MY144294A - Solution and process to treat surfaces of copper alloys in order to improve the adhesion between the metal surface and the bonded polymeric material - Google Patents

Solution and process to treat surfaces of copper alloys in order to improve the adhesion between the metal surface and the bonded polymeric material

Info

Publication number
MY144294A
MY144294A MYPI20083112A MYPI20083112A MY144294A MY 144294 A MY144294 A MY 144294A MY PI20083112 A MYPI20083112 A MY PI20083112A MY PI20083112 A MYPI20083112 A MY PI20083112A MY 144294 A MY144294 A MY 144294A
Authority
MY
Malaysia
Prior art keywords
solution
polymeric material
adhesion
improve
metal surface
Prior art date
Application number
MYPI20083112A
Other languages
English (en)
Inventor
Wunderlich Christian
Barthelmes Jurgen
Watanabe Kiyoshi
Neoh Din-Ghee
Lam Patrick
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of MY144294A publication Critical patent/MY144294A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/18—Acidic compositions for etching copper or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/383—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by microetching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
    • H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Laminated Bodies (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Weting (AREA)
MYPI20083112A 2006-02-17 2008-08-15 Solution and process to treat surfaces of copper alloys in order to improve the adhesion between the metal surface and the bonded polymeric material MY144294A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP06003278A EP1820884B1 (en) 2006-02-17 2006-02-17 Solution and process to treat surfaces of copper alloys in order to improve the adhesion between the metal surface and the bonded polymeric material

Publications (1)

Publication Number Publication Date
MY144294A true MY144294A (en) 2011-08-29

Family

ID=36636657

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20083112A MY144294A (en) 2006-02-17 2008-08-15 Solution and process to treat surfaces of copper alloys in order to improve the adhesion between the metal surface and the bonded polymeric material

Country Status (9)

Country Link
US (3) US20100288731A1 (enExample)
EP (1) EP1820884B1 (enExample)
JP (2) JP5300135B2 (enExample)
CN (1) CN101379220B (enExample)
AT (1) ATE445031T1 (enExample)
DE (1) DE602006009614D1 (enExample)
MY (1) MY144294A (enExample)
TW (2) TW201529889A (enExample)
WO (1) WO2007093284A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009059910A (ja) * 2007-08-31 2009-03-19 Panasonic Corp リード、配線部材、パッケージ部品、樹脂付金属部品及び樹脂封止半導体装置、並びにこれらの製造方法
CN102037157B (zh) † 2008-03-21 2014-05-28 恩索恩公司 用多官能化合物促进金属对层压板的粘合力
JP2009245960A (ja) * 2008-03-28 2009-10-22 Panasonic Corp 半導体装置用パッケージ、半導体装置、及びその製造方法
ES2365186T3 (es) * 2008-10-13 2011-09-26 Atotech Deutschland Gmbh Procedimiento para mejorar la adherencia entre superficies de plata y materiales de resina.
KR101560000B1 (ko) 2009-02-06 2015-10-13 동우 화인켐 주식회사 액정표시장치용 어레이 기판의 제조방법
JP5443863B2 (ja) * 2009-07-09 2014-03-19 株式会社Ａｄｅｋａ 銅含有材料用エッチング剤組成物及び銅含有材料のエッチング方法
US20130071658A1 (en) * 2010-03-24 2013-03-21 Sekisui Chemical Co., Ltd. Adhesive composition, adhesive tape, method for processing semiconductor wafer and method for producing tsv wafer
US9763336B2 (en) * 2010-07-06 2017-09-12 Atotech Deutschland Gmbh Methods of treating metal surfaces and devices formed thereby
KR101366938B1 (ko) * 2012-01-06 2014-02-25 삼성전기주식회사 에칭액 및 이를 이용한 인쇄 배선 기판의 제조방법
JP5219008B1 (ja) 2012-07-24 2013-06-26 メック株式会社 銅のマイクロエッチング剤及びその補給液、並びに配線基板の製造方法
CN104674222A (zh) * 2013-11-27 2015-06-03 芝普企业股份有限公司 可有效减缓贾凡尼效应的刻蚀液
JP5792336B2 (ja) * 2014-02-28 2015-10-07 芝普企業股▲分▼有限公司 有効にガルバノ効果を軽減できるエッチング液
EP3159432B1 (en) * 2015-10-23 2020-08-05 ATOTECH Deutschland GmbH Surface treatment agent for copper and copper alloy surfaces
JP6756847B2 (ja) 2016-03-11 2020-09-16 アトテツク・ドイチユラント・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツングＡｔｏｔｅｃｈ Ｄｅｕｔｓｃｈｌａｎｄ ＧｍｂＨ リードフレーム構造体、リードフレーム、表面実装電子部品、およびこれらの製造方法
JP6354086B1 (ja) 2017-01-21 2018-07-11 メック株式会社 被膜形成用組成物、表面処理金属部材の製造方法、および金属‐樹脂複合体の製造方法
JP6387543B1 (ja) 2017-05-11 2018-09-12 メック株式会社 被膜形成用組成物、表面処理金属部材の製造方法、および金属‐樹脂複合体の製造方法
TWI749287B (zh) * 2019-01-22 2021-12-11 達興材料股份有限公司 酸性過氧化氫水溶液組成物
JP7363105B2 (ja) 2019-05-31 2023-10-18 株式会社レゾナック 感光性樹脂組成物、感光性樹脂フィルム、プリント配線板及び半導体パッケージ、並びにプリント配線板の製造方法
EP4279634A1 (en) * 2022-05-17 2023-11-22 Atotech Deutschland GmbH & Co. KG Method for nano etching of copper and copper alloy surfaces

