NL7010997A - - Google Patents

Info

Publication number
NL7010997A
NL7010997A NL7010997A NL7010997A NL7010997A NL 7010997 A NL7010997 A NL 7010997A NL 7010997 A NL7010997 A NL 7010997A NL 7010997 A NL7010997 A NL 7010997A NL 7010997 A NL7010997 A NL 7010997A
Authority
NL
Netherlands
Application number
NL7010997A
Other versions
NL164580C (nl
NL164580B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7010997A publication Critical patent/NL7010997A/xx
Publication of NL164580B publication Critical patent/NL164580B/xx
Application granted granted Critical
Publication of NL164580C publication Critical patent/NL164580C/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/60—Processes for obtaining vesicular images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/686—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/12—Saturated oxiranes characterised by the catalysts used containing organo-metallic compounds or metal hydrides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
    • C08G65/223—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epoxy Resins (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL7010997.A 1968-08-20 1970-07-24 Werkwijze voor het bereiden van een fotopolymeriseer- baar mengsel. NL164580C (nl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US75386968A 1968-08-20 1968-08-20
GB3227270 1970-07-02
FR7027594A FR2098757A5 (cg-RX-API-DMAC7.html) 1968-08-20 1970-07-27
BE755013 1970-08-19

Publications (3)

Publication Number Publication Date
NL7010997A true NL7010997A (cg-RX-API-DMAC7.html) 1972-01-26
NL164580B NL164580B (nl) 1980-08-15
NL164580C NL164580C (nl) 1981-01-15

Family

ID=27424969

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7010997.A NL164580C (nl) 1968-08-20 1970-07-24 Werkwijze voor het bereiden van een fotopolymeriseer- baar mengsel.

Country Status (8)

Country Link
US (1) US3708296A (cg-RX-API-DMAC7.html)
BE (1) BE755013A (cg-RX-API-DMAC7.html)
CA (1) CA938248A (cg-RX-API-DMAC7.html)
CH (1) CH555383A (cg-RX-API-DMAC7.html)
DE (1) DE2035890C3 (cg-RX-API-DMAC7.html)
FR (1) FR2098757A5 (cg-RX-API-DMAC7.html)
GB (1) GB1321263A (cg-RX-API-DMAC7.html)
NL (1) NL164580C (cg-RX-API-DMAC7.html)

