NL8500638A - Werkwijze en inrichting voor het reinigen van vormen door omgekeerd sputteren. - Google Patents
Werkwijze en inrichting voor het reinigen van vormen door omgekeerd sputteren. Download PDFInfo
- Publication number
- NL8500638A NL8500638A NL8500638A NL8500638A NL8500638A NL 8500638 A NL8500638 A NL 8500638A NL 8500638 A NL8500638 A NL 8500638A NL 8500638 A NL8500638 A NL 8500638A NL 8500638 A NL8500638 A NL 8500638A
- Authority
- NL
- Netherlands
- Prior art keywords
- mold
- cleaned
- vacuum chamber
- cathode
- anode
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/70—Maintenance
- B29C33/72—Cleaning
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/586,853 US4534921A (en) | 1984-03-06 | 1984-03-06 | Method and apparatus for mold cleaning by reverse sputtering |
US58685384 | 1984-03-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL8500638A true NL8500638A (nl) | 1985-10-01 |
Family
ID=24347355
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL8500638A NL8500638A (nl) | 1984-03-06 | 1985-03-06 | Werkwijze en inrichting voor het reinigen van vormen door omgekeerd sputteren. |
Country Status (6)
Country | Link |
---|---|
US (1) | US4534921A (de) |
JP (1) | JPS616285A (de) |
DE (1) | DE3508004A1 (de) |
FR (1) | FR2578482A1 (de) |
GB (1) | GB2155844B (de) |
NL (1) | NL8500638A (de) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH067542B2 (ja) * | 1984-11-22 | 1994-01-26 | 株式会社日立製作所 | 製造装置 |
US4934920A (en) * | 1987-06-17 | 1990-06-19 | Mitsubishi Denki Kabushiki Kaisha | Apparatus for producing semiconductor device |
JPH01144636A (ja) * | 1987-11-17 | 1989-06-06 | Mitsubishi Electric Corp | 半導体製造装置 |
AT388884B (de) * | 1988-02-05 | 1989-09-11 | Miba Gleitlager Ag | Verfahren zum reinigen eines metallischen werkstueckes mit oberflaechenteilen aus verschiedenem werkstoff durch ionenbeschuss aus einer gasentladung |
US4946518A (en) * | 1989-03-14 | 1990-08-07 | Motorola, Inc. | Method for improving the adhesion of a plastic encapsulant to copper containing leadframes |
US4877482A (en) * | 1989-03-23 | 1989-10-31 | Motorola Inc. | Nitride removal method |
US4896813A (en) * | 1989-04-03 | 1990-01-30 | Toyo Kohan Co., Ltd. | Method and apparatus for cold rolling clad sheet |
US5075256A (en) * | 1989-08-25 | 1991-12-24 | Applied Materials, Inc. | Process for removing deposits from backside and end edge of semiconductor wafer while preventing removal of materials from front surface of wafer |
US5213650A (en) * | 1989-08-25 | 1993-05-25 | Applied Materials, Inc. | Apparatus for removing deposits from backside and end edge of semiconductor wafer while preventing removal of materials from front surface of wafer |
DE69020553T2 (de) * | 1990-07-24 | 1995-12-21 | Inst Elektroniki Im U A Arifov | Elektrische Lichtbogenbehandlung von Teilchen. |
AU639469B2 (en) * | 1990-07-26 | 1993-07-29 | Institut Elektroniki Imeni U.A.Arifova Akademii Nauk Uzbexkoi Ssr | Method and apparatuses for electric arc treatment of parts |
US5462771A (en) * | 1992-11-09 | 1995-10-31 | Akira Motoki | Method of manufacturing electromagnetic wave shielding plastic molding |
US5373140A (en) * | 1993-03-16 | 1994-12-13 | Vernay Laboratories, Inc. | System for cleaning molding equipment using a laser |
JPH06285868A (ja) * | 1993-03-30 | 1994-10-11 | Bridgestone Corp | 加硫金型の清浄方法 |
