IT1237666B - Processo per la fabbricazione di un componente limitatore della tensione di programmazione e stabilizzatore di tensione incorporato inun dispositivo elettrico con celle di memoria eeprom - Google Patents
Processo per la fabbricazione di un componente limitatore della tensione di programmazione e stabilizzatore di tensione incorporato inun dispositivo elettrico con celle di memoria eepromInfo
- Publication number
- IT1237666B IT1237666B IT02222889A IT2222889A IT1237666B IT 1237666 B IT1237666 B IT 1237666B IT 02222889 A IT02222889 A IT 02222889A IT 2222889 A IT2222889 A IT 2222889A IT 1237666 B IT1237666 B IT 1237666B
- Authority
- IT
- Italy
- Prior art keywords
- built
- manufacture
- memory cells
- electric device
- eeprom memory
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
- H10D8/01—Manufacture or treatment
- H10D8/021—Manufacture or treatment of breakdown diodes
- H10D8/022—Manufacture or treatment of breakdown diodes of Zener diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/174—Zener diodes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/983—Zener diodes
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT02222889A IT1237666B (it) | 1989-10-31 | 1989-10-31 | Processo per la fabbricazione di un componente limitatore della tensione di programmazione e stabilizzatore di tensione incorporato inun dispositivo elettrico con celle di memoria eeprom |
| EP90202840A EP0426241B1 (en) | 1989-10-31 | 1990-10-24 | Process for the manufacture of a component to limit the programming voltage and to stabilise the voltage incorporated in an electric device with EEPROM memory cells |
| DE69025854T DE69025854T2 (de) | 1989-10-31 | 1990-10-24 | Verfahren zur Herstellung einer Komponente für die Begrenzung der Programmierungsspannung und für die Stabilisation der Spannung in einer elektrischen Anordnung mit EEPROM-Speicherzellen |
| JP2292196A JP2588058B2 (ja) | 1989-10-31 | 1990-10-31 | Eepromメモリ・セルを持つ電気的装置に設けられたプログラミング電圧を制限し安定化させるコンポーネントの製造方法 |
| US07/946,797 US5322803A (en) | 1989-10-31 | 1992-09-18 | Process for the manufacture of a component to limit the programming voltage and to stabilize the voltage incorporated in an electric device with EEPROM memory cells |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT02222889A IT1237666B (it) | 1989-10-31 | 1989-10-31 | Processo per la fabbricazione di un componente limitatore della tensione di programmazione e stabilizzatore di tensione incorporato inun dispositivo elettrico con celle di memoria eeprom |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| IT8922228A0 IT8922228A0 (it) | 1989-10-31 |
| IT8922228A1 IT8922228A1 (it) | 1991-05-01 |
| IT1237666B true IT1237666B (it) | 1993-06-15 |
Family
ID=11193356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT02222889A IT1237666B (it) | 1989-10-31 | 1989-10-31 | Processo per la fabbricazione di un componente limitatore della tensione di programmazione e stabilizzatore di tensione incorporato inun dispositivo elettrico con celle di memoria eeprom |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5322803A (it) |
| EP (1) | EP0426241B1 (it) |
| JP (1) | JP2588058B2 (it) |
| DE (1) | DE69025854T2 (it) |
| IT (1) | IT1237666B (it) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1993019490A1 (fr) * | 1992-03-23 | 1993-09-30 | Rohm Co., Ltd. | Diode de regulation de tension |
| DE69322384T2 (de) * | 1993-09-10 | 1999-05-12 | Stmicroelectronics S.R.L., Agrate Brianza, Mailand/Milano | Herstellungsverfahren einer Zenerdiode für Flash-EEPROM Bauteile |
| US6534364B1 (en) * | 1994-12-05 | 2003-03-18 | Texas Instruments Incorporated | Tunnel diode layout for an EEPROM cell for protecting the tunnel diode region |
| US5756387A (en) * | 1994-12-30 | 1998-05-26 | Sgs-Thomson Microelectronics S.R.L. | Method for forming zener diode with high time stability and low noise |
| EP0720237A1 (en) * | 1994-12-30 | 1996-07-03 | STMicroelectronics S.r.l. | Zener diode for integrated circuits |
| JP3475634B2 (ja) * | 1996-01-24 | 2003-12-08 | ソニー株式会社 | ツェナーダイオードおよびその製造方法 |
