JP2013053066A - 酸化亜鉛被覆物品の作成方法 - Google Patents
酸化亜鉛被覆物品の作成方法 Download PDFInfo
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- JP2013053066A JP2013053066A JP2012276582A JP2012276582A JP2013053066A JP 2013053066 A JP2013053066 A JP 2013053066A JP 2012276582 A JP2012276582 A JP 2012276582A JP 2012276582 A JP2012276582 A JP 2012276582A JP 2013053066 A JP2013053066 A JP 2013053066A
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- zinc
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- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 title claims abstract description 68
- 238000000034 method Methods 0.000 title claims abstract description 41
- 239000011787 zinc oxide Substances 0.000 title claims abstract description 34
- 238000000151 deposition Methods 0.000 claims abstract description 49
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 230000008021 deposition Effects 0.000 claims abstract description 37
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 31
- 239000002243 precursor Substances 0.000 claims abstract description 29
- 238000000576 coating method Methods 0.000 claims abstract description 22
- 239000011701 zinc Substances 0.000 claims abstract description 20
- 239000011248 coating agent Substances 0.000 claims abstract description 19
- 150000001875 compounds Chemical class 0.000 claims abstract description 19
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 16
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 6
- 239000007789 gas Substances 0.000 claims description 38
- 239000000203 mixture Substances 0.000 claims description 26
- 239000011521 glass Substances 0.000 claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 6
- DIHKMUNUGQVFES-UHFFFAOYSA-N n,n,n',n'-tetraethylethane-1,2-diamine Chemical compound CCN(CC)CCN(CC)CC DIHKMUNUGQVFES-UHFFFAOYSA-N 0.000 claims description 5
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- KPPVNWGJXFMGAM-UUILKARUSA-N (e)-2-methyl-1-(6-methyl-3,4-dihydro-2h-quinolin-1-yl)but-2-en-1-one Chemical compound CC1=CC=C2N(C(=O)C(/C)=C/C)CCCC2=C1 KPPVNWGJXFMGAM-UUILKARUSA-N 0.000 claims description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 claims 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 2
- DMQSHEKGGUOYJS-UHFFFAOYSA-N n,n,n',n'-tetramethylpropane-1,3-diamine Chemical compound CN(C)CCCN(C)C DMQSHEKGGUOYJS-UHFFFAOYSA-N 0.000 claims 1
- 239000005329 float glass Substances 0.000 abstract description 12
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 abstract description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 abstract description 5
- 229910001887 tin oxide Inorganic materials 0.000 abstract description 5
- 238000005816 glass manufacturing process Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 42
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 40
- 229910052757 nitrogen Inorganic materials 0.000 description 20
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- 239000012159 carrier gas Substances 0.000 description 12
- 229910052759 nickel Inorganic materials 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000