MX2020010168A - Polímeros de triol-acrilato, métodos de síntesis de los mismos y uso en tecnologías de fabricación por adición. - Google Patents

Polímeros de triol-acrilato, métodos de síntesis de los mismos y uso en tecnologías de fabricación por adición.

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Publication number
MX2020010168A
MX2020010168A MX2020010168A MX2020010168A MX2020010168A MX 2020010168 A MX2020010168 A MX 2020010168A MX 2020010168 A MX2020010168 A MX 2020010168A MX 2020010168 A MX2020010168 A MX 2020010168A MX 2020010168 A MX2020010168 A MX 2020010168A
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MX
Mexico
Prior art keywords
thiol
additive manufacturing
synthesis
methods
resin
Prior art date
Application number
MX2020010168A
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English (en)
Inventor
Walter Voit
Benjamin Lund
Jesse Huffstetler
Daniel Zamorano
Sushanta Das
Crystal Niermann
Caleb Lund
Amy Nguyen
Yili Wu
Original Assignee
Benjamin Lund
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Benjamin Lund filed Critical Benjamin Lund
Publication of MX2020010168A publication Critical patent/MX2020010168A/es

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    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/343—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate in the form of urethane links
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
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    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
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    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
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    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
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    • C08F220/56—Acrylamide; Methacrylamide
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    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/04—Anhydrides, e.g. cyclic anhydrides
    • C08F222/06—Maleic anhydride
    • C08F222/08—Maleic anhydride with vinyl aromatic monomers
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    • C08F267/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated polycarboxylic acids or derivatives thereof as defined in group C08F22/00
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    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
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    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/06—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polyethers, polyoxymethylenes or polyacetals
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    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/12—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes
    • C08F283/124—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes on to polysiloxanes having carbon-to-carbon double bonds
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    • C08K5/00—Use of organic ingredients
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    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/39—Thiocarbamic acids; Derivatives thereof, e.g. dithiocarbamates
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    • C08L35/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
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    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
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    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

La presente descripción se refiere a composiciones de resina fotopolimerizable de tiol-acrilato. Las composiciones de resina se pueden utilizar para fabricación por adición. Una modalidad de la invención incluye una resina fotopolimerizable para fabricación por adición en un entorno de oxígeno, la resina comprende: un componente de reticulación; al menos un monómero y/u oligómero; y un agente de transferencia de cadena que comprende al menos uno de un tiol, un alcohol secundario, y/o una amina terciaria, en donde la resina se puede configurar para reaccionar por exposición a la luz para formar un material curado.
MX2020010168A 2018-03-28 2019-03-28 Polímeros de triol-acrilato, métodos de síntesis de los mismos y uso en tecnologías de fabricación por adición. MX2020010168A (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862649130P 2018-03-28 2018-03-28
US201862660894P 2018-04-20 2018-04-20
PCT/US2019/024704 WO2019191509A1 (en) 2018-03-28 2019-03-28 Thiol-acrylate polymers, methods of synthesis thereof and use in additive manufacturing technologies

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MX2020010168A true MX2020010168A (es) 2021-03-09

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US (4) US20210018835A1 (es)
EP (3) EP3776081A4 (es)
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KR (1) KR20210030895A (es)
CN (1) CN112513736A (es)
AU (1) AU2019243569A1 (es)
CA (1) CA3095462A1 (es)
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WO (1) WO2019191509A1 (es)

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CN111766762A (zh) * 2020-06-24 2020-10-13 清华大学 光刻胶组合物及用它形成薄膜图案和阵列基板的方法
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WO2023039219A1 (en) * 2021-09-10 2023-03-16 Adaptive 3D Technologies, Llc Foaming polymeric materials
WO2023091487A1 (en) * 2021-11-17 2023-05-25 The Johns Hopkins University Customized external cranioplasty and method of production
CN114874360A (zh) * 2022-04-14 2022-08-09 北京化工大学 一种无芳环硫醇引发剂及其应用
WO2024141095A1 (en) * 2022-12-30 2024-07-04 Elkem Silicones Shanghai Co., Ltd. Method for manufacturing 3d printed article using a photocurable silicone composition

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