Families Citing this family (188)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3957489A (en) * 1968-09-11 1976-05-18 Gaf Corporation Solvent soluble diazonium metal salts and diazotype materials therefor
US3794576A (en) * 1971-05-18 1974-02-26 American Can Co Epoxide blend radiation sensitive catalyst precursor
GB1376840A (en) * 1972-08-02 1974-12-11 Ozalid Group Holdings Ltd De M Photosensitive compositions and their uses
US4210449A (en) * 1972-10-16 1980-07-01 American Can Company Radiation sensitive composition comprising copolymer of glycidyl methacrylate and allyl glycidyl ether and diazonium salt of complex halogenide
US3949143A (en) * 1973-02-09 1976-04-06 American Can Company Epoxy resin coatings cured with phototropic aromatic nitro compounds
US3996052A (en) * 1973-02-09 1976-12-07 American Can Company Phototropic compounds as acid catalyst in photopolymerizing process
US3895952A (en) * 1973-02-09 1975-07-22 American Can Co Phototropic compounds as acid catalyst for epoxy materials
US3960684A (en) * 1973-04-30 1976-06-01 American Can Company Sulfones as solvents in catalysts of U.V. curable systems
US3890149A (en) * 1973-05-02 1975-06-17 American Can Co Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers
US3988152A (en) * 1973-06-11 1976-10-26 American Can Company Epoxy resin photoresist with iodoform and bismuth triphenyl
US3977874A (en) * 1973-06-11 1976-08-31 American Can Company Epoxy resin photoresist with iodoform and bismuth triphenyl
US3977878A (en) * 1973-06-11 1976-08-31 American Can Company Epoxy resin photoresist with iodoform and bismuth triphenyl
US3895954A (en) * 1973-06-11 1975-07-22 American Can Co Epoxy resin photoresist with iodoform and bismuth triphenyl
US3951769A (en) * 1974-03-01 1976-04-20 American Can Company Epoxide photopolymerizable compositions containing cyclic amides as gelation inhibitor and methods of polymerizing
GB1516351A (en) 1974-05-02 1978-07-05 Gen Electric Curable epoxide compositions
GB1512982A (en) 1974-05-02 1978-06-01 Gen Electric Salts
US3997349A (en) * 1974-06-17 1976-12-14 Minnesota Mining And Manufacturing Company Light-sensitive development-free driographic printing plate
US4054732A (en) * 1974-07-05 1977-10-18 American Can Company Dry photopolymer imaging process
US3997344A (en) * 1974-07-05 1976-12-14 American Can Company Dry positive photopolymer imaging process involving heating and application of toner
US4054455A (en) * 1974-09-26 1977-10-18 American Can Company Article having a layer containing a copolymer of glycidyl methacrylate and allyl glycidyl ether
US4054451A (en) * 1974-09-26 1977-10-18 American Can Company Method of polymerizing a copolymer of glycidyl methacrylate and allyl glycidyl ether
US4054452A (en) * 1974-09-26 1977-10-18 American Can Company Method of imaging a layer containing copolymer of glycidyl methacrylate and allyl glycidyl ether
US4071671A (en) * 1974-09-26 1978-01-31 American Can Company Copolymer of glycidyl methacrylate and allyl glycidyl ether
US4056393A (en) * 1974-09-26 1977-11-01 American Can Company Method of recording information using a copolymer of glycidyl methacrylate and allyl glycidyl ether
US4047963A (en) * 1976-06-17 1977-09-13 Hercules Incorporated Photopolymer compositions
CA1119873A (en) * 1976-10-22 1982-03-16 Scott Paper Company Diazo composition containing an azo coupling component precursor, a light sensitive acid progenitor and a carboxylic anhydride
FR2382709A1 (fr) * 1977-03-04 1978-09-29 Thomson Csf Famille de composes comportant un cycle thiirane, reticulables par irradiation photonique
GB1587159A (en) * 1977-07-05 1981-04-01 Ciba Geigy Ag Film adhesives containing an epoxide resin
DE2965081D1 (en) * 1978-12-11 1983-04-28 Bexford Ltd Vesicular recording materials and process for their production
JPS5819899Y2 (ja) * 1979-02-21 1983-04-23 アシダ音響株式会社 耳掛け送受話器
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau
FR2452729A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Article pour la realisation d'auxiliaires visuels tels que films de montage pour l'impression phonographique
