NL8000586A - Elektrolytisch bekledingsbad en werkwijze voor het vervaardigen van glanzende, zeer effen elektrolytische nikkel-ijzerafzettingen. - Google Patents

Elektrolytisch bekledingsbad en werkwijze voor het vervaardigen van glanzende, zeer effen elektrolytische nikkel-ijzerafzettingen. Download PDF

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Publication number
NL8000586A
NL8000586A NL8000586A NL8000586A NL8000586A NL 8000586 A NL8000586 A NL 8000586A NL 8000586 A NL8000586 A NL 8000586A NL 8000586 A NL8000586 A NL 8000586A NL 8000586 A NL8000586 A NL 8000586A
Authority
NL
Netherlands
Prior art keywords
bath
nickel
iron
bath according
present
Prior art date
Application number
NL8000586A
Other languages
English (en)
Dutch (nl)
Original Assignee
Oxy Metal Industries Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oxy Metal Industries Corp filed Critical Oxy Metal Industries Corp
Publication of NL8000586A publication Critical patent/NL8000586A/nl

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
NL8000586A 1979-02-12 1980-01-30 Elektrolytisch bekledingsbad en werkwijze voor het vervaardigen van glanzende, zeer effen elektrolytische nikkel-ijzerafzettingen. NL8000586A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/011,270 US4179343A (en) 1979-02-12 1979-02-12 Electroplating bath and process for producing bright, high-leveling nickel iron electrodeposits
US1127079 1979-02-12

Publications (1)

Publication Number Publication Date
NL8000586A true NL8000586A (nl) 1980-08-14

Family

ID=21749624

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8000586A NL8000586A (nl) 1979-02-12 1980-01-30 Elektrolytisch bekledingsbad en werkwijze voor het vervaardigen van glanzende, zeer effen elektrolytische nikkel-ijzerafzettingen.

Country Status (16)

Country Link
US (1) US4179343A (it)
JP (1) JPS55107794A (it)
AR (1) AR226050A1 (it)
AU (1) AU527988B2 (it)
BR (1) BR8000825A (it)
CA (1) CA1149323A (it)
DE (1) DE3001879C2 (it)
ES (1) ES8101655A1 (it)
FR (1) FR2448584A1 (it)
GB (1) GB2043693B (it)
HK (1) HK66286A (it)
IT (1) IT1128088B (it)
MX (1) MX153319A (it)
NL (1) NL8000586A (it)
SE (1) SE8000645L (it)
ZA (1) ZA80199B (it)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3137478A1 (de) * 1981-09-21 1983-04-07 Siemens AG, 1000 Berlin und 8000 München Galvanisches bad zur erzeugung gleichmaessiger fe-haltiger schichten und strukturen mit sehr guten magnetischen eigenschaften
DE3347593A1 (de) * 1983-01-03 1984-07-05 Omi International Corp., Warren, Mich. Waessriger alkalischer cyanidfreier kupferelektrolyt und verfahren zur galvanischen abscheidung einer kornverfeinerten duktilen und haftfesten kupferschicht auf einem leitfaehigen substrat
US4462874A (en) * 1983-11-16 1984-07-31 Omi International Corporation Cyanide-free copper plating process
GB2175922B (en) * 1985-07-03 1989-07-05 Inst Phisikochimia Nickel sulphamate aqueous electrolyte composition
DE3819892A1 (de) * 1988-06-09 1989-12-14 Schering Ag Alkalisches waessriges bad zur galvanischen abscheidung von zink-eisen-legierungen
GB2231063A (en) * 1989-02-27 1990-11-07 Omi International Electroless plating composition containing saccharin
EP0440071B1 (en) * 1990-01-23 1996-08-28 Mitsubishi Denki Kabushiki Kaisha Plating process
DE4421758A1 (de) * 1994-06-22 1996-01-04 Artur Foehl Antriebsvorrichtung für einen Gurtstraffer
US5683568A (en) * 1996-03-29 1997-11-04 University Of Tulsa Electroplating bath for nickel-iron alloys and method
US6468672B1 (en) * 2000-06-29 2002-10-22 Lacks Enterprises, Inc. Decorative chrome electroplate on plastics
US7354354B2 (en) 2004-12-17 2008-04-08 Integran Technologies Inc. Article comprising a fine-grained metallic material and a polymeric material
US7387578B2 (en) 2004-12-17 2008-06-17 Integran Technologies Inc. Strong, lightweight article containing a fine-grained metallic layer
CN101042044B (zh) * 2007-01-16 2011-01-05 湖南纳菲尔新材料科技股份有限公司 抽油杆或抽油管电镀铁镍/钨合金双层镀层及其表面处理工艺
US8637165B2 (en) 2011-09-30 2014-01-28 Apple Inc. Connector with multi-layer Ni underplated contacts
US9004960B2 (en) 2012-08-10 2015-04-14 Apple Inc. Connector with gold-palladium plated contacts
JP6296491B2 (ja) * 2013-03-14 2018-03-20 セイコーインスツル株式会社 金属構造体、金属構造体の製造方法、ばね部品、時計用発停レバーおよび時計

