NL1024074A1 - Inregelinstrument-evaluatiesysteem, inregelinstrument-evaluatiewerkwijze, een computerprogrammaproduct en een werkwijze voor het vervaardigen van een halfgeleiderinrichting. - Google Patents

Inregelinstrument-evaluatiesysteem, inregelinstrument-evaluatiewerkwijze, een computerprogrammaproduct en een werkwijze voor het vervaardigen van een halfgeleiderinrichting.

Info

Publication number
NL1024074A1
NL1024074A1 NL1024074A NL1024074A NL1024074A1 NL 1024074 A1 NL1024074 A1 NL 1024074A1 NL 1024074 A NL1024074 A NL 1024074A NL 1024074 A NL1024074 A NL 1024074A NL 1024074 A1 NL1024074 A1 NL 1024074A1
Authority
NL
Netherlands
Prior art keywords
balancing instrument
instrument evaluation
manufacturing
semiconductor device
computer program
Prior art date
Application number
NL1024074A
Other languages
English (en)
Other versions
NL1024074C2 (nl
Inventor
Takuya Kouno
Shigeki Nojima
Tatsuhiko Higashiki
Original Assignee
Toshiba Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Kk filed Critical Toshiba Kk
Publication of NL1024074A1 publication Critical patent/NL1024074A1/nl
Application granted granted Critical
Publication of NL1024074C2 publication Critical patent/NL1024074C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70541—Tagging, i.e. hardware or software tagging of features or components, e.g. using tagging scripts or tagging identifier codes for identification of chips, shots or wafers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
NL1024074A 2002-08-09 2003-08-08 Inregelinstrument-evaluatiesysteem, inregelinstrument-evaluatiewerkwijze, een computerprogrammaproduct en een werkwijze voor het vervaardigen van een halfgeleiderinrichting. NL1024074C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002234053A JP3875158B2 (ja) 2002-08-09 2002-08-09 露光装置判定システム、露光装置判定方法、露光装置判定プログラム及び半導体装置の製造方法
JP2002234053 2002-08-09

Publications (2)

Publication Number Publication Date
NL1024074A1 true NL1024074A1 (nl) 2004-02-10
NL1024074C2 NL1024074C2 (nl) 2006-09-06

Family

ID=32019000

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1024074A NL1024074C2 (nl) 2002-08-09 2003-08-08 Inregelinstrument-evaluatiesysteem, inregelinstrument-evaluatiewerkwijze, een computerprogrammaproduct en een werkwijze voor het vervaardigen van een halfgeleiderinrichting.

Country Status (5)

Country Link
US (2) US7269470B2 (nl)
JP (1) JP3875158B2 (nl)
CN (1) CN100337239C (nl)
NL (1) NL1024074C2 (nl)
TW (1) TWI269942B (nl)

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Also Published As

Publication number Publication date
US20070288113A1 (en) 2007-12-13
US20040088071A1 (en) 2004-05-06
TWI269942B (en) 2007-01-01
NL1024074C2 (nl) 2006-09-06
CN1480788A (zh) 2004-03-10
US7269470B2 (en) 2007-09-11
US7546178B2 (en) 2009-06-09
CN100337239C (zh) 2007-09-12
TW200406648A (en) 2004-05-01
JP2004079586A (ja) 2004-03-11
JP3875158B2 (ja) 2007-01-31

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