MXPA05009864A - Metodo de grabado al aguafuerte selectivo utilizando capa de detencion de grabado al aguafuerte. - Google Patents

Metodo de grabado al aguafuerte selectivo utilizando capa de detencion de grabado al aguafuerte.

Info

Publication number
MXPA05009864A
MXPA05009864A MXPA05009864A MXPA05009864A MXPA05009864A MX PA05009864 A MXPA05009864 A MX PA05009864A MX PA05009864 A MXPA05009864 A MX PA05009864A MX PA05009864 A MXPA05009864 A MX PA05009864A MX PA05009864 A MXPA05009864 A MX PA05009864A
Authority
MX
Mexico
Prior art keywords
layer
etch stop
stop layer
selective etching
mirror
Prior art date
Application number
MXPA05009864A
Other languages
English (en)
Inventor
Brian J Gally
Original Assignee
Idc Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idc Llc filed Critical Idc Llc
Publication of MXPA05009864A publication Critical patent/MXPA05009864A/es

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00777—Preserve existing structures from alteration, e.g. temporary protection during manufacturing
    • B81C1/00785—Avoid chemical alteration, e.g. contamination, oxidation or unwanted etching
    • B81C1/00793—Avoid contamination, e.g. absorption of impurities or oxidation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00777—Preserve existing structures from alteration, e.g. temporary protection during manufacturing
    • B81C1/00785—Avoid chemical alteration, e.g. contamination, oxidation or unwanted etching
    • B81C1/00801—Avoid alteration of functional structures by etching, e.g. using a passivation layer or an etch stop layer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/042—Micromirrors, not used as optical switches
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0128—Processes for removing material
    • B81C2201/013—Etching
    • B81C2201/0135—Controlling etch progression
    • B81C2201/014—Controlling etch progression by depositing an etch stop layer, e.g. silicon nitride, silicon oxide, metal

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

La fabricacion de un dispositivo de MEMS tal como un modulador interferometrico se mejora al emplear una capa de detencion de grabado al aguafuerte entre una capa de sacrificio y una capa de espejo. El reten de grabado al aguafuerte puede reducir el sobre-grabado al aguafuerte indeseable de la capa de sacrificio y la capa de espejo. La capa de detencion de grabado al aguafuerte tambien puede servir como una capa de barrera, capa amortiguadora y/o capa de plantilla.
MXPA05009864A 2004-09-27 2005-09-14 Metodo de grabado al aguafuerte selectivo utilizando capa de detencion de grabado al aguafuerte. MXPA05009864A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US61341004P 2004-09-27 2004-09-27
US11/090,773 US20060066932A1 (en) 2004-09-27 2005-03-25 Method of selective etching using etch stop layer

Publications (1)

Publication Number Publication Date
MXPA05009864A true MXPA05009864A (es) 2006-03-29

Family

ID=35462575

Family Applications (1)

Application Number Title Priority Date Filing Date
MXPA05009864A MXPA05009864A (es) 2004-09-27 2005-09-14 Metodo de grabado al aguafuerte selectivo utilizando capa de detencion de grabado al aguafuerte.

Country Status (11)

Country Link
US (1) US20060066932A1 (es)
EP (1) EP1640768A1 (es)
JP (1) JP2006091852A (es)
KR (1) KR20060092871A (es)
AU (1) AU2005203258A1 (es)
BR (1) BRPI0503833A (es)
CA (1) CA2514349A1 (es)
MX (1) MXPA05009864A (es)
RU (1) RU2005129861A (es)
SG (1) SG121046A1 (es)
TW (1) TW200626481A (es)

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Also Published As

Publication number Publication date
RU2005129861A (ru) 2007-04-10
AU2005203258A1 (en) 2006-04-13
JP2006091852A (ja) 2006-04-06
EP1640768A1 (en) 2006-03-29
SG121046A1 (en) 2006-04-26
KR20060092871A (ko) 2006-08-23
BRPI0503833A (pt) 2006-05-09
US20060066932A1 (en) 2006-03-30
CA2514349A1 (en) 2006-03-27
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