DE4427259A1 (de) * | 1994-07-30 | 1996-02-01 | Mtu Muenchen Gmbh | Verfahren und Vorrichtung zur Reinigung oder Vorwärmung von Bauteiloberflächen |
DE19549487C2 (de) * | 1995-01-05 | 2000-11-16 | Steag Micro Tech Gmbh | Anlage zur chemischen Naßbehandlung |
JPH0957757A (ja) * | 1995-03-27 | 1997-03-04 | Toyoda Gosei Co Ltd | 成形品及びその製造方法並びに成形用金型装置 |
US5769953A (en) * | 1995-05-01 | 1998-06-23 | Bridgestone Corporation | Plasma and heating method of cleaning vulcanizing mold for ashing residue |
IL114097A (en) * | 1995-06-11 | 2000-08-13 | Sizary Mat Purification Ltd | Cleaning system and method |
JPH09123206A (ja) * | 1995-10-30 | 1997-05-13 | Towa Kk | 電子部品の樹脂封止成形装置 |
ES2164947T3 (es) * | 1996-02-15 | 2002-03-01 | Bridgestone Corp | Metodo para limpiar un molde de vulcanizacion. |
GB9603295D0 (en) * | 1996-02-16 | 1996-04-17 | Boc Group Plc | Process and apparatus for surface cleaning |
KR0174982B1 (ko) * | 1996-02-23 | 1999-02-01 | 김광호 | 프리히팅을 이용한 타블렛 먼지 제거 장치 및 제거방법 |
EP0883162A3 (de) | 1997-06-05 | 2001-04-18 | Sizary Limited | Reinigungsvorrichtung für Halbleiterscheibe |
AU3052099A (en) * | 1998-03-30 | 1999-10-18 | Sizary Ltd. | Semiconductor purification apparatus and method |
JP4627916B2 (ja) * | 2001-03-29 | 2011-02-09 | キヤノンアネルバ株式会社 | イオン化装置 |
DE10254762A1 (de) * | 2002-11-22 | 2004-06-09 | Transcoject Gesellschaft für medizinische Geräte mbH & Co. KG | Verfahren zur Herstellung und/oder Handhabung eines hochreinen Gegenstandes |
US7635418B2 (en) * | 2004-12-03 | 2009-12-22 | Nordson Corporation | Plasma processing apparatus and methods for removing extraneous material from selected areas on a substrate |
US20060201910A1 (en) * | 2004-12-22 | 2006-09-14 | Nordson Corporation | Methods for removing extraneous amounts of molding material from a substrate |
US20080057528A1 (en) * | 2006-08-30 | 2008-03-06 | Kimberly-Clark Worldwide, Inc. | Detection of hydrogen peroxide released by enzyme-catalyzed oxidation of an analyte |
JP5137635B2 (ja) * | 2007-03-16 | 2013-02-06 | キヤノン株式会社 | インプリント方法、チップの製造方法及びインプリント装置 |
MY151567A (en) * | 2008-01-25 | 2014-06-13 | Novartis Ag | Apparatus, carrier and method for the plasma treatment of molds |
US20130255717A1 (en) * | 2012-04-03 | 2013-10-03 | Kla-Tencor Corporation | System and method for cleaning surfaces and components of mask and wafer inspection systems based on the positive column of a glow discharge plasma |
RU2726051C1 (ru) * | 2019-12-16 | 2020-07-08 | федеральное государственное бюджетное образовательное учреждение высшего образования "Волгоградский государственный аграрный университет" (ФГБОУ ВО Волгоградский ГАУ) | Способ упрочнения лезвий рабочих органов орудий для разработки почвогрунтов |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3233137A (en) * | 1961-08-28 | 1966-02-01 | Litton Systems Inc | Method and apparatus for cleansing by ionic bombardment |
US3669861A (en) * | 1967-08-28 | 1972-06-13 | Texas Instruments Inc | R. f. discharge cleaning to improve adhesion |
US3654108A (en) * | 1969-09-23 | 1972-04-04 | Air Reduction | Method for glow cleaning |
US3968018A (en) * | 1969-09-29 | 1976-07-06 | Warner-Lambert Company | Sputter coating method |
US3776762A (en) * | 1971-10-18 | 1973-12-04 | Kote Corp Du | Dry lubrication |
JPS5010232A (de) * | 1973-06-01 | 1975-02-01 | ||
FR2237311B1 (de) * | 1973-07-12 | 1977-05-13 | Ibm France | |
DE2647088B2 (de) * | 1976-10-19 | 1979-04-05 | Kernforschungsanlage Juelich Gmbh, 5170 Juelich | Verfahren und Vorrichtung zum Reinigen von Oberflächen |
