NL8200908A - Bad voor de galvanische afscheiding van een palladium-nikkellegering. - Google Patents
Bad voor de galvanische afscheiding van een palladium-nikkellegering. Download PDFInfo
- Publication number
- NL8200908A NL8200908A NL8200908A NL8200908A NL8200908A NL 8200908 A NL8200908 A NL 8200908A NL 8200908 A NL8200908 A NL 8200908A NL 8200908 A NL8200908 A NL 8200908A NL 8200908 A NL8200908 A NL 8200908A
- Authority
- NL
- Netherlands
- Prior art keywords
- palladium
- nickel
- sodium
- bath
- addition
- Prior art date
Links
- 229910000990 Ni alloy Inorganic materials 0.000 title claims description 4
- 238000000926 separation method Methods 0.000 title description 5
- BSIDXUHWUKTRQL-UHFFFAOYSA-N nickel palladium Chemical compound [Ni].[Pd] BSIDXUHWUKTRQL-UHFFFAOYSA-N 0.000 title 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 31
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 27
- 229910052759 nickel Inorganic materials 0.000 claims description 15
- 229910052763 palladium Inorganic materials 0.000 claims description 12
- 238000000576 coating method Methods 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 6
- -1 nickel amines Chemical class 0.000 claims description 6
- JHUFGBSGINLPOW-UHFFFAOYSA-N 3-chloro-4-(trifluoromethoxy)benzoyl cyanide Chemical compound FC(F)(F)OC1=CC=C(C(=O)C#N)C=C1Cl JHUFGBSGINLPOW-UHFFFAOYSA-N 0.000 claims description 5
- 239000007864 aqueous solution Substances 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 3
- 150000003460 sulfonic acids Chemical class 0.000 claims description 3
- 229910001252 Pd alloy Inorganic materials 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- SZHIIIPPJJXYRY-UHFFFAOYSA-M sodium;2-methylprop-2-ene-1-sulfonate Chemical compound [Na+].CC(=C)CS([O-])(=O)=O SZHIIIPPJJXYRY-UHFFFAOYSA-M 0.000 claims description 2
- NPAWNPCNZAPTKA-UHFFFAOYSA-M sodium;propane-1-sulfonate Chemical compound [Na+].CCCS([O-])(=O)=O NPAWNPCNZAPTKA-UHFFFAOYSA-M 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 2
- 229940117986 sulfobetaine Drugs 0.000 claims 2
- PSBDWGZCVUAZQS-UHFFFAOYSA-N (dimethylsulfonio)acetate Chemical compound C[S+](C)CC([O-])=O PSBDWGZCVUAZQS-UHFFFAOYSA-N 0.000 claims 1
- UXJWUQMJUKSBSL-UHFFFAOYSA-M CCS([O-])(=O)=O.C(C1=CC=CC=C1)[N+]1=CC=CC=C1 Chemical compound CCS([O-])(=O)=O.C(C1=CC=CC=C1)[N+]1=CC=CC=C1 UXJWUQMJUKSBSL-UHFFFAOYSA-M 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- BWYYYTVSBPRQCN-UHFFFAOYSA-M sodium;ethenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C=C BWYYYTVSBPRQCN-UHFFFAOYSA-M 0.000 claims 1
- 239000003792 electrolyte Substances 0.000 description 7
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 229910017604 nitric acid Inorganic materials 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- 230000005764 inhibitory process Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XTEGVFVZDVNBPF-UHFFFAOYSA-N naphthalene-1,5-disulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1S(O)(=O)=O XTEGVFVZDVNBPF-UHFFFAOYSA-N 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- ZMPRRFPMMJQXPP-UHFFFAOYSA-N 2-sulfobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1S(O)(=O)=O ZMPRRFPMMJQXPP-UHFFFAOYSA-N 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- VCYZOXFKCVQATA-UHFFFAOYSA-L disodium ethenesulfonate Chemical compound [Na+].C(=C)S(=O)(=O)[O-].[Na+].C(=C)S(=O)(=O)[O-] VCYZOXFKCVQATA-UHFFFAOYSA-L 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- ZPBSAMLXSQCSOX-UHFFFAOYSA-N naphthalene-1,3,6-trisulfonic acid Chemical compound OS(=O)(=O)C1=CC(S(O)(=O)=O)=CC2=CC(S(=O)(=O)O)=CC=C21 ZPBSAMLXSQCSOX-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- MRGUSFYIQDLKNZ-UHFFFAOYSA-M sodium;prop-1-yne-1-sulfonate Chemical compound [Na+].CC#CS([O-])(=O)=O MRGUSFYIQDLKNZ-UHFFFAOYSA-M 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
- NJPKYOIXTSGVAN-UHFFFAOYSA-K trisodium;naphthalene-1,3,6-trisulfonate Chemical compound [Na+].[Na+].[Na+].[O-]S(=O)(=O)C1=CC(S([O-])(=O)=O)=CC2=CC(S(=O)(=O)[O-])=CC=C21 NJPKYOIXTSGVAN-UHFFFAOYSA-K 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3108508A DE3108508C2 (de) | 1981-03-06 | 1981-03-06 | Bad zur galvanischen Abscheidung einer Palladium/Nickel-Legierung |
| DE3108508 | 1981-03-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8200908A true NL8200908A (nl) | 1982-10-01 |