US4299938A (en) * 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
US4252884A (en) * 1979-08-14 1981-02-24 James River Graphics, Inc. Negative-working diazotype photoreproduction
US4306953A (en) * 1979-11-05 1981-12-22 American Can Company Cationically polymerizable compositions containing sulfonium salt photoinitiators and stable free radicals as odor suppressants and _method of polymerization using same
US4356050A (en) * 1979-12-11 1982-10-26 General Electric Company Method of adhesive bonding using visible light cured epoxies
FR2475753B1 (fr) * 1980-02-11 1987-03-20 Rhone Poulenc Syst Plaque lithographique a base de fluoborate de paradiazodiphenylamine et de resine epoxy liquide
US4342673A (en) * 1980-02-12 1982-08-03 General Electric Company High-solids coating compositions
US4314917A (en) * 1980-02-12 1982-02-09 General Electric Company High-solids epoxy prepolymer coating composition
US4287228A (en) * 1980-02-20 1981-09-01 American Can Company Photopolymerizable epoxide coating compositions containing titanium dioxide pigment and method of polymerization using same
DE3107087A1 (de) * 1980-02-29 1981-12-24 CIBA-GEIGY AG, 4002 Basel "photopolymerisierbare gemische und verfahren zur photopolymerisation von kationisch polymerisierbaren verbindungen"
US4339567A (en) * 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts
US4302524A (en) * 1980-03-19 1981-11-24 Gaf Corporation Vesicular film elements
US4383025A (en) * 1980-07-10 1983-05-10 Ciba-Geigy Corporation Photopolymerization by means of sulfoxonium salts
US4374751A (en) * 1980-08-08 1983-02-22 General Electric Company Polymerization initiator compositions
US4332836A (en) * 1980-09-10 1982-06-01 General Electric Company Process for producing composite insulating material
US4398014A (en) * 1980-11-04 1983-08-09 Ciba-Geigy Corporation Sulfoxonium salts and their use as polymerization catalysts
US4371605A (en) * 1980-12-09 1983-02-01 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates
US4373040A (en) * 1981-06-05 1983-02-08 General Electric Company Epoxy molding compound
JPS5857428A (ja) 1981-09-30 1983-04-05 Toshiba Corp 光重合組成物
JPS58174418A (ja) * 1982-04-07 1983-10-13 Toshiba Corp 光重合組成物
JPS5949227A (ja) * 1982-09-14 1984-03-21 Toshiba Corp 光重合組成物
US4654291A (en) * 1983-03-10 1987-03-31 James River Graphics Emulsion polymerization of methacrylonitrile as vehicle for vesicular photography and method of making and using same
JPS59172518A (ja) * 1983-03-23 1984-09-29 Toshiba Corp 光硬化性エポキシ樹脂系組成物
GB2137626B (en) * 1983-03-31 1986-10-15 Sericol Group Ltd Water based photopolymerisable compositions and their use
US4555468A (en) * 1983-05-04 1985-11-26 Daicel Chemical Industries, Ltd. Photosensitive diazonium material with precoat of graft polymer prepared by grafting cellulose derivation with radical polymerizable monomer
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
JPS6071631A (ja) * 1983-09-29 1985-04-23 Toshiba Corp 光硬化性組成物
JPS6072918A (ja) * 1983-09-30 1985-04-25 Toshiba Corp 光重合性エポキシ樹脂組成物
JPS61223020A (ja) * 1985-03-29 1986-10-03 Toshiba Corp 光硬化性エポキシ樹脂系組成物
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
US4937159A (en) * 1985-11-20 1990-06-26 The Mead Corporation Photosensitive materials and compositions containing ionic dye compounds as initiators and thiols as autooxidizers
US4654379A (en) * 1985-12-05 1987-03-31 Allied Corporation Semi-interpenetrating polymer networks
DE3604580A1 (de) * 1986-02-14 1987-08-20 Basf Ag Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren
US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
EP0255989B1 (de) * 1986-08-06 1990-11-22 Ciba-Geigy Ag Negativ-Photoresist auf Basis von Polyphenolen und Epoxidverbindungen oder Vinylethern
CA1305823C (en) * 1986-08-29 1992-07-28 Union Carbide Corporation Photocurable blends of cyclic ethers and cycloaliphatic epoxides
US4874450A (en) * 1987-01-29 1989-10-17 The Mead Corporation Laminating transparent or translucent materials using ionic dye-counter ion complexes
