NL180265C - Halfgeleiderinrichting voor hoge spanning. - Google Patents
Halfgeleiderinrichting voor hoge spanning.Info
- Publication number
- NL180265C NL180265C NLAANVRAGE7706389,A NL7706389A NL180265C NL 180265 C NL180265 C NL 180265C NL 7706389 A NL7706389 A NL 7706389A NL 180265 C NL180265 C NL 180265C
- Authority
- NL
- Netherlands
- Prior art keywords
- semiconductor
- high voltage
- voltage
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0657—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
- H01L29/0661—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body specially adapted for altering the breakdown voltage by removing semiconductor material at, or in the neighbourhood of, a reverse biased junction, e.g. by bevelling, moat etching, depletion etching
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thyristors (AREA)
- Bipolar Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US69801476A | 1976-06-21 | 1976-06-21 |
Publications (3)
Publication Number | Publication Date |
---|---|
NL7706389A NL7706389A (nl) | 1977-12-23 |
NL180265B NL180265B (nl) | 1986-08-18 |
NL180265C true NL180265C (nl) | 1987-01-16 |
Family
ID=24803556
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NLAANVRAGE7706389,A NL180265C (nl) | 1976-06-21 | 1977-06-10 | Halfgeleiderinrichting voor hoge spanning. |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS538069A (nl) |
DE (1) | DE2727487C2 (nl) |
FR (1) | FR2356276A1 (nl) |
NL (1) | NL180265C (nl) |
SE (1) | SE7707190L (nl) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1212404B (it) * | 1979-02-22 | 1989-11-22 | Rca Corp | Metodo comportante un singolo attacco per la formazione di un mesa presentante una parete a piu'gradini. |
EP0144876B1 (de) * | 1983-12-07 | 1988-03-09 | BBC Brown Boveri AG | Halbleiterbauelement |
DE3422051C2 (de) * | 1984-06-14 | 1986-06-26 | Brown, Boveri & Cie Ag, 6800 Mannheim | Silizium-Halbleiterbauelement mit ätztechnisch hergestellter Randkontur und Verfahren zur Herstellung dieses Bauelements |
JPS6190463A (ja) * | 1984-10-11 | 1986-05-08 | Hitachi Ltd | 半導体装置 |
DE59010606D1 (de) * | 1989-03-29 | 1997-01-30 | Siemens Ag | Verfahren zur Herstellung eines planaren pn-Übergangs hoher Spannungsfestigkeit |
DE10349908C5 (de) * | 2003-10-25 | 2009-02-12 | Semikron Elektronik Gmbh & Co. Kg | Verfahren zur Herstellung eines zweifach passivierten Leistungshalbleiterbauelements mit einer MESA Randstruktur |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1052661A (nl) * | 1963-01-30 | 1900-01-01 | ||
DE1539961A1 (de) * | 1965-03-17 | 1970-01-22 | Fuji Electric Co Ltd | Halbleiterbauelement mit mindestens zwei pn-UEbergaengen im einkristallinen Halbleiterkoerper |
DE1276207B (de) * | 1966-09-09 | 1968-08-29 | Licentia Gmbh | Halbleiterbauelement |
-
1977
- 1977-06-10 NL NLAANVRAGE7706389,A patent/NL180265C/nl not_active IP Right Cessation
- 1977-06-16 FR FR7718467A patent/FR2356276A1/fr active Granted
- 1977-06-18 DE DE2727487A patent/DE2727487C2/de not_active Expired
- 1977-06-21 JP JP7290177A patent/JPS538069A/ja active Granted
- 1977-06-21 SE SE7707190A patent/SE7707190L/xx unknown
Also Published As
Publication number | Publication date |
---|---|
DE2727487C2 (de) | 1985-05-15 |
SE7707190L (sv) | 1977-12-22 |
FR2356276A1 (fr) | 1978-01-20 |
NL180265B (nl) | 1986-08-18 |
NL7706389A (nl) | 1977-12-23 |
FR2356276B1 (nl) | 1983-02-04 |
JPS5639057B2 (nl) | 1981-09-10 |
JPS538069A (en) | 1978-01-25 |
DE2727487A1 (de) | 1977-12-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BB | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
A85 | Still pending on 85-01-01 | ||
V1 | Lapsed because of non-payment of the annual fee |