WO2009001935A1 - 薄膜形成方法、有機エレクトロルミネッセンス素子の製造方法、半導体素子の製造方法及び光学素子の製造方法 - Google Patents
薄膜形成方法、有機エレクトロルミネッセンス素子の製造方法、半導体素子の製造方法及び光学素子の製造方法 Download PDFInfo
- Publication number
- WO2009001935A1 WO2009001935A1 PCT/JP2008/061756 JP2008061756W WO2009001935A1 WO 2009001935 A1 WO2009001935 A1 WO 2009001935A1 JP 2008061756 W JP2008061756 W JP 2008061756W WO 2009001935 A1 WO2009001935 A1 WO 2009001935A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- manufacturing
- thin film
- forming
- substrate
- liquid
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 9
- 238000004519 manufacturing process Methods 0.000 title abstract 4
- 239000010409 thin film Substances 0.000 title abstract 4
- 230000003287 optical effect Effects 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 6
- 239000011344 liquid material Substances 0.000 abstract 5
- 239000005871 repellent Substances 0.000 abstract 4
- 238000000576 coating method Methods 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/666,950 US20100227477A1 (en) | 2007-06-28 | 2008-06-27 | Method for forming thin film, method for producing organic electroluminescent device, method for producing semiconductor device, and method for producing optical device |
CN200880104014A CN101785363A (zh) | 2007-06-28 | 2008-06-27 | 薄膜的形成方法、有机电致发光元件的制造方法、半导体元件的制造方法及光学元件的制造方法 |
EP08777668.8A EP2175694A4 (en) | 2007-06-28 | 2008-06-27 | METHOD FOR FORMING THIN FILM, METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING OPTICAL DEVICE |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007170487A JP5343330B2 (ja) | 2007-06-28 | 2007-06-28 | 薄膜形成方法、有機エレクトロルミネッセンス素子の製造方法、半導体素子の製造方法及び光学素子の製造方法 |
JP2007-170487 | 2007-06-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009001935A1 true WO2009001935A1 (ja) | 2008-12-31 |
Family
ID=40185744
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/061756 WO2009001935A1 (ja) | 2007-06-28 | 2008-06-27 | 薄膜形成方法、有機エレクトロルミネッセンス素子の製造方法、半導体素子の製造方法及び光学素子の製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100227477A1 (ja) |
EP (1) | EP2175694A4 (ja) |
JP (1) | JP5343330B2 (ja) |
KR (1) | KR20100038210A (ja) |
CN (1) | CN101785363A (ja) |
TW (1) | TWI441257B (ja) |
WO (1) | WO2009001935A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014138106A (ja) * | 2013-01-17 | 2014-07-28 | Yamagata Univ | 電子デバイス及びその製造方法 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120211083A1 (en) * | 2009-10-29 | 2012-08-23 | Takahiro Seike | Method for manufacturing organic thin film solar cell module |
JP5467246B2 (ja) * | 2010-03-24 | 2014-04-09 | 学校法人福岡大学 | 配線パターン形成方法、及び配線基板 |
WO2013161165A1 (ja) * | 2012-04-27 | 2013-10-31 | パナソニック株式会社 | 有機el素子、およびそれを備える有機elパネル、有機el発光装置、有機el表示装置 |
CN104218190B (zh) * | 2014-08-26 | 2017-02-15 | 京东方科技集团股份有限公司 | 有机电致发光器件及其制造方法、显示装置 |
JP6529842B2 (ja) * | 2015-07-14 | 2019-06-12 | 芝浦メカトロニクス株式会社 | インプリント用のテンプレート製造装置及びテンプレート製造方法 |
US10862062B2 (en) * | 2016-05-23 | 2020-12-08 | Konica Minolta Laboratory U.S.A., Inc. | Method of forming transparent correlated metal electrode |
FR3063288B1 (fr) * | 2017-02-28 | 2019-03-22 | Saint-Gobain Glass France | Article pour piece humide comprenant un vitrage hydrophobe |
CN108695434B (zh) * | 2017-04-07 | 2021-10-26 | 元太科技工业股份有限公司 | 有机薄膜晶体管及其制作方法 |
JP7272957B2 (ja) * | 2017-10-27 | 2023-05-12 | 住友化学株式会社 | 偏光フィルムの製造方法及び偏光フィルム |
JP7102131B2 (ja) * | 2017-12-01 | 2022-07-19 | キヤノン株式会社 | トップエミッション型の有機el素子およびその製造方法 |
KR102491393B1 (ko) | 2017-12-07 | 2023-01-20 | 엘지디스플레이 주식회사 | 전계 발광 표시장치 |
CN110429197A (zh) * | 2018-09-20 | 2019-11-08 | 广东聚华印刷显示技术有限公司 | 薄膜封装结构、薄膜封装方法及显示面板 |
CN111370439A (zh) | 2018-12-07 | 2020-07-03 | 京东方科技集团股份有限公司 | 显示面板及其制备方法、显示装置 |
CN111799395B (zh) * | 2020-07-23 | 2023-09-19 | 京东方科技集团股份有限公司 | 显示面板及其制作方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998012689A1 (fr) * | 1996-09-19 | 1998-03-26 | Seiko Epson Corporation | Ecran matriciel et son procede de fabrication |