Family
ID=6126504
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8200908A NL8200908A (nl) | 1981-03-06 | 1982-03-05 | Bad voor de galvanische afscheiding van een palladium-nikkellegering. |
Country Status (14)
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3443420A1 (de) * | 1984-11-26 | 1986-05-28 | Siemens AG, 1000 Berlin und 8000 München | Galvanisches bad zur schnellabscheidung von palladium-legierungen |
| US4628165A (en) * | 1985-09-11 | 1986-12-09 | Learonal, Inc. | Electrical contacts and methods of making contacts by electrodeposition |
| DE3809139A1 (de) * | 1988-03-18 | 1989-09-28 | Lpw Chemie Gmbh | Verwendung einer palladium/nickel-legierungsschicht als zwischenschicht zwischen einem nichtkorrosionsbestaendigen oder wenig korrosionsbestaendigen metallischen grundmaterial und einer nach dem pvd-verfahren aufgebrachten beschichtung |
| GB2242200B (en) * | 1990-02-20 | 1993-11-17 | Omi International | Plating compositions and processes |
| US5415685A (en) * | 1993-08-16 | 1995-05-16 | Enthone-Omi Inc. | Electroplating bath and process for white palladium |
| EP0916747B1 (de) * | 1997-11-15 | 2002-10-16 | AMI Doduco GmbH | Elektrolytisches Bad zum Abscheiden von Palladium und von Legierungen des Palladiums |
| CN113699565B (zh) * | 2021-09-28 | 2023-07-04 | 万明电镀智能科技(东莞)有限公司 | 高耐蚀性钯镍合金镀层及其电镀方法和钯镍镀层电镀液 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2328243A (en) * | 1941-04-28 | 1943-08-31 | Posture Res Corp | Chair |
| US2800442A (en) * | 1955-10-04 | 1957-07-23 | Udylite Res Corp | Electrodeposition of nickel |
| JPS4733176B1 (enrdf_load_stackoverflow) * | 1967-01-11 | 1972-08-23 | ||
| US3730854A (en) * | 1971-10-29 | 1973-05-01 | Basf Ag | Stabilized aqueous solutions of unsaturated aliphatic sulfonic acids or salts thereof |
| CH572989A5 (enrdf_load_stackoverflow) * | 1973-04-27 | 1976-02-27 | Oxy Metal Industries Corp | |
| GB1553503A (en) * | 1976-05-14 | 1979-09-26 | Oxy Metal Industries Corp | Electrodeposition of bright nickel-iron deposits |
| FR2364980A1 (fr) * | 1976-09-17 | 1978-04-14 | Parker Ste Continentale | Bain et procede pour le depot electrolytique d'alliages a base de palladium |
| DE2825966A1 (de) * | 1978-06-14 | 1980-01-03 | Basf Ag | Saures galvanisches nickelbad, das sulfobetaine als glanz- und einebnungsmittel enthaelt |
-
1981
- 1981-03-06 DE DE3108508A patent/DE3108508C2/de not_active Expired
-
1982
- 1982-02-18 GB GB8204857A patent/GB2094836B/en not_active Expired
- 1982-02-26 CH CH1184/82A patent/CH649318A5/de not_active IP Right Cessation
- 1982-03-02 AU AU81049/82A patent/AU535531B2/en not_active Ceased
- 1982-03-02 ZA ZA821367A patent/ZA821367B/xx unknown
- 1982-03-03 JP JP57032483A patent/JPS5816089A/ja active Granted
- 1982-03-03 AT AT0082182A patent/AT377013B/de not_active IP Right Cessation
- 1982-03-03 SE SE8201299A patent/SE8201299L/ not_active Application Discontinuation
- 1982-03-03 BE BE2/59611A patent/BE892344A/fr not_active IP Right Cessation
- 1982-03-04 FR FR8203613A patent/FR2501243B1/fr not_active Expired
- 1982-03-05 IT IT19992/82A patent/IT1150627B/it active
- 1982-03-05 BR BR8201157A patent/BR8201157A/pt unknown
- 1982-03-05 CA CA000397678A patent/CA1176204A/en not_active Expired
- 1982-03-05 NL NL8200908A patent/NL8200908A/nl not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5816089A (ja) | 1983-01-29 |
| ZA821367B (en) | 1983-01-26 |
| AT377013B (de) | 1985-01-25 |
| JPS6112038B2 (enrdf_load_stackoverflow) | 1986-04-05 |
| CA1176204A (en) | 1984-10-16 |
| BE892344A (fr) | 1982-07-01 |
| BR8201157A (pt) | 1982-11-23 |
| DE3108508C2 (de) | 1983-06-30 |
| IT1150627B (it) | 1986-12-17 |
| CH649318A5 (de) | 1985-05-15 |
| FR2501243B1 (fr) | 1988-05-27 |
| FR2501243A1 (fr) | 1982-09-10 |
| GB2094836A (en) | 1982-09-22 |
| DE3108508A1 (de) | 1982-09-16 |
| AU535531B2 (en) | 1984-03-29 |
| GB2094836B (en) | 1984-12-05 |
| ATA82182A (de) | 1984-06-15 |
| IT8219992A0 (it) | 1982-03-05 |
| AU8104982A (en) | 1982-09-09 |
| SE8201299L (sv) | 1982-09-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A1A | A request for search or an international-type search has been filed | ||
| BB | A search report has been drawn up | ||
| BC | A request for examination has been filed | ||
| A85 | Still pending on 85-01-01 | ||
| BV | The patent application has lapsed |