NL163673C - Werkwijze ter vervaardiging van een geintegreerde half- geleiderinrichting met een veldeffecttransistor van het overgangstype. - Google Patents

Werkwijze ter vervaardiging van een geintegreerde half- geleiderinrichting met een veldeffecttransistor van het overgangstype.

Info

Publication number
NL163673C
NL163673C NL6809049.A NL6809049A NL163673C NL 163673 C NL163673 C NL 163673C NL 6809049 A NL6809049 A NL 6809049A NL 163673 C NL163673 C NL 163673C
Authority
NL
Netherlands
Prior art keywords
manufacturing
semiconductor device
field effect
effect transistor
type field
Prior art date
Application number
NL6809049.A
Other languages
English (en)
Dutch (nl)
Other versions
NL6809049A (es
NL163673B (nl
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of NL6809049A publication Critical patent/NL6809049A/xx
Publication of NL163673B publication Critical patent/NL163673B/xx
Application granted granted Critical
Publication of NL163673C publication Critical patent/NL163673C/xx

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/34DC amplifiers in which all stages are DC-coupled
    • H03F3/343DC amplifiers in which all stages are DC-coupled with semiconductor devices only
    • H03F3/347DC amplifiers in which all stages are DC-coupled with semiconductor devices only in integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0611Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
    • H01L27/0617Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
    • H01L27/0635Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with bipolar transistors and diodes, or resistors, or capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/80Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/808Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a PN junction gate, e.g. PN homojunction gate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/037Diffusion-deposition
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/053Field effect transistors fets
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/085Isolated-integrated
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/145Shaped junctions
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/151Simultaneous diffusion

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Element Separation (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
NL6809049.A 1967-06-30 1968-06-27 Werkwijze ter vervaardiging van een geintegreerde half- geleiderinrichting met een veldeffecttransistor van het overgangstype. NL163673C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR112637 1967-06-30

Publications (3)

Publication Number Publication Date
NL6809049A NL6809049A (es) 1968-12-31
NL163673B NL163673B (nl) 1980-04-15
NL163673C true NL163673C (nl) 1980-09-15

Family

ID=8634224

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6809049.A NL163673C (nl) 1967-06-30 1968-06-27 Werkwijze ter vervaardiging van een geintegreerde half- geleiderinrichting met een veldeffecttransistor van het overgangstype.

Country Status (5)

Country Link
US (1) US3595714A (es)
DE (1) DE1764578C3 (es)
FR (1) FR1559611A (es)
GB (1) GB1229294A (es)
NL (1) NL163673C (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS509635B1 (es) * 1970-09-07 1975-04-14
FR2124142B1 (es) * 1971-02-09 1973-11-30 Simplex Appareils
DE2131993C2 (de) * 1971-06-28 1984-10-11 Telefunken electronic GmbH, 7100 Heilbronn Verfahren zum Herstellen eines niederohmigen Anschlusses
JPS524426B2 (es) * 1973-04-20 1977-02-03
DE2351985A1 (de) * 1973-10-17 1975-04-30 Itt Ind Gmbh Deutsche Planardiffusionsverfahren zum herstellen einer monolithisch integrierten festkoerperschaltung
JPS51101478A (es) * 1975-03-04 1976-09-07 Suwa Seikosha Kk
US3955269A (en) * 1975-06-19 1976-05-11 International Business Machines Corporation Fabricating high performance integrated bipolar and complementary field effect transistors
US4314267A (en) * 1978-06-13 1982-02-02 Ibm Corporation Dense high performance JFET compatible with NPN transistor formation and merged BIFET
JPH065745B2 (ja) * 1986-07-31 1994-01-19 株式会社日立製作所 半導体装置
IT1237666B (it) * 1989-10-31 1993-06-15 Sgs Thomson Microelectronics Processo per la fabbricazione di un componente limitatore della tensione di programmazione e stabilizzatore di tensione incorporato inun dispositivo elettrico con celle di memoria eeprom
US5296047A (en) * 1992-01-28 1994-03-22 Hewlett-Packard Co. Epitaxial silicon starting material

Also Published As

Publication number Publication date
GB1229294A (es) 1971-04-21
NL6809049A (es) 1968-12-31
FR1559611A (es) 1969-03-14
NL163673B (nl) 1980-04-15
DE1764578B2 (de) 1978-11-23
US3595714A (en) 1971-07-27
DE1764578C3 (de) 1979-08-02
DE1764578A1 (de) 1971-08-19

Similar Documents

Publication Publication Date Title
NL161616C (nl) Werkwijze voor het vervaardigen van een halfgeleider- inrichting.
DK119934B (da) Fremgangsmåde til fremstilling af et halvlederorgan.
NL159235B (nl) Schakeling voorzien van een veldeffecthalfgeleiderinrichting.
NL160680C (nl) Halfgeleiderinrichting voorzien van een isolerende inkapselbekleding en werkwijze voor het vervaardigen van de halfgeleiderinrichting.
NL156631B (nl) Inrichting voor het vervaardigen van biaxiaal verstrekte slangfoelies.
DK121771B (da) Halvlederkomponent med en felteffekttransistor med isoleret styreelektrode samt fremgangsmåde til fremstilling af komponenten.
DK122554B (da) Fremgangsmåde til fremstilling af et halvlederorgan.
DK118413B (da) Fremgangsmåde til fremstilling af en halvlederkomponent.
NL144091B (nl) Halfgeleiderveldeffectinrichting van het type met een geisoleerde poortelektrode.
NL162789C (nl) Werkwijze voor het vervaardigen van een halfgeleider- inrichting.
NL163369C (nl) Werkwijze voor het vervaardigen van een halfgeleider- inrichting.
DK117847B (da) Fremgangsmåde til fremstilling af et halvlederapparat indeholdende en felteffekttransistor.
NL163673C (nl) Werkwijze ter vervaardiging van een geintegreerde half- geleiderinrichting met een veldeffecttransistor van het overgangstype.
NL162511B (nl) Geintegreerde halfgeleiderschakeling met een laterale transistor en werkwijze voor het vervaardigen van de geintegreerde halfgeleiderschakeling.
NL157749C (nl) Werkwijze voor het vervaardigen van een veldeffect- transistor en veldeffecttransistor vervaardigd volgens de werkwijze.
NL161300C (nl) Werkwijze ter vervaardiging van een halfgeleider- inrichting met een zenerdiode en halfgeleiderinrichting vervaardigd door toepassing van deze werkwijze.
NL154061B (nl) Werkwijze voor het vervaardigen van een halfgeleiderinrichting en halfgeleiderinrichting vervaardigd met behulp van de werkwijze.
DK117846B (da) Fremgangsmåde til fremstilling af et halvlederapparat.
NL149638B (nl) Werkwijze voor het vervaardigen van een halfgeleiderinrichting bevattende ten minste een veldeffecttransistor, en halfgeleiderinrichting, vervaardigd volgens deze werkwijze.
NL140101B (nl) Werkwijze voor het vervaardigen van een halfgeleiderinrichting en halfgeleiderinrichting vervaardigd volgens deze werkwijze.
NL152115B (nl) Werkwijze voor het vervaardigen van een siliciumhalfgeleiderinrichting door etsen.
AT302418B (de) Halbleitervorrichtung, insbesondere Transistor
NL167278C (nl) Geintegreerde schakeling met veldeffekttransistoren.
NL152708B (nl) Halfgeleiderinrichting met een veldeffecttransistor met geisoleerde poortelektrode.
NL159234B (nl) Halfgeleiderveldeffectinrichting.

Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee