MY150671A - Method for manufacturing mask blank and coating apparatus - Google Patents

Method for manufacturing mask blank and coating apparatus

Info

Publication number
MY150671A
MY150671A MYPI20082358A MY150671A MY 150671 A MY150671 A MY 150671A MY PI20082358 A MYPI20082358 A MY PI20082358A MY 150671 A MY150671 A MY 150671A
Authority
MY
Malaysia
Prior art keywords
mask blank
resist
resist agent
liquid
nozzle
Prior art date
Application number
Other languages
English (en)
Inventor
Ryoji Miyata
Keishi Asakawa
Original Assignee
Hoya Corp
Hoya Electronics Malaysia Sendirian Berhad
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007171568A external-priority patent/JP5086708B2/ja
Priority claimed from JP2007171569A external-priority patent/JP2009010247A/ja
Application filed by Hoya Corp, Hoya Electronics Malaysia Sendirian Berhad filed Critical Hoya Corp
Publication of MY150671A publication Critical patent/MY150671A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
MYPI20082358 2007-06-29 2008-06-27 Method for manufacturing mask blank and coating apparatus MY150671A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007171568A JP5086708B2 (ja) 2007-06-29 2007-06-29 マスクブランクの製造方法及び塗布装置
JP2007171569A JP2009010247A (ja) 2007-06-29 2007-06-29 マスクブランクの製造方法及び塗布装置

Publications (1)

Publication Number Publication Date
MY150671A true MY150671A (en) 2014-02-28

Family

ID=40486900

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20082358 MY150671A (en) 2007-06-29 2008-06-27 Method for manufacturing mask blank and coating apparatus

Country Status (3)

Country Link
KR (1) KR101523093B1 (zh)
MY (1) MY150671A (zh)
TW (1) TWI471682B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6272138B2 (ja) * 2014-05-22 2018-01-31 東京エレクトロン株式会社 塗布処理装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4445985A1 (de) * 1994-12-22 1996-06-27 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur Belackung oder Beschichtung eines Substrats
JP3252325B2 (ja) * 1999-10-29 2002-02-04 株式会社ヒラノテクシード 塗工方法及び塗工装置
JP4927274B2 (ja) * 2001-09-17 2012-05-09 株式会社ヒラノテクシード 塗工装置及び塗工方法
JP4017372B2 (ja) * 2001-10-15 2007-12-05 住友化学株式会社 薄膜形成方法
JP2003164795A (ja) * 2001-11-29 2003-06-10 Nitto Denko Corp 高屈折率フィラーを含有する塗工液の塗工方法
JP3871328B2 (ja) * 2002-03-29 2007-01-24 Ｈｏｙａ株式会社 塗布装置、その液面レベル管理方法及び管理装置、レジスト膜付基板の製造方法及びパターン形成方法、並びにフォトマスクの製造方法
JP2003340355A (ja) * 2002-05-30 2003-12-02 Nitto Denko Corp 塗工液の塗工方法及び光学フィルムの製造方法
JP4313026B2 (ja) * 2002-11-08 2009-08-12 株式会社ヒラノテクシード 毛管現象による塗工ノズルを用いた有機ｅｌパネルの製造装置及び製造方法
JP2004311884A (ja) * 2003-04-10 2004-11-04 Hoya Corp レジスト膜の形成方法及びフォトマスクの製造方法
JP2007054719A (ja) * 2005-08-23 2007-03-08 Hirano Tecseed Co Ltd 薄膜形成方法

Also Published As

Publication number Publication date
KR20090004588A (ko) 2009-01-12
TWI471682B (zh) 2015-02-01
KR101523093B1 (ko) 2015-05-26
TW200931169A (en) 2009-07-16

Similar Documents

Publication Publication Date Title
TW200610582A (en) Inkjet spray method and display device manufacturing method
EP1854909A3 (en) Coating structure and method for forming the same
WO2006062930A3 (en) Method and system for fast filling of templates for imprint lithography using on template dispense
TW200644075A (en) Method of forming film pattern, film pattern, device, electro optic device, and electronic apparatus background of the invention
JP2006313910A5 (zh)
TW200618303A (en) Thin film etching method and method of fabricating liquid crystal display device using the same
WO2005111722A3 (en) Apparatus and method for providing fluid for immersion lithography
EP2490248A3 (en) Exposure apparatus and device manufacturing method
WO2009001935A1 (ja) 薄膜形成方法、有機エレクトロルミネッセンス素子の製造方法、半導体素子の製造方法及び光学素子の製造方法
WO2008084658A1 (ja) 半導体装置の製造方法、半導体製造装置及び記憶媒体
TW200705113A (en) Exposure method, exposure apparatus, method for manufacturing device, and film evaluation method
CN101198902A (zh) 具有化学构图表面的软平版印刷印模
BR0209038A (pt) Método para formar um revestimento lìquido sobre um substrato, e, aparelho de revestimento
TWI266357B (en) Pattern forming method and method for manufacturing semiconductor device
TW200618699A (en) Thin-film pattern forming method, semiconductor device, electro-optic device, and electronic apparatus
WO2012075056A3 (en) Articles including surface microfeatures and methods for forming same
TW200703454A (en) Slit nozzle, substrate processing apparatus, and substrate processing method
TW200640318A (en) Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus
TW200951620A (en) Method of manufacturing a mask blank and method of manufacturing a photomask
TW200731018A (en) Method and apparatus for photoelectrochemical etching
CN104786630B (zh) 一种凹印版、其制作方法及应用
MY150117A (en) Method of manufacturing mask blank and method of manufacturing photomask
MY150671A (en) Method for manufacturing mask blank and coating apparatus
TW200744858A (en) Method and apparatus for manufacturing a pattern on a substrate and a liquid crystal display
JP2008176102A (ja) ペリクルフレームへの膜接着剤の塗布方法