NL7205000A - - Google Patents

Info

Publication number
NL7205000A
NL7205000A NL7205000A NL7205000A NL7205000A NL 7205000 A NL7205000 A NL 7205000A NL 7205000 A NL7205000 A NL 7205000A NL 7205000 A NL7205000 A NL 7205000A NL 7205000 A NL7205000 A NL 7205000A
Authority
NL
Netherlands
Application number
NL7205000A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL7205000A priority Critical patent/NL7205000A/xx
Priority to AU54269/73A priority patent/AU473855B2/en
Priority to SE7305126A priority patent/SE380389B/xx
Priority to GB1730873A priority patent/GB1420676A/en
Priority to CH518473A priority patent/CH555089A/xx
Priority to FR7313066A priority patent/FR2328283A1/fr
Priority to DE2318179A priority patent/DE2318179C2/de
Priority to IT22894/73A priority patent/IT983793B/it
Priority to JP48040911A priority patent/JPS5241104B2/ja
Publication of NL7205000A publication Critical patent/NL7205000A/xx
Priority to US05/518,227 priority patent/US3999213A/en

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/60Lateral BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/113Isolations within a component, i.e. internal isolations
    • H10D62/115Dielectric isolations, e.g. air gaps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/113Isolations within a component, i.e. internal isolations
    • H10D62/115Dielectric isolations, e.g. air gaps
    • H10D62/116Dielectric isolations, e.g. air gaps adjoining the input or output regions of field-effect devices, e.g. adjoining source or drain regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/0107Integrating at least one component covered by H10D12/00 or H10D30/00 with at least one component covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating IGFETs with BJTs
    • H10D84/0109Integrating at least one component covered by H10D12/00 or H10D30/00 with at least one component covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating IGFETs with BJTs the at least one component covered by H10D12/00 or H10D30/00 being a MOS device
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/0123Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
    • H10D84/0126Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
    • H10D84/0135Manufacturing their gate conductors
    • H10D84/0142Manufacturing their gate conductors the gate conductors having different shapes or dimensions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/02Manufacture or treatment characterised by using material-based technologies
    • H10D84/03Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/40Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
    • H10D84/401Combinations of FETs or IGBTs with BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/63Combinations of vertical and lateral BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • H10P14/61
    • H10W10/0121
    • H10W10/0126
    • H10W10/13
NL7205000A 1972-04-14 1972-04-14 NL7205000A (show.php)

Priority Applications (10)

Application Number Priority Date Filing Date Title
NL7205000A NL7205000A (show.php) 1972-04-14 1972-04-14
AU54269/73A AU473855B2 (en) 1972-04-14 1973-04-09 Semiconductor device and method of manufacturing the device
SE7305126A SE380389B (sv) 1972-04-14 1973-04-11 Halvledaranordning med en halvledarkropp uppvisande atminstone en felteffekttransistor med isolerad styrelektrod och sett for dess tillverkning
GB1730873A GB1420676A (en) 1972-04-14 1973-04-11 Semiconductor devices
CH518473A CH555089A (de) 1972-04-14 1973-04-11 Halbleiteranordnung und verfahren zur herstellung dieser halbleiteranordnung.
FR7313066A FR2328283A1 (fr) 1972-04-14 1973-04-11 Dispositif semiconducteur et procede permettant sa fabrication
DE2318179A DE2318179C2 (de) 1972-04-14 1973-04-11 Halbleiteranordnung und Verfahren zu ihrer Herstellung
IT22894/73A IT983793B (it) 1972-04-14 1973-04-11 Dispositivo semiconduttore e me todo per la fabbricazione dello stesso
JP48040911A JPS5241104B2 (show.php) 1972-04-14 1973-04-12
US05/518,227 US3999213A (en) 1972-04-14 1974-10-29 Semiconductor device and method of manufacturing the device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7205000A NL7205000A (show.php) 1972-04-14 1972-04-14

Publications (1)

Publication Number Publication Date
NL7205000A true NL7205000A (show.php) 1973-10-16

Family

ID=19815843

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7205000A NL7205000A (show.php) 1972-04-14 1972-04-14

Country Status (9)

Country Link
JP (1) JPS5241104B2 (show.php)
AU (1) AU473855B2 (show.php)
CH (1) CH555089A (show.php)
DE (1) DE2318179C2 (show.php)
FR (1) FR2328283A1 (show.php)
GB (1) GB1420676A (show.php)
IT (1) IT983793B (show.php)
NL (1) NL7205000A (show.php)
SE (1) SE380389B (show.php)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3955269A (en) * 1975-06-19 1976-05-11 International Business Machines Corporation Fabricating high performance integrated bipolar and complementary field effect transistors
JPS524183A (en) * 1975-06-28 1977-01-13 Nippon Telegr & Teleph Corp <Ntt> Manufacturing method of semiconductor devices
NL7510903A (nl) * 1975-09-17 1977-03-21 Philips Nv Werkwijze voor het vervaardigen van een halfgelei- derinrichting, en inrichting vervaardigd volgens de werkwijze.
JPS5244578A (en) * 1975-10-06 1977-04-07 Mitsubishi Electric Corp Complementary type insulated gate field effect semiconductor device
JPS5248476A (en) * 1975-10-16 1977-04-18 Oki Electric Ind Co Ltd Process for production of complementary type field effect transistor i ntegrated circuit
DE3133468A1 (de) * 1981-08-25 1983-03-17 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von hochintegrierten komplementaeren mos-feldeffekttransistorschaltungen in siliziumgate-technologie
JPS5956758A (ja) * 1983-08-31 1984-04-02 Hitachi Ltd 電界効果半導体装置の製法
JPS59130457A (ja) * 1984-01-04 1984-07-27 Oki Electric Ind Co Ltd 相補形電界効果半導体集積回路装置
JPH0681932U (ja) * 1993-05-06 1994-11-25 株式会社丸辰

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3440503A (en) * 1967-05-31 1969-04-22 Westinghouse Electric Corp Integrated complementary mos-type transistor structure and method of making same
NL160988C (nl) * 1971-06-08 1979-12-17 Philips Nv Halfgeleiderinrichting met een halfgeleiderlichaam, be- vattende ten minste een eerste veldeffecttransistor met geisoleerde stuurelektrode en werkwijze voor de vervaar- diging van de halfgeleiderinrichting.

Also Published As

Publication number Publication date
FR2328283B1 (show.php) 1978-03-24
GB1420676A (en) 1976-01-07
AU473855B2 (en) 1976-07-08
SE380389B (sv) 1975-11-03
CH555089A (de) 1974-10-15
IT983793B (it) 1974-11-11
JPS4919779A (show.php) 1974-02-21
DE2318179C2 (de) 1983-09-01
AU5426973A (en) 1974-10-10
FR2328283A1 (fr) 1977-05-13
DE2318179A1 (de) 1973-10-18
JPS5241104B2 (show.php) 1977-10-17

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