US4801392A (en) * 1987-07-02 1989-01-31 The Mead Corporation Magnetic recording compositions containing ionic dye compounds as initiators
DE3814179A1 (de) * 1988-04-27 1989-11-09 Basf Ag Lichtempfindliches gemisch zur herstellung von aufzeichnungsmaterialien
DE69022694T2 (de) * 1989-12-07 1996-03-07 Sicpa Holding Sa Hochreaktive Druckfarben.
US5262232A (en) * 1992-01-22 1993-11-16 Minnesota Mining And Manufacturing Company Vibration damping constructions using acrylate-containing damping materials
US5514728A (en) * 1993-07-23 1996-05-07 Minnesota Mining And Manufacturing Company Catalysts and initiators for polymerization
ES2147777T3 (es) * 1993-09-16 2000-10-01 Ciba Sc Holding Ag Compuestos vinileter con grupos funcionales adicionales, distintos de vinileter, y su utilizacion en la formulacion de compuestos reticulables.
DE4421623A1 (de) * 1994-06-21 1996-01-04 Thera Ges Fuer Patente Mehrkomponentige, kationisch härtende Epoxidmassen und deren Verwendung sowie Verfahren zur Herstellung gehärteter Massen
TW418215B (en) 1995-03-13 2001-01-11 Ciba Sc Holding Ag A process for the production of three-dimensional articles in a stereolithography bath comprising the step of sequentially irradiating a plurality of layers of a liquid radiation-curable composition
JP3786964B2 (ja) * 1995-12-06 2006-06-21 関西ペイント株式会社 塗膜形成方法
JPH1041633A (ja) * 1996-07-25 1998-02-13 Hitachi Ltd 多層配線板とそれに用いる感光性樹脂組成物
EP0822445B2 (de) * 1996-07-29 2005-02-09 Huntsman Advanced Materials (Switzerland) GmbH Flüssige, strahlungshärtbare Zusammensetzung, insbesondere für die Stereolithographie
US6254954B1 (en) 1997-02-28 2001-07-03 3M Innovative Properties Company Pressure-sensitive adhesive tape
EP0998695A1 (en) 1997-07-21 2000-05-10 Ciba SC Holding AG Sedimentation stabilized radiation-curable filled compositions
US6100007A (en) 1998-04-06 2000-08-08 Ciba Specialty Chemicals Corp. Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
US6572693B1 (en) 1999-10-28 2003-06-03 3M Innovative Properties Company Aesthetic dental materials
DE60022667T2 (de) * 1999-10-28 2006-06-14 3M Innovative Properties Co Dentalmaterialien mit siliciumdioxid-nanoteilchen
US6376590B2 (en) 1999-10-28 2002-04-23 3M Innovative Properties Company Zirconia sol, process of making and composite material
US6387981B1 (en) 1999-10-28 2002-05-14 3M Innovative Properties Company Radiopaque dental materials with nano-sized particles
US6730156B1 (en) 1999-10-28 2004-05-04 3M Innovative Properties Company Clustered particle dental fillers
US6350792B1 (en) 2000-07-13 2002-02-26 Suncolor Corporation Radiation-curable compositions and cured articles
US20030149124A1 (en) * 2001-11-27 2003-08-07 Thommes Glen A. Radiation curable resin composition for making colored three dimensional objects
JP4748938B2 (ja) * 2002-01-31 2011-08-17 スリーエム イノベイティブ プロパティズ カンパニー 歯科ペースト、歯科物品、および方法
KR101176747B1 (ko) * 2002-05-03 2012-08-23 디에스엠 아이피 어셋츠 비.브이. 방사선 경화성 수지 조성물 및 이를 이용한 급속 성형법
GB0212977D0 (en) * 2002-06-06 2002-07-17 Vantico Ag Actinic radiation curable compositions and their use
US7091259B2 (en) * 2002-07-03 2006-08-15 3M Innovative Properties Company Dental fillers, pastes, and compositions prepared therefrom
US6989225B2 (en) * 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
US7449146B2 (en) * 2002-09-30 2008-11-11 3M Innovative Properties Company Colorimetric sensor
US20040062682A1 (en) * 2002-09-30 2004-04-01 Rakow Neal Anthony Colorimetric sensor
US20040077745A1 (en) * 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
US6841333B2 (en) * 2002-11-01 2005-01-11 3M Innovative Properties Company Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions
US7025791B2 (en) * 2002-12-02 2006-04-11 Gi Dynamics, Inc. Bariatric sleeve
US6777460B2 (en) * 2002-12-23 2004-08-17 3M Innovative Properties Company Curing agents for cationically curable compositions
US20040137368A1 (en) * 2003-01-13 2004-07-15 3D Systems, Inc. Stereolithographic resins containing selected oxetane compounds