| US5719427A (en) * | 1997-01-14 | 1998-02-17 | Pericom Semiconductor Corp. | Avalanche-enhanced CMOS transistor for EPROM/EEPROM and ESD-protection structures |
| US5956271A (en) * | 1997-12-12 | 1999-09-21 | Texas Instruments Incorporated | Channel hot electron programmed memory device having improved reliability and operability |
| ITTO980556A1 (it) * | 1998-06-26 | 1999-12-26 | St Microelectronics Srl | Procedimento di fabbricazione di dispositivi integrati con protezione dell'ossido di porta da danni di processo e relativa struttura di |
| JP2004214575A (ja) * | 2003-01-09 | 2004-07-29 | Matsushita Electric Ind Co Ltd | 半導体装置 |
| US9136833B2 (en) * | 2012-03-01 | 2015-09-15 | Asahi Kasei Microdevices Corporation | Power source connection circuit |
| EP2725615B1 (en) * | 2012-10-29 | 2019-01-23 | IMEC vzw | Semiconductor device comprising a diode and a bipolar transistor and method for producing such a device |
| CN106711203B (zh) * | 2015-11-12 | 2020-03-27 | 旺宏电子股份有限公司 | 半导体元件及其制造方法 |
| US9735291B1 (en) * | 2016-03-10 | 2017-08-15 | Macronix International Co., Ltd. | Semiconductor device and Zener diode |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1559611A (it) * | 1967-06-30 | 1969-03-14 | ||
| US4051504A (en) * | 1975-10-14 | 1977-09-27 | General Motors Corporation | Ion implanted zener diode |
| US4553314B1 (en) * | 1977-01-26 | 2000-04-18 | Sgs Thomson Microelectronics | Method for making a semiconductor device |
| US4136349A (en) * | 1977-05-27 | 1979-01-23 | Analog Devices, Inc. | Ic chip with buried zener diode |
| US4168999A (en) * | 1978-12-26 | 1979-09-25 | Fairchild Camera And Instrument Corporation | Method for forming oxide isolated integrated injection logic semiconductor structures having minimal encroachment utilizing special masking techniques |
| EP0021777B1 (en) * | 1979-06-18 | 1983-10-19 | Fujitsu Limited | Semiconductor non-volatile memory device |
| EP0054740A2 (en) * | 1980-12-23 | 1982-06-30 | American Microsystems, Incorporated | Zener diode burn prom |
| US4398338A (en) * | 1980-12-24 | 1983-08-16 | Fairchild Camera & Instrument Corp. | Fabrication of high speed, nonvolatile, electrically erasable memory cell and system utilizing selective masking, deposition and etching techniques |
| US4626882A (en) * | 1984-07-18 | 1986-12-02 | International Business Machines Corporation | Twin diode overvoltage protection structure |
| JPS63100773A (ja) * | 1986-10-16 | 1988-05-02 | Mitsubishi Electric Corp | 半導体記憶装置およびその製造方法 |
| US4736271A (en) * | 1987-06-23 | 1988-04-05 | Signetics Corporation | Protection device utilizing one or more subsurface diodes and associated method of manufacture |
| US4990976A (en) * | 1987-11-24 | 1991-02-05 | Nec Corporation | Semiconductor device including a field effect transistor having a protective diode between source and drain thereof |
| JPH022156A (ja) * | 1987-12-07 | 1990-01-08 | Texas Instr Inc <Ti> | 集積回路の製法 |
| US4982371A (en) * | 1989-05-15 | 1991-01-01 | Dallas Semiconductor Corporation | Compact electronic module having a RAM device |
| US5089443A (en) * | 1990-05-30 | 1992-02-18 | Prime Computer, Inc. | Method of making a semiconductor heat sink |
-
1989
- 1989-10-31 IT IT02222889A patent/IT1237666B/it active IP Right Grant
-
1990
- 1990-10-24 EP EP90202840A patent/EP0426241B1/en not_active Expired - Lifetime
- 1990-10-24 DE DE69025854T patent/DE69025854T2/de not_active Expired - Fee Related
- 1990-10-31 JP JP2292196A patent/JP2588058B2/ja not_active Expired - Fee Related
-
1992
- 1992-09-18 US US07/946,797 patent/US5322803A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03225875A (ja) | 1991-10-04 |
| EP0426241A3 (en) | 1991-11-27 |
| DE69025854T2 (de) | 1996-08-01 |
| IT8922228A1 (it) | 1991-05-01 |
| US5322803A (en) | 1994-06-21 |
| EP0426241A2 (en) | 1991-05-08 |
| EP0426241B1 (en) | 1996-03-13 |
| JP2588058B2 (ja) | 1997-03-05 |
| IT8922228A0 (it) | 1989-10-31 |
| DE69025854D1 (de) | 1996-04-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 0001 | Granted | ||
| TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19971030 |