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2647866A (en) * 1950-07-17 1953-08-04 Udylite Corp Electroplating of nickel
DE1134258B (de) * 1959-05-06 1962-08-02 Dehydag Gmbh Saures galvanisches Nickelbad
US3354059A (en) * 1964-08-12 1967-11-21 Ibm Electrodeposition of nickel-iron magnetic alloy films
US3795591A (en) * 1972-07-03 1974-03-05 Oxy Metal Finishing Corp Electrodeposition of bright nickel iron deposits employing a compound containing a sulfide and a sulfonate
US3806429A (en) * 1972-07-03 1974-04-23 Oxy Metal Finishing Corp Electrodeposition of bright nickel-iron deposits,electrolytes therefor and coating an article with a composite nickel-iron,chromium coating
GB1438554A (en) * 1972-07-03 1976-06-09 Oxy Metal Industries Corp Electrodeposition of bright nickel-iron or nickel-cobalt-iron deposits
US3878067A (en) * 1972-07-03 1975-04-15 Oxy Metal Finishing Corp Electrolyte and method for electrodepositing of bright nickel-iron alloy deposits
US3812566A (en) * 1972-07-03 1974-05-28 Oxy Metal Finishing Corp Composite nickel iron electroplate and method of making said electroplate
ZA746191B (en) * 1973-11-05 1975-11-26 M & T Chemicals Inc Electrodeposition of alloys of nickel or nickel and cobalt with iron
US4002543A (en) * 1974-04-01 1977-01-11 Oxy Metal Industries Corporation Electrodeposition of bright nickel-iron deposits
ZA755497B (en) * 1974-09-16 1976-08-25 M & T Chemicals Inc Alloy plating
AR206638A1 (es) * 1975-03-03 1976-08-06 Oxi Metal Ind Corp Articulo compuesto electrochapado con niquel-hierro y procedimiento electrochapado para formar dicho articulo
US3974044A (en) * 1975-03-31 1976-08-10 Oxy Metal Industries Corporation Bath and method for the electrodeposition of bright nickel-iron deposits
ZA762380B (en) * 1975-05-16 1977-04-27 M & T Chemicals Inc Bright nickel-iron plating
US4089754A (en) * 1977-07-18 1978-05-16 Oxy Metal Industries Corporation Electrodeposition of nickel-iron alloys

Also Published As

Publication number Publication date
HK66286A (en) 1986-09-18
GB2043693A (en) 1980-10-08
DE3001879C2 (de) 1983-01-13
MX153319A (es) 1986-09-12
AR226050A1 (es) 1982-05-31
GB2043693B (en) 1983-02-23
IT8047742A0 (it) 1980-01-29
BR8000825A (pt) 1980-10-29
FR2448584B1 (it) 1982-12-17
IT1128088B (it) 1986-05-28
CA1149323A (en) 1983-07-05
US4179343A (en) 1979-12-18
JPS6144959B2 (it) 1986-10-06
AU5461580A (en) 1980-08-21
AU527988B2 (en) 1983-03-31
ES488291A0 (es) 1980-12-16
JPS55107794A (en) 1980-08-19
ZA80199B (en) 1981-08-26
FR2448584A1 (fr) 1980-09-05
SE8000645L (sv) 1980-08-13
DE3001879A1 (de) 1980-08-21
ES8101655A1 (es) 1980-12-16

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BB A search report has been drawn up
BC A request for examination has been filed
BV The patent application has lapsed