US6984261B2 (en) * 2003-02-05 2006-01-10 3M Innovative Properties Company Use of ceramics in dental and orthodontic applications
US20040170923A1 (en) * 2003-02-27 2004-09-02 3D Systems, Inc. Colored stereolithographic resins
US6856283B2 (en) * 2003-02-28 2005-02-15 Raytheon Company Method and apparatus for a power system for phased-array radar
US7122294B2 (en) * 2003-05-22 2006-10-17 3M Innovative Properties Company Photoacid generators with perfluorinated multifunctional anions
US20060231982A1 (en) 2003-07-23 2006-10-19 Xiaorong You Viscosity reducible radiation curable resin composition
US20050040562A1 (en) * 2003-08-19 2005-02-24 3D Systems Inc. Nanoparticle-filled stereolithographic resins
US7026367B2 (en) * 2003-09-26 2006-04-11 3M Innovative Properties Company Photoiniators having triarylsulfonium and arylsulfinate ions
US7030169B2 (en) * 2003-09-26 2006-04-18 3M Innovative Properties Company Arylsulfinate salts in initiator systems for polymeric reactions
US7064152B2 (en) * 2003-09-26 2006-06-20 3M Innovative Properties Company Arylsulfinate salts in photoinitiator systems for polymerization reactions
US7250452B2 (en) * 2003-09-26 2007-07-31 3M Innovative Properties Company Dental compositions and methods with arylsulfinate salts
US7232850B2 (en) 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
US7820275B2 (en) * 2003-11-06 2010-10-26 Huntsman Advanced Materials Americas Llc Photocurable composition for producing cured articles having high clarity and improved mechanical properties
US7192991B2 (en) * 2003-11-26 2007-03-20 3M Innovative Properties Company Cationically curable composition
US7166008B2 (en) * 2003-12-22 2007-01-23 3M Innovative Properties Company Method of curing using an electroluminescent light
US20050260522A1 (en) * 2004-02-13 2005-11-24 William Weber Permanent resist composition, cured product thereof, and use thereof
ATE527099T1 (de) * 2004-03-22 2011-10-15 Huntsman Adv Mat Switzerland Photohärtbare zusammensetzungen
US7553670B2 (en) * 2004-04-28 2009-06-30 3M Innovative Properties Company Method for monitoring a polymerization in a three-dimensional sample
US7449280B2 (en) * 2004-05-26 2008-11-11 Microchem Corp. Photoimageable coating composition and composite article thereof
US7591865B2 (en) * 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
US8287611B2 (en) * 2005-01-28 2012-10-16 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for making same
SE529306C2 (sv) 2005-03-18 2007-06-26 Perstorp Specialty Chem Ab Ultravioletthärdande hartskomposition
TWI321099B (en) * 2005-04-08 2010-03-01 Saint Gobain Abrasives Inc Abrasive article having reaction activated chromophore
US8263725B2 (en) * 2005-12-26 2012-09-11 Kaneka Corporation Curable composition
US8435098B2 (en) * 2006-01-27 2013-05-07 Saint-Gobain Abrasives, Inc. Abrasive article with cured backsize layer
US7767143B2 (en) * 2006-06-27 2010-08-03 3M Innovative Properties Company Colorimetric sensors
US20080003420A1 (en) * 2006-06-29 2008-01-03 3M Innovative Properties Company Transfer hardcoat films for graphic substrates
CN101529293B (zh) * 2006-10-31 2012-02-22 株式会社日本触媒 柔性光波导及其制备方法以及用于柔性光波导的环氧树脂组合物
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
US7947097B2 (en) * 2006-12-21 2011-05-24 Saint-Gobain Abrasives, Inc. Low corrosion abrasive articles and methods for forming same
JP5512280B2 (ja) * 2006-12-28 2014-06-04 スリーエム イノベイティブ プロパティズ カンパニー 歯科充填剤及び方法
EP3656778A1 (en) 2007-04-17 2020-05-27 Kaneka Corporation Polyhedral polysiloxane modified product and composition using the modified product
KR101450705B1 (ko) * 2007-05-09 2014-10-15 가부시키가이샤 아데카 신규 에폭시화합물, 알칼리 현상성 수지 조성물 및 알칼리 현상성 감광성 수지 조성물
JP5101930B2 (ja) 2007-06-08 2012-12-19 マブチモーター株式会社 多角形状外形の小型モータ
US20090004478A1 (en) * 2007-06-29 2009-01-01 3M Innovative Properties Company Flexible hardcoat compositions, articles, and methods
US20090000727A1 (en) * 2007-06-29 2009-01-01 Kanta Kumar Hardcoat layers on release liners
EP2170492A1 (en) * 2007-07-25 2010-04-07 Lydall Solutech B.V. Hydrophilic membrane
