MX2009002181A - Metodo para la formacion de articulo recubierto con oxido de zinc. - Google Patents
Metodo para la formacion de articulo recubierto con oxido de zinc.Info
- Publication number
- MX2009002181A MX2009002181A MX2009002181A MX2009002181A MX2009002181A MX 2009002181 A MX2009002181 A MX 2009002181A MX 2009002181 A MX2009002181 A MX 2009002181A MX 2009002181 A MX2009002181 A MX 2009002181A MX 2009002181 A MX2009002181 A MX 2009002181A
- Authority
- MX
- Mexico
- Prior art keywords
- zinc oxide
- forming
- coated article
- oxide coated
- substrate
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/216—ZnO
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Chemical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
La invención descrita y reivindicada en la presente es concerniente con un proceso de deposición de vapor químico para depositar un recubrimiento de óxido de zinc sobre un sustrato al agregar dos corrientes precursoras gaseosas a una superficie de sustrato y mezclar las corrientes precursoras gaseosas en la superficie de sustrato por un tiempo suficientemente corto para formar un recubrimiento de óxido de zinc a una velocidad de deposición mayor de 5 nm/segundo.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US84091406P | 2006-08-29 | 2006-08-29 | |
PCT/US2007/010669 WO2008027087A1 (en) | 2006-08-29 | 2007-05-03 | Method of forming a zinc oxide coated article |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2009002181A true MX2009002181A (es) | 2009-04-22 |
Family
ID=38577550
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2009002181A MX2009002181A (es) | 2006-08-29 | 2007-05-03 | Metodo para la formacion de articulo recubierto con oxido de zinc. |
Country Status (11)
Country | Link |
---|---|
US (1) | US7732013B2 (es) |
EP (1) | EP2059627B1 (es) |
JP (2) | JP2010502832A (es) |
KR (1) | KR101383946B1 (es) |
CN (1) | CN101553601B (es) |
AU (1) | AU2007290844B2 (es) |
BR (1) | BRPI0716387A2 (es) |
MX (1) | MX2009002181A (es) |
MY (1) | MY147893A (es) |
RU (1) | RU2447031C2 (es) |
WO (1) | WO2008027087A1 (es) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FI123645B (fi) * | 2010-04-20 | 2013-08-30 | Beneq Oy | Aerosoliavusteinen kaasukasvatusjärjestelmä |
EP2688850B1 (en) * | 2011-03-23 | 2018-02-21 | Pilkington Group Limited | Method of depositing zinc oxide coatings by chemical vapor deposition |
KR101225739B1 (ko) * | 2011-04-22 | 2013-01-23 | 삼성코닝정밀소재 주식회사 | 광전지용 산화아연계 투명 도전막 및 그 제조방법 |
EP2825687B1 (en) * | 2012-03-16 | 2020-08-19 | Pilkington Group Limited | Chemical vapor deposition process for depositing zinc oxide coatings |
KR101466842B1 (ko) * | 2012-11-28 | 2014-11-28 | 코닝정밀소재 주식회사 | 투명전극용 산화아연계 박막 제조방법 |
EP4130010A1 (en) * | 2020-04-01 | 2023-02-08 | Adeka Corporation | Zinc compound, raw material for thin film formation, thin film, and method for producing thin film |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH640571A5 (fr) * | 1981-03-06 | 1984-01-13 | Battelle Memorial Institute | Procede et dispositif pour deposer sur un substrat une couche de matiere minerale. |
JPH0682625B2 (ja) * | 1985-06-04 | 1994-10-19 | シーメンス ソーラー インダストリーズ,エル.ピー. | 酸化亜鉛膜の蒸着方法 |
US5698262A (en) * | 1996-05-06 | 1997-12-16 | Libbey-Owens-Ford Co. | Method for forming tin oxide coating on glass |
US6238738B1 (en) * | 1996-08-13 | 2001-05-29 | Libbey-Owens-Ford Co. | Method for depositing titanium oxide coatings on flat glass |
US6071561A (en) * | 1997-08-13 | 2000-06-06 | President And Fellows Of Harvard College | Chemical vapor deposition of fluorine-doped zinc oxide |
US6268019B1 (en) | 1998-06-04 | 2001-07-31 | Atofina Chemicals, Inc. | Preparation of fluorine modified, low haze, titanium dioxide films |
JP2001023907A (ja) * | 1999-07-07 | 2001-01-26 | Mitsubishi Heavy Ind Ltd | 成膜装置 |
US6858306B1 (en) * | 1999-08-10 | 2005-02-22 | Pilkington North America Inc. | Glass article having a solar control coating |
WO2005072947A1 (en) * | 2004-01-23 | 2005-08-11 | Arkema Inc. | Solar control films composed of metal oxide heterostructures, and method of making same |
-
2007
- 2007-05-03 EP EP07776646.7A patent/EP2059627B1/en active Active
- 2007-05-03 CN CN200780031959XA patent/CN101553601B/zh active Active
- 2007-05-03 MX MX2009002181A patent/MX2009002181A/es active IP Right Grant
- 2007-05-03 AU AU2007290844A patent/AU2007290844B2/en not_active Ceased
- 2007-05-03 BR BRPI0716387-8A patent/BRPI0716387A2/pt not_active IP Right Cessation
- 2007-05-03 RU RU2009111377/03A patent/RU2447031C2/ru not_active IP Right Cessation
- 2007-05-03 US US11/800,043 patent/US7732013B2/en active Active
- 2007-05-03 JP JP2009526591A patent/JP2010502832A/ja active Pending
- 2007-05-03 KR KR1020097006351A patent/KR101383946B1/ko active IP Right Grant
- 2007-05-03 WO PCT/US2007/010669 patent/WO2008027087A1/en active Application Filing
- 2007-05-03 MY MYPI20090807A patent/MY147893A/en unknown
-
2012
- 2012-12-19 JP JP2012276582A patent/JP6039402B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2013053066A (ja) | 2013-03-21 |
BRPI0716387A2 (pt) | 2013-01-01 |
JP6039402B2 (ja) | 2016-12-07 |
CN101553601B (zh) | 2012-12-12 |
MY147893A (en) | 2013-01-31 |
JP2010502832A (ja) | 2010-01-28 |
EP2059627A1 (en) | 2009-05-20 |
CN101553601A (zh) | 2009-10-07 |
EP2059627B1 (en) | 2015-08-05 |
AU2007290844A1 (en) | 2008-03-06 |
RU2447031C2 (ru) | 2012-04-10 |
US7732013B2 (en) | 2010-06-08 |
WO2008027087A1 (en) | 2008-03-06 |
AU2007290844B2 (en) | 2011-08-04 |
KR101383946B1 (ko) | 2014-04-10 |
US20080057200A1 (en) | 2008-03-06 |
RU2009111377A (ru) | 2010-10-10 |
KR20090061635A (ko) | 2009-06-16 |
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Legal Events
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