NL7205000A - - Google Patents
Info
- Publication number
- NL7205000A NL7205000A NL7205000A NL7205000A NL7205000A NL 7205000 A NL7205000 A NL 7205000A NL 7205000 A NL7205000 A NL 7205000A NL 7205000 A NL7205000 A NL 7205000A NL 7205000 A NL7205000 A NL 7205000A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/60—Lateral BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/113—Isolations within a component, i.e. internal isolations
- H10D62/115—Dielectric isolations, e.g. air gaps
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/113—Isolations within a component, i.e. internal isolations
- H10D62/115—Dielectric isolations, e.g. air gaps
- H10D62/116—Dielectric isolations, e.g. air gaps adjoining the input or output regions of field-effect devices, e.g. adjoining source or drain regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0107—Integrating at least one component covered by H10D12/00 or H10D30/00 with at least one component covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating IGFETs with BJTs
- H10D84/0109—Integrating at least one component covered by H10D12/00 or H10D30/00 with at least one component covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating IGFETs with BJTs the at least one component covered by H10D12/00 or H10D30/00 being a MOS device
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
- H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
- H10D84/0135—Manufacturing their gate conductors
- H10D84/0142—Manufacturing their gate conductors the gate conductors having different shapes or dimensions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/40—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
- H10D84/401—Combinations of FETs or IGBTs with BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/63—Combinations of vertical and lateral BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
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- H10P14/61—
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- H10W10/0121—
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- H10W10/0126—
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- H10W10/13—
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7205000A NL7205000A (show.php) | 1972-04-14 | 1972-04-14 | |
| AU54269/73A AU473855B2 (en) | 1972-04-14 | 1973-04-09 | Semiconductor device and method of manufacturing the device |
| SE7305126A SE380389B (sv) | 1972-04-14 | 1973-04-11 | Halvledaranordning med en halvledarkropp uppvisande atminstone en felteffekttransistor med isolerad styrelektrod och sett for dess tillverkning |
| GB1730873A GB1420676A (en) | 1972-04-14 | 1973-04-11 | Semiconductor devices |
| CH518473A CH555089A (de) | 1972-04-14 | 1973-04-11 | Halbleiteranordnung und verfahren zur herstellung dieser halbleiteranordnung. |
| FR7313066A FR2328283A1 (fr) | 1972-04-14 | 1973-04-11 | Dispositif semiconducteur et procede permettant sa fabrication |
| DE2318179A DE2318179C2 (de) | 1972-04-14 | 1973-04-11 | Halbleiteranordnung und Verfahren zu ihrer Herstellung |
| IT22894/73A IT983793B (it) | 1972-04-14 | 1973-04-11 | Dispositivo semiconduttore e me todo per la fabbricazione dello stesso |
| JP48040911A JPS5241104B2 (show.php) | 1972-04-14 | 1973-04-12 | |
| US05/518,227 US3999213A (en) | 1972-04-14 | 1974-10-29 | Semiconductor device and method of manufacturing the device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7205000A NL7205000A (show.php) | 1972-04-14 | 1972-04-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7205000A true NL7205000A (show.php) | 1973-10-16 |
Family
ID=19815843
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7205000A NL7205000A (show.php) | 1972-04-14 | 1972-04-14 |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS5241104B2 (show.php) |
| AU (1) | AU473855B2 (show.php) |
| CH (1) | CH555089A (show.php) |
| DE (1) | DE2318179C2 (show.php) |
| FR (1) | FR2328283A1 (show.php) |
| GB (1) | GB1420676A (show.php) |
| IT (1) | IT983793B (show.php) |
| NL (1) | NL7205000A (show.php) |
| SE (1) | SE380389B (show.php) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3955269A (en) * | 1975-06-19 | 1976-05-11 | International Business Machines Corporation | Fabricating high performance integrated bipolar and complementary field effect transistors |
| JPS524183A (en) * | 1975-06-28 | 1977-01-13 | Nippon Telegr & Teleph Corp <Ntt> | Manufacturing method of semiconductor devices |
| NL7510903A (nl) * | 1975-09-17 | 1977-03-21 | Philips Nv | Werkwijze voor het vervaardigen van een halfgelei- derinrichting, en inrichting vervaardigd volgens de werkwijze. |
| JPS5244578A (en) * | 1975-10-06 | 1977-04-07 | Mitsubishi Electric Corp | Complementary type insulated gate field effect semiconductor device |
| JPS5248476A (en) * | 1975-10-16 | 1977-04-18 | Oki Electric Ind Co Ltd | Process for production of complementary type field effect transistor i ntegrated circuit |
| DE3133468A1 (de) * | 1981-08-25 | 1983-03-17 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von hochintegrierten komplementaeren mos-feldeffekttransistorschaltungen in siliziumgate-technologie |
| JPS5956758A (ja) * | 1983-08-31 | 1984-04-02 | Hitachi Ltd | 電界効果半導体装置の製法 |
| JPS59130457A (ja) * | 1984-01-04 | 1984-07-27 | Oki Electric Ind Co Ltd | 相補形電界効果半導体集積回路装置 |
| JPH0681932U (ja) * | 1993-05-06 | 1994-11-25 | 株式会社丸辰 | 篭 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3440503A (en) * | 1967-05-31 | 1969-04-22 | Westinghouse Electric Corp | Integrated complementary mos-type transistor structure and method of making same |
| NL160988C (nl) * | 1971-06-08 | 1979-12-17 | Philips Nv | Halfgeleiderinrichting met een halfgeleiderlichaam, be- vattende ten minste een eerste veldeffecttransistor met geisoleerde stuurelektrode en werkwijze voor de vervaar- diging van de halfgeleiderinrichting. |
-
1972
- 1972-04-14 NL NL7205000A patent/NL7205000A/xx unknown
-
1973
- 1973-04-09 AU AU54269/73A patent/AU473855B2/en not_active Expired
- 1973-04-11 GB GB1730873A patent/GB1420676A/en not_active Expired
- 1973-04-11 SE SE7305126A patent/SE380389B/xx unknown
- 1973-04-11 CH CH518473A patent/CH555089A/xx not_active IP Right Cessation
- 1973-04-11 DE DE2318179A patent/DE2318179C2/de not_active Expired
- 1973-04-11 IT IT22894/73A patent/IT983793B/it active
- 1973-04-11 FR FR7313066A patent/FR2328283A1/fr active Granted
- 1973-04-12 JP JP48040911A patent/JPS5241104B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2328283B1 (show.php) | 1978-03-24 |
| GB1420676A (en) | 1976-01-07 |
| AU473855B2 (en) | 1976-07-08 |
| SE380389B (sv) | 1975-11-03 |
| CH555089A (de) | 1974-10-15 |
| IT983793B (it) | 1974-11-11 |
| JPS4919779A (show.php) | 1974-02-21 |
| DE2318179C2 (de) | 1983-09-01 |
| AU5426973A (en) | 1974-10-10 |
| FR2328283A1 (fr) | 1977-05-13 |
| DE2318179A1 (de) | 1973-10-18 |
| JPS5241104B2 (show.php) | 1977-10-17 |