EP2215525B1 (en) * 2007-11-27 2018-01-10 3D Systems Incorporated Photocurable resin composition for producing three dimensional articles having high clarity
US9464172B2 (en) 2007-12-10 2016-10-11 Kaneka Corporation Alkali-developable curable composition, insulating thin film using the same, and thin film transistor
US20090155596A1 (en) * 2007-12-12 2009-06-18 3M Innovative Properties Company Nozzle sealing composition and method
JP2009265519A (ja) * 2008-04-28 2009-11-12 Hitachi Cable Ltd フレキシブル光導波路およびその製造方法
JP2010015135A (ja) * 2008-06-03 2010-01-21 Hitachi Cable Ltd 光ファイバ固定溝付き光導波路基板およびその製造方法、その製造方法に用いる型、ならびに、その光導波路基板を含む光電気混載モジュール
CN102171268B (zh) 2008-10-02 2016-05-18 株式会社钟化 光固化性组合物以及固化物
US20100190881A1 (en) 2009-01-28 2010-07-29 3D Systems, Incorporated Radiation Curable Compositions Useful in Solid Freeform Fabrication Systems
WO2010104603A2 (en) 2009-03-13 2010-09-16 Dsm Ip Assets B.V Radiation curable resin composition and rapid three-dimensional imaging process using the same
EP2292339A1 (en) 2009-09-07 2011-03-09 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Coating method and coating apparatus
KR20120109558A (ko) 2009-12-17 2012-10-08 디에스엠 아이피 어셋츠 비.브이. 트라이아릴 설포늄 보레이트 양이온 광개시제를 포함하는 적층식 제작을 위한 액체 방사선 경화성 수지
CN102725689B (zh) 2010-01-22 2014-10-08 帝斯曼知识产权资产管理有限公司 能固化成具有选择性视觉效果的层的液体可辐射固化树脂及其使用方法
EP2502728B1 (en) 2011-03-23 2017-01-04 DSM IP Assets B.V. Lightweight and high strength three-dimensional articles producible by additive fabrication processes
US8785517B2 (en) 2011-05-25 2014-07-22 3M Innovative Properties Company Pressure-sensitive adhesives with onium-epdxy crosslinking system
EP2723812B1 (en) 2011-06-23 2016-04-13 3M Innovative Properties Company Pressure-sensitive adhesives with onium-epoxy resin crosslinking system
EP2809512B1 (en) 2012-02-03 2019-06-05 3M Innovative Properties Company Primer compositions for optical films
WO2014164000A1 (en) 2013-03-13 2014-10-09 3M Innovative Properties Company Adhesives comprising epoxy-acid crosslinked groups and methods
CN105705112B (zh) 2013-10-04 2018-02-27 3M创新有限公司 牙科研磨坯料、牙科修复体以及形成牙科研磨坯料的方法
KR20170002464A (ko) 2014-04-24 2017-01-06 쓰리엠 이노베이티브 프로퍼티즈 캄파니 절단가능한 가교결합제를 포함하는 조성물 및 방법
US10982122B2 (en) 2014-09-05 2021-04-20 3M Innovative Properties Company Heat conformable curable adhesive films
EP3265049B1 (en) 2015-03-05 2024-05-01 Solventum Intellectual Properties Company Composite material having ceramic fibers
CN107438642B (zh) 2015-04-16 2020-03-03 3M创新有限公司 具有硫醇-环氧树脂基体的量子点制品
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CN108291138B (zh) 2015-11-18 2021-03-26 3M创新有限公司 用于纳米粒子的共聚稳定载体流体
US10899961B2 (en) 2016-02-17 2021-01-26 3M Innovative Properties Company Quantum dots with stabilizing fluorochemical copolymers
KR20180128956A (ko) 2016-04-01 2018-12-04 쓰리엠 이노베이티브 프로퍼티즈 컴파니 플루오로케미칼 안정화제를 갖는 양자점
EP3439856B1 (en) 2016-04-08 2020-02-19 Solvay Specialty Polymers USA, LLC Photocurable polymers, photocurable polymer compositions and lithographic processes including the same
WO2017200824A1 (en) 2016-05-20 2017-11-23 3M Innovative Properties Company Quantum dots with mixed amine and thiol ligands
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EP3478783A1 (en) 2016-06-29 2019-05-08 3M Innovative Properties Company Adhesive article and method of making the same
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ES2685280B2 (es) 2017-03-31 2019-06-21 Centro Tecnologico De Nanomateriales Avanzados S L Composición de resina curable por radiación y procedimiento para su obtención
US12193903B2 (en) 2018-09-14 2025-01-14 Solventum Intellectual Properties Company Composite materials including ceramic fibers and nanoclusters, dental products, kits, and methods of making and using same
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CH555383A (de) 1974-10-31
DE2035890B2 (de) 1973-05-10
NL164580C (nl) 1981-01-15
US3708296A (en) 1973-01-02
DE2035890A1 (de) 1972-01-27
NL164580B (nl) 1980-08-15
GB1321263A (en) 1973-06-27
BE755013A (nl) 1971-02-19
CA938248A (en) 1973-12-11
FR2098757A5 (cg-RX-API-DMAC7.html) 1972-03-10

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