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3645772A (en) 1970-06-30 1972-02-29 Du Pont Process for improving bonding of a photoresist to copper
JPS5221460B1 (enExample) * 1971-04-26 1977-06-10
JPH0897559A (ja) 1994-09-26 1996-04-12 Okuno Chem Ind Co Ltd 多層プリント配線板の内層用回路板の銅箔処理方法、及び該内層用回路板の銅箔処理液
GB9425090D0 (en) 1994-12-12 1995-02-08 Alpha Metals Ltd Copper coating
JP3361680B2 (ja) * 1995-12-27 2003-01-07 日本パーオキサイド株式会社 銅又は銅合金の表面処理液
TW374802B (en) * 1996-07-29 1999-11-21 Ebara Densan Ltd Etching composition, method for roughening copper surface and method for producing printed wiring board
US5869130A (en) 1997-06-12 1999-02-09 Mac Dermid, Incorporated Process for improving the adhesion of polymeric materials to metal surfaces
US6162366A (en) * 1997-12-25 2000-12-19 Canon Kabushiki Kaisha Etching process
TW460622B (en) 1998-02-03 2001-10-21 Atotech Deutschland Gmbh Solution and process to pretreat copper surfaces
TW470785B (en) * 1998-02-03 2002-01-01 Atotech Deutschland Gmbh Process for preliminary treatment of copper surfaces
JP2000064067A (ja) * 1998-06-09 2000-02-29 Ebara Densan Ltd エッチング液および銅表面の粗化処理方法
US6117250A (en) * 1999-02-25 2000-09-12 Morton International Inc. Thiazole and thiocarbamide based chemicals for use with oxidative etchant solutions
DE10066028C2 (de) * 2000-07-07 2003-04-24 Atotech Deutschland Gmbh Kupfersubstrat mit aufgerauhten Oberflächen
JP4309602B2 (ja) * 2001-04-25 2009-08-05 メック株式会社 銅または銅合金と樹脂との接着性を向上させる方法、ならびに積層体
DE10302596A1 (de) * 2002-01-24 2003-08-28 Shipley Company Marlborough Behandlung von Metalloberflächen mit einer modifizierten Oxidaustauschmasse
KR100960687B1 (ko) * 2003-06-24 2010-06-01 엘지디스플레이 주식회사 구리(또는 구리합금층)를 포함하는 이중금속층을 일괄식각하기위한 식각액
US20050067378A1 (en) * 2003-09-30 2005-03-31 Harry Fuerhaupter Method for micro-roughening treatment of copper and mixed-metal circuitry

Also Published As

Publication number Publication date
US20160222523A1 (en) 2016-08-04
EP1820884B1 (en) 2009-10-07
TW200745379A (en) 2007-12-16
JP2013151757A (ja) 2013-08-08
CN101379220A (zh) 2009-03-04
WO2007093284A1 (en) 2007-08-23
ATE445031T1 (de) 2009-10-15
JP2009526909A (ja) 2009-07-23
JP5300135B2 (ja) 2013-09-25
TWI495759B (zh) 2015-08-11
EP1820884A1 (en) 2007-08-22
US20160168722A1 (en) 2016-06-16
DE602006009614D1 (de) 2009-11-19
JP5710670B2 (ja) 2015-04-30
US20100288731A1 (en) 2010-11-18
CN101379220B (zh) 2011-05-11
TW201529889A (zh) 2015-08-01

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