (es) 1993-12-15
AU4563689A (en) 1990-05-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee