NL1015738A1 - Schuifapparaat en bijbehorend platformmechanisme voor gebruik in vacu³m. - Google Patents

Schuifapparaat en bijbehorend platformmechanisme voor gebruik in vacu³m.

Info

Publication number
NL1015738A1
NL1015738A1 NL1015738A NL1015738A NL1015738A1 NL 1015738 A1 NL1015738 A1 NL 1015738A1 NL 1015738 A NL1015738 A NL 1015738A NL 1015738 A NL1015738 A NL 1015738A NL 1015738 A1 NL1015738 A1 NL 1015738A1
Authority
NL
Netherlands
Prior art keywords
slider
vacuum
platform mechanism
associated platform
platform
Prior art date
Application number
NL1015738A
Other languages
English (en)
Other versions
NL1015738C2 (nl
Inventor
Akira Higuchi
Takayuki Kato
Kenichi Iwasaki
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP11214244A external-priority patent/JP2001044107A/ja
Priority claimed from JP11227958A external-priority patent/JP2001052988A/ja
Priority claimed from JP27388999A external-priority patent/JP2001091681A/ja
Priority claimed from JP2000123880A external-priority patent/JP4548898B2/ja
Application filed by Kyocera Corp filed Critical Kyocera Corp
Publication of NL1015738A1 publication Critical patent/NL1015738A1/nl
Application granted granted Critical
Publication of NL1015738C2 publication Critical patent/NL1015738C2/nl

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/02—Sliding-contact bearings
    • F16C29/025—Hydrostatic or aerostatic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2300/00—Application independent of particular apparatuses
    • F16C2300/40—Application independent of particular apparatuses related to environment, i.e. operating conditions
    • F16C2300/62—Application independent of particular apparatuses related to environment, i.e. operating conditions low pressure, e.g. elements operating under vacuum conditions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T74/00—Machine element or mechanism
    • Y10T74/20—Control lever and linkage systems
    • Y10T74/20207—Multiple controlling elements for single controlled element
    • Y10T74/20341—Power elements as controlling elements
    • Y10T74/20354—Planar surface with orthogonal movement only
NL1015738A 1999-07-28 2000-07-18 Schuifapparaat en bijbehorend platformmechanisme voor gebruik in vacu³m. NL1015738C2 (nl)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP21424499 1999-07-28
JP11214244A JP2001044107A (ja) 1999-07-28 1999-07-28 真空用スライド装置及びそのステージ機構
JP11227958A JP2001052988A (ja) 1999-08-11 1999-08-11 真空用スライド装置及びそのステージ機構
JP22795899 1999-08-11
JP27388999A JP2001091681A (ja) 1999-09-28 1999-09-28 Ｘｙステージ機構及び露光装置
JP27388999 1999-09-28
JP2000123880 2000-04-25
JP2000123880A JP4548898B2 (ja) 2000-04-25 2000-04-25 真空用ステ−ジ機構

Publications (2)

Publication Number Publication Date
NL1015738A1 true NL1015738A1 (nl) 2001-01-30
NL1015738C2 NL1015738C2 (nl) 2002-10-15

Family

ID=27476678

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1015738A NL1015738C2 (nl) 1999-07-28 2000-07-18 Schuifapparaat en bijbehorend platformmechanisme voor gebruik in vacu³m.

Country Status (3)

Country Link
US (2) US6510755B1 (nl)
DE (1) DE10036217A1 (nl)
NL (1) NL1015738C2 (nl)

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KR100547943B1 (ko) * 2001-11-30 2006-02-01 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스 제조방법
JP4031252B2 (ja) * 2002-01-31 2008-01-09 キヤノン株式会社 排気装置及びその制御方法並びに真空内静圧軸受
JP4012024B2 (ja) * 2002-09-10 2007-11-21 キヤノン株式会社 位置決め装置に於ける衝撃吸収装置
JP2004144188A (ja) * 2002-10-24 2004-05-20 Nippon Steel Corp 静圧気体軸受
JP4458322B2 (ja) * 2003-01-14 2010-04-28 キヤノン株式会社 露光装置およびデバイス製造方法
JP3987811B2 (ja) * 2003-03-20 2007-10-10 株式会社日立ハイテクノロジーズ Ｘｙステージ、ヘッドキャリッジおよび磁気ヘッドあるいは磁気ディスクのテスタ
JP2004319902A (ja) * 2003-04-18 2004-11-11 Advantest Corp ステージ装置及び露光装置
JP4763228B2 (ja) * 2003-05-23 2011-08-31 キヤノン株式会社 電子ビーム露光装置用ステージ装置、位置決め方法、電子ビーム露光装置及びデバイス製造方法
JP4480960B2 (ja) * 2003-06-27 2010-06-16 東北パイオニア株式会社 支持ユニット並びにその支持ユニットを用いた移動テーブル装置及び直動案内装置
US20050004689A1 (en) * 2003-07-02 2005-01-06 Ming-Chang Shih Design and control method of a micro-nanometer precision servo pneumatic X-Y positioning table
DE10330506A1 (de) * 2003-07-05 2005-03-31 Leica Microsystems Semiconductor Gmbh Vorrichtung zur Waferinspektion
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GB0507681D0 (en) * 2005-04-15 2005-05-25 Westwind Air Bearings Ltd Gas bearing spindles
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US20080036084A1 (en) * 2006-01-30 2008-02-14 International Business Machines Corporation Laser release process for very thin Si-carrier build
US20080003377A1 (en) * 2006-06-30 2008-01-03 The Board Of Regents Of The Nevada System Of Higher Ed. On Behalf Of The Unlv Transparent vacuum system
US8069748B1 (en) 2007-05-24 2011-12-06 Prefix Corporation XY linear slide mechanism
NL1036794A1 (nl) * 2008-04-25 2009-10-27 Asml Netherlands Bv Robot for in-vacuum use.
US20100077877A1 (en) * 2008-09-26 2010-04-01 Ming-Hung Hsieh Rotary micro-adjustment mechanism for a synchronous double-drive positioning platform
KR20120007308A (ko) * 2010-07-14 2012-01-20 삼성전자주식회사 액추에이터 조립체 및 이를 구비한 광학 시스템
EP2469339B1 (en) 2010-12-21 2017-08-30 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
CN102649232B (zh) * 2011-02-28 2014-07-02 鸿富锦精密工业（深圳）有限公司 直线运动平台
CN102852972B (zh) * 2012-05-14 2016-07-06 天津市宝坻区东亚光大地毯厂 地毯电针滑道装置
DE102012211056B4 (de) * 2012-06-27 2017-01-05 Xenon Automatisierungstechnik Gmbh Vorrichtung zum Prozessieren von Werkstücken in einer Vakuumprozesskammer
CN103399387B (zh) * 2013-07-29 2016-01-13 中国科学院长春光学精密机械与物理研究所 光刻投影物镜系统中光学元件多气囊支撑装置
CN103899646B (zh) * 2014-03-25 2016-04-20 西安理工大学 带磁流变液阻尼器的液体静压导轨
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Also Published As

Publication number Publication date
NL1015738C2 (nl) 2002-10-15
DE10036217A1 (de) 2001-03-01
US20030094059A1 (en) 2003-05-22
US6732610B2 (en) 2004-05-11
US6510755B1 (en) 2003-01-28

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Legal Events

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AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20020809

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V1 Lapsed because of non-payment of the annual fee

Effective date: 20110201