JP5300135B2 - 金属表面と接合した高分子材料との間の接着性を向上するために銅合金の表面を処理する溶液および方法 - Google Patents

金属表面と接合した高分子材料との間の接着性を向上するために銅合金の表面を処理する溶液および方法 Download PDF

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Publication number
JP5300135B2
JP5300135B2 JP2008554623A JP2008554623A JP5300135B2 JP 5300135 B2 JP5300135 B2 JP 5300135B2 JP 2008554623 A JP2008554623 A JP 2008554623A JP 2008554623 A JP2008554623 A JP 2008554623A JP 5300135 B2 JP5300135 B2 JP 5300135B2
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Japan
Prior art keywords
acid
solution
group
solution according
phenyl
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Expired - Fee Related
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JP2008554623A
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Japanese (ja)
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JP2009526909A (ja
JP2009526909A5 (enExample
Inventor
クリスティアン・ブンデリッヒ
ユルゲン・バーテルメス
清志 渡辺
ディン−ジー・ネオ
パトリック・ラム
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Atotech Deutschland GmbH and Co KG
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Atotech Deutschland GmbH and Co KG
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Publication of JP2009526909A5 publication Critical patent/JP2009526909A5/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/18—Acidic compositions for etching copper or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/383—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by microetching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
    • H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Laminated Bodies (AREA)
  • Weting (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
JP2008554623A 2006-02-17 2007-01-31 金属表面と接合した高分子材料との間の接着性を向上するために銅合金の表面を処理する溶液および方法 Expired - Fee Related JP5300135B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06003278.6 2006-02-17
EP06003278A EP1820884B1 (en) 2006-02-17 2006-02-17 Solution and process to treat surfaces of copper alloys in order to improve the adhesion between the metal surface and the bonded polymeric material
PCT/EP2007/000826 WO2007093284A1 (en) 2006-02-17 2007-01-31 Solution and process to treat surfaces of copper alloys in order to improve the adhesion between the metal surface and the bonded polymeric material

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013057660A Division JP5710670B2 (ja) 2006-02-17 2013-03-21 金属表面と接合した高分子材料との間の接着性を向上するために銅合金の表面を処理する溶液および方法

Publications (3)

Publication Number Publication Date
JP2009526909A JP2009526909A (ja) 2009-07-23
JP2009526909A5 JP2009526909A5 (enExample) 2013-06-20
JP5300135B2 true JP5300135B2 (ja) 2013-09-25

Family

ID=36636657

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2008554623A Expired - Fee Related JP5300135B2 (ja) 2006-02-17 2007-01-31 金属表面と接合した高分子材料との間の接着性を向上するために銅合金の表面を処理する溶液および方法
JP2013057660A Expired - Fee Related JP5710670B2 (ja) 2006-02-17 2013-03-21 金属表面と接合した高分子材料との間の接着性を向上するために銅合金の表面を処理する溶液および方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013057660A Expired - Fee Related JP5710670B2 (ja) 2006-02-17 2013-03-21 金属表面と接合した高分子材料との間の接着性を向上するために銅合金の表面を処理する溶液および方法

Country Status (9)

Country Link
US (3) US20100288731A1 (enExample)
EP (1) EP1820884B1 (enExample)
JP (2) JP5300135B2 (enExample)
CN (1) CN101379220B (enExample)
AT (1) ATE445031T1 (enExample)
DE (1) DE602006009614D1 (enExample)
MY (1) MY144294A (enExample)
TW (2) TWI495759B (enExample)
WO (1) WO2007093284A1 (enExample)