JP2002222695A (ja) | 2000-11-27 | 2002-08-09 | Seiko Epson Corp | 有機エレクトロルミネッセンス装置の製造方法および有機エレクトロルミネッセンス装置並びに電子機器 |
JP2002237383A (ja) * | 2000-03-31 | 2002-08-23 | Seiko Epson Corp | 有機el素子の製造方法、有機el素子 |
JP2003023276A (ja) | 2001-07-09 | 2003-01-24 | Matsushita Electric Ind Co Ltd | 電子機器の筐体構造 |
JP2004098351A (ja) * | 2002-09-05 | 2004-04-02 | Dainippon Printing Co Ltd | パターン形成体 |
JP2004098350A (ja) * | 2002-09-05 | 2004-04-02 | Dainippon Printing Co Ltd | 高親水性積層体 |
JP2006026522A (ja) * | 2004-07-15 | 2006-02-02 | Seiko Epson Corp | 薄膜パターンの形成方法、デバイスおよびその製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020075422A1 (en) * | 1996-09-19 | 2002-06-20 | Seiko Epson Corporation | Matrix type display device and manufacturing method thereof |
TW480722B (en) * | 1999-10-12 | 2002-03-21 | Semiconductor Energy Lab | Manufacturing method of electro-optical device |
TW490997B (en) * | 2000-03-31 | 2002-06-11 | Seiko Epson Corp | Method of manufacturing organic EL element, and organic EL element |
GB2388709A (en) * | 2002-05-17 | 2003-11-19 | Seiko Epson Corp | Circuit fabrication method |
JP2005056757A (ja) * | 2003-08-06 | 2005-03-03 | Seiko Epson Corp | 有機エレクトロルミネッセンス装置の製造方法、有機エレクトロルミネッセンス装置、電子機器 |
WO2005060017A1 (en) * | 2003-12-16 | 2005-06-30 | Matsushita Electric Industrial Co., Ltd. | Organic electroluminescent device and method for manufacturing the same |
GB0407739D0 (en) * | 2004-04-05 | 2004-05-12 | Univ Cambridge Tech | Dual-gate transistors |
US7586171B2 (en) * | 2004-04-14 | 2009-09-08 | Yong Cao | Organic electronic device comprising conductive members and processes for forming and using the organic electronic device |
JP2006013139A (ja) * | 2004-06-25 | 2006-01-12 | Seiko Epson Corp | 有機el装置とその製造方法並びに電子機器 |
JP2006135090A (ja) * | 2004-11-05 | 2006-05-25 | Seiko Epson Corp | 基板の製造方法 |
JP4251329B2 (ja) * | 2005-12-20 | 2009-04-08 | カシオ計算機株式会社 | 表示装置及びその製造方法 |
-
2007
- 2007-06-28 JP JP2007170487A patent/JP5343330B2/ja not_active Expired - Fee Related
-
2008
- 2008-06-27 TW TW097124055A patent/TWI441257B/zh not_active IP Right Cessation
- 2008-06-27 KR KR1020107001856A patent/KR20100038210A/ko not_active Application Discontinuation
- 2008-06-27 US US12/666,950 patent/US20100227477A1/en not_active Abandoned
- 2008-06-27 EP EP08777668.8A patent/EP2175694A4/en not_active Withdrawn
- 2008-06-27 WO PCT/JP2008/061756 patent/WO2009001935A1/ja active Application Filing
- 2008-06-27 CN CN200880104014A patent/CN101785363A/zh active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998012689A1 (fr) * | 1996-09-19 | 1998-03-26 | Seiko Epson Corporation | Ecran matriciel et son procede de fabrication |
JP2002237383A (ja) * | 2000-03-31 | 2002-08-23 | Seiko Epson Corp | 有機el素子の製造方法、有機el素子 |
JP2002222695A (ja) | 2000-11-27 | 2002-08-09 | Seiko Epson Corp | 有機エレクトロルミネッセンス装置の製造方法および有機エレクトロルミネッセンス装置並びに電子機器 |
JP2003023276A (ja) | 2001-07-09 | 2003-01-24 | Matsushita Electric Ind Co Ltd | 電子機器の筐体構造 |
JP2004098351A (ja) * | 2002-09-05 | 2004-04-02 | Dainippon Printing Co Ltd | パターン形成体 |
JP2004098350A (ja) * | 2002-09-05 | 2004-04-02 | Dainippon Printing Co Ltd | 高親水性積層体 |
JP2006026522A (ja) * | 2004-07-15 | 2006-02-02 | Seiko Epson Corp | 薄膜パターンの形成方法、デバイスおよびその製造方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2175694A4 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014138106A (ja) * | 2013-01-17 | 2014-07-28 | Yamagata Univ | 電子デバイス及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2009009833A (ja) | 2009-01-15 |
JP5343330B2 (ja) | 2013-11-13 |
EP2175694A1 (en) | 2010-04-14 |
KR20100038210A (ko) | 2010-04-13 |
CN101785363A (zh) | 2010-07-21 |
TW200910456A (en) | 2009-03-01 |
TWI441257B (zh) | 2014-06-11 |
EP2175694A4 (en) | 2013-09-25 |
US20100227477A1 (en) | 2010-09-09 |
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