MX2009014171A - Proceso de deposicion. - Google Patents

Proceso de deposicion.

Info

Publication number
MX2009014171A
MX2009014171A MX2009014171A MX2009014171A MX2009014171A MX 2009014171 A MX2009014171 A MX 2009014171A MX 2009014171 A MX2009014171 A MX 2009014171A MX 2009014171 A MX2009014171 A MX 2009014171A MX 2009014171 A MX2009014171 A MX 2009014171A
Authority
MX
Mexico
Prior art keywords
coating
glass
deposition process
float
ribbon
Prior art date
Application number
MX2009014171A
Other languages
English (en)
Inventor
Simon James Hurst
Gutierrez Guillermo Benito
Troy Darrell Manning
Kevin David Sanderson
Original Assignee
Pilkington Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0713118A external-priority patent/GB0713118D0/en
Priority claimed from GB0807842A external-priority patent/GB0807842D0/en
Application filed by Pilkington Group Ltd filed Critical Pilkington Group Ltd
Publication of MX2009014171A publication Critical patent/MX2009014171A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Se describen recubrimientos de sílice anti-reflejantes que son depositados sobre la cinta de vidrio producida durante un proceso de producción de vidrio flotado o vidrio laminado usando un proceso de deposición por pirólisis a la flama que es preferiblemente un proceso de deposición de vapor químico por combustión. La temperatura de la cinta es mayor de 200ºC. El proceso se puede llevar a cabo en el espacio entre el baño de flotación o rodillos y el lehr de recocido La durabilidad del recubrimiento puede ser incrementada mediante sinterización. El equipo comprende preferiblemente una unidad de extracción colocada adyacente a cada cabeza de quemador. En una modalidad adicional, se introduce oxígeno adicional al proceso de deposición de vapor con el fin de producir un recubrimiento que tiene un índice de refracción efectivo más bajo.
MX2009014171A 2007-07-06 2008-07-04 Proceso de deposicion. MX2009014171A (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0713118A GB0713118D0 (en) 2007-07-06 2007-07-06 Deposition process
GB0807842A GB0807842D0 (en) 2008-04-30 2008-04-30 Deposition process
PCT/GB2008/050538 WO2009007745A1 (en) 2007-07-06 2008-07-04 Deposition process

Publications (1)

Publication Number Publication Date
MX2009014171A true MX2009014171A (es) 2010-01-28

Family

ID=39737134

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2009014171A MX2009014171A (es) 2007-07-06 2008-07-04 Proceso de deposicion.

Country Status (7)

Country Link
US (1) US20110287178A1 (es)
EP (1) EP2167702A1 (es)
JP (1) JP2010532819A (es)
KR (1) KR20100035158A (es)
CN (1) CN101688305A (es)
MX (1) MX2009014171A (es)
WO (1) WO2009007745A1 (es)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0922395D0 (en) * 2009-12-22 2010-02-03 Pilkington Group Ltd Deposition process
US20110250346A1 (en) * 2010-04-07 2011-10-13 Remington Jr Michael P Adhesion of organic coatings on glass
US20110290316A1 (en) * 2010-05-28 2011-12-01 Daniel Warren Hawtof Light scattering inorganic substrates by soot deposition
GB201108244D0 (en) 2011-05-17 2011-06-29 Pilkington Group Ltd Burner for flame coating
DE102011076830A1 (de) * 2011-05-31 2012-12-06 Innovent E.V. Verfahren und Vorrichtung zum Beschichten eines Floatglasbandes
JPWO2013008895A1 (ja) * 2011-07-12 2015-02-23 旭硝子株式会社 積層膜付きガラス基板の製造方法
US9321669B2 (en) 2011-08-23 2016-04-26 Corning Incorporated Thin glass sheet with tunable coefficient of thermal expansion

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0338417A3 (en) * 1988-04-18 1990-03-07 Ppg Industries, Inc. Haze-free infrared-reflecting coated glass
JPH04231336A (ja) * 1990-12-27 1992-08-20 Fujikura Ltd 光ファイバ母材の製造方法
DE4237921A1 (de) * 1992-10-23 1994-04-28 Flachglas Ag Verfahren und Vorrichtung zum Modifizieren der Oberflächenaktivität eines Silikatglassubstrates
JP3519406B2 (ja) * 1993-03-24 2004-04-12 ジョージア テック リサーチ コーポレイション フィルム及びコーティングの燃焼化学蒸着の方法
US5997956A (en) * 1995-08-04 1999-12-07 Microcoating Technologies Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions
GB9710547D0 (en) * 1997-05-23 1997-07-16 Pilkington Plc Coating method
GB9723222D0 (en) * 1997-11-04 1998-01-07 Pilkington Plc Coating glass
TW514557B (en) * 2000-09-15 2002-12-21 Shipley Co Llc Continuous feed coater
JP4315363B2 (ja) * 2001-12-03 2009-08-19 日本板硝子株式会社 薄膜形成方法
JP2004087292A (ja) * 2002-08-27 2004-03-18 Konica Minolta Holdings Inc 帯電防止機能体及びその製造方法
JP4032044B2 (ja) * 2003-06-17 2008-01-16 株式会社半導体プロセス研究所 成膜方法、半導体装置の製造方法及び半導体装置
JP4506110B2 (ja) * 2003-06-26 2010-07-21 コニカミノルタホールディングス株式会社 薄膜形成方法及び薄膜製造装置
DE102004019575A1 (de) * 2004-04-20 2005-11-24 Innovent E.V. Technologieentwicklung Verfahren zur Herstellung von transmissionsverbessernden und/oder reflexionsmindernden optischen Schichten
DE102004053707B8 (de) * 2004-11-03 2008-08-28 Schott Ag Verfahren zur Herstellung eines Glaskeramik-Artikels mit Diffusionsbarriere und Verwendung eines verfahrensgemäß hergestellten Glaskeramik-Artikels
US8088440B2 (en) * 2004-11-24 2012-01-03 Guardian Industries Corp. Hydrophobic coating including underlayer(s) deposited via flame pyrolysis
CH697933B1 (de) * 2005-11-03 2009-03-31 Tetra Laval Holdings & Finance Verfahren und Vorrichtung zur Beschichtung von Kunststofffolien mit einer Oxidschicht.
US20070113881A1 (en) * 2005-11-22 2007-05-24 Guardian Industries Corp. Method of making solar cell with antireflective coating using combustion chemical vapor deposition (CCVD) and corresponding product

Also Published As

Publication number Publication date
WO2009007745A1 (en) 2009-01-15
US20110287178A1 (en) 2011-11-24
KR20100035158A (ko) 2010-04-02
JP2010532819A (ja) 2010-10-14
EP2167702A1 (en) 2010-03-31
CN101688305A (zh) 2010-03-31

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