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JP2009059910A (ja) * 2007-08-31 2009-03-19 Panasonic Corp リード、配線部材、パッケージ部品、樹脂付金属部品及び樹脂封止半導体装置、並びにこれらの製造方法
CN102037157B (zh) † 2008-03-21 2014-05-28 恩索恩公司 用多官能化合物促进金属对层压板的粘合力
JP2009245960A (ja) * 2008-03-28 2009-10-22 Panasonic Corp 半導体装置用パッケージ、半導体装置、及びその製造方法
ES2365186T3 (es) 2008-10-13 2011-09-26 Atotech Deutschland Gmbh Procedimiento para mejorar la adherencia entre superficies de plata y materiales de resina.
KR101560000B1 (ko) 2009-02-06 2015-10-13 동우 화인켐 주식회사 액정표시장치용 어레이 기판의 제조방법
JP5443863B2 (ja) * 2009-07-09 2014-03-19 株式会社Ａｄｅｋａ 銅含有材料用エッチング剤組成物及び銅含有材料のエッチング方法
JP4846067B2 (ja) * 2010-03-24 2011-12-28 積水化学工業株式会社 半導体ウエハの処理方法及びｔｓｖウエハの製造方法
CN103118806B (zh) * 2010-07-06 2016-10-12 埃托特克德国有限公司 处理金属表面的方法和由此形成的器件
KR101366938B1 (ko) * 2012-01-06 2014-02-25 삼성전기주식회사 에칭액 및 이를 이용한 인쇄 배선 기판의 제조방법
JP5219008B1 (ja) 2012-07-24 2013-06-26 メック株式会社 銅のマイクロエッチング剤及びその補給液、並びに配線基板の製造方法
CN104674222A (zh) * 2013-11-27 2015-06-03 芝普企业股份有限公司 可有效减缓贾凡尼效应的刻蚀液
JP5792336B2 (ja) * 2014-02-28 2015-10-07 芝普企業股▲分▼有限公司 有効にガルバノ効果を軽減できるエッチング液
EP3159432B1 (en) * 2015-10-23 2020-08-05 ATOTECH Deutschland GmbH Surface treatment agent for copper and copper alloy surfaces
MY197351A (en) 2016-03-11 2023-06-14 Atotech Deutschland Gmbh Lead-frame structure, lead-frame, surface mount electronic device and methods of producing same
JP6354086B1 (ja) 2017-01-21 2018-07-11 メック株式会社 被膜形成用組成物、表面処理金属部材の製造方法、および金属‐樹脂複合体の製造方法
JP6387543B1 (ja) 2017-05-11 2018-09-12 メック株式会社 被膜形成用組成物、表面処理金属部材の製造方法、および金属‐樹脂複合体の製造方法
TWI749287B (zh) * 2019-01-22 2021-12-11 達興材料股份有限公司 酸性過氧化氫水溶液組成物
JP7363105B2 (ja) 2019-05-31 2023-10-18 株式会社レゾナック 感光性樹脂組成物、感光性樹脂フィルム、プリント配線板及び半導体パッケージ、並びにプリント配線板の製造方法
EP4279634A1 (en) * 2022-05-17 2023-11-22 Atotech Deutschland GmbH & Co. KG Method for nano etching of copper and copper alloy surfaces

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US3645772A (en) 1970-06-30 1972-02-29 Du Pont Process for improving bonding of a photoresist to copper
JPS5221460B1 (enExample) * 1971-04-26 1977-06-10
JPH0897559A (ja) 1994-09-26 1996-04-12 Okuno Chem Ind Co Ltd 多層プリント配線板の内層用回路板の銅箔処理方法、及び該内層用回路板の銅箔処理液
GB9425090D0 (en) 1994-12-12 1995-02-08 Alpha Metals Ltd Copper coating
JP3361680B2 (ja) * 1995-12-27 2003-01-07 日本パーオキサイド株式会社 銅又は銅合金の表面処理液
TW374802B (en) * 1996-07-29 1999-11-21 Ebara Densan Ltd Etching composition, method for roughening copper surface and method for producing printed wiring board
US5869130A (en) 1997-06-12 1999-02-09 Mac Dermid, Incorporated Process for improving the adhesion of polymeric materials to metal surfaces
US6162366A (en) * 1997-12-25 2000-12-19 Canon Kabushiki Kaisha Etching process
TW470785B (en) * 1998-02-03 2002-01-01 Atotech Deutschland Gmbh Process for preliminary treatment of copper surfaces
TW460622B (en) * 1998-02-03 2001-10-21 Atotech Deutschland Gmbh Solution and process to pretreat copper surfaces
JP2000064067A (ja) * 1998-06-09 2000-02-29 Ebara Densan Ltd エッチング液および銅表面の粗化処理方法
US6117250A (en) * 1999-02-25 2000-09-12 Morton International Inc. Thiazole and thiocarbamide based chemicals for use with oxidative etchant solutions
DE10066028C2 (de) * 2000-07-07 2003-04-24 Atotech Deutschland Gmbh Kupfersubstrat mit aufgerauhten Oberflächen
JP4309602B2 (ja) * 2001-04-25 2009-08-05 メック株式会社 銅または銅合金と樹脂との接着性を向上させる方法、ならびに積層体
DE10302596A1 (de) * 2002-01-24 2003-08-28 Shipley Company Marlborough Behandlung von Metalloberflächen mit einer modifizierten Oxidaustauschmasse
KR100960687B1 (ko) * 2003-06-24 2010-06-01 엘지디스플레이 주식회사 구리(또는 구리합금층)를 포함하는 이중금속층을 일괄식각하기위한 식각액
US20050067378A1 (en) * 2003-09-30 2005-03-31 Harry Fuerhaupter Method for micro-roughening treatment of copper and mixed-metal circuitry

Also Published As

Publication number Publication date
CN101379220A (zh) 2009-03-04
US20160168722A1 (en) 2016-06-16
TW201529889A (zh) 2015-08-01
EP1820884A1 (en) 2007-08-22
JP2013151757A (ja) 2013-08-08
JP2009526909A (ja) 2009-07-23
TWI495759B (zh) 2015-08-11
WO2007093284A1 (en) 2007-08-23
ATE445031T1 (de) 2009-10-15
TW200745379A (en) 2007-12-16
CN101379220B (zh) 2011-05-11
US20160222523A1 (en) 2016-08-04
EP1820884B1 (en) 2009-10-07
US20100288731A1 (en) 2010-11-18
MY144294A (en) 2011-08-29
JP5710670B2 (ja) 2015-04-30
DE602006009614D1 (de) 2009-11-19

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