US4126530A (en) * | 1977-08-04 | 1978-11-21 | Telic Corporation | Method and apparatus for sputter cleaning and bias sputtering |
US4313815A (en) * | 1978-04-07 | 1982-02-02 | Varian Associates, Inc. | Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor |
US4278493A (en) * | 1980-04-28 | 1981-07-14 | International Business Machines Corporation | Method for cleaning surfaces by ion milling |
JPS6053752B2 (ja) * | 1980-09-19 | 1985-11-27 | 日本真空技術株式会社 | プラズマクリ−ニング装置 |
GB2104827B (en) * | 1981-07-01 | 1985-09-11 | Kras Corp | Molding of electronic components |
GB2108533A (en) * | 1981-10-30 | 1983-05-18 | British Steel Corp | Ion plating |
JPS58193370A (ja) * | 1982-05-06 | 1983-11-11 | Toshiba Corp | 表面処理方法及びその適用方法 |
-
1984
- 1984-03-06 US US06/586,853 patent/US4534921A/en not_active Expired - Lifetime
-
1985
- 1985-03-05 GB GB08505653A patent/GB2155844B/en not_active Expired
- 1985-03-06 DE DE19853508004 patent/DE3508004A1/de not_active Withdrawn
- 1985-03-06 NL NL8500638A patent/NL8500638A/nl not_active Application Discontinuation
- 1985-03-06 FR FR8503979A patent/FR2578482A1/fr active Pending
- 1985-03-06 JP JP60044518A patent/JPS616285A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
US4534921A (en) | 1985-08-13 |
FR2578482A1 (fr) | 1986-09-12 |
GB2155844A (en) | 1985-10-02 |
GB8505653D0 (en) | 1985-04-03 |
GB2155844B (en) | 1987-12-02 |
JPS616285A (ja) | 1986-01-11 |
DE3508004A1 (de) | 1986-07-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
NL8500638A (nl) | Werkwijze en inrichting voor het reinigen van vormen door omgekeerd sputteren. | |
JP2568371B2 (ja) | 真空チャンバ用の新規な蓋および扉、並びにそれに対する前処理 | |
KR100321352B1 (ko) | 납땜또는주석도금전의금속표면에건식플럭스를도포하는방법및장치 | |
KR102035585B1 (ko) | 플라즈마 처리 방법 | |
JP4950201B2 (ja) | 移動式金型洗浄装置及び金型洗浄方法 | |
MX2012008943A (es) | Aparato y metodo para la remocion de oxidos superficiales por la via de la tecnica sin fundente que involucra la union de electrones. | |
US4781804A (en) | Electrolytic organic mold flash removal | |
NL8500637A (nl) | Werkwijze en inrichting voor het reinigen van geleiderpennen en dergelijke voor soldeerhandelingen. | |
JPH07180091A (ja) | アルミニウム板、その製造方法及び該アルミニウム板を用いた防着カバー | |
JPH07211489A (ja) | マイクロ波プラズマ処理装置及び該装置のクリーニング方法 | |
EP1477188A1 (de) | Verfahren zur Reinigung und zur bakteriellen Dekontaminierung von mechanischen, medizinischen Teilen, und Vorrichtung hierzu | |
TW200930158A (en) | Jet plasma gun and plasma device using the same | |
RU2139151C1 (ru) | Способ очистки металлических поверхностей и устройство для его осуществления | |
JPS6233761A (ja) | 真空容器内壁の清浄装置 | |
JPH02250325A (ja) | プラズマ処理装置 | |
JPH02148647A (ja) | イオン注入装置のイオンソース洗浄治具及び洗浄方法 | |
JPS62217548A (ja) | イオン注入装置 | |
RU2026417C1 (ru) | Устройство для вакуумно-плазменного нанесения неэлектропроводящих покрытий на изделия в среде рабочего газа | |
JPH03292730A (ja) | プラズマ処理装置 | |
JP3997388B2 (ja) | 半導体装置の製造方法 | |
KR0137972Y1 (ko) | 플라즈마 화학기상 증착 장비의 컴플리트 보트 | |
JPH04315797A (ja) | プラズマ処理装置およびそのプラズマ源のクリーニング方法 | |
CN118176567A (zh) | 等离子处理方法 | |
KR100741916B1 (ko) | 플라즈마 처리장치 및 그 세정방법 | |
CN115007522A (zh) | 一种表面清洗氧化方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A1A | A request for search or an international-type search has been filed | ||
BB | A search report has been drawn up | ||
BV | The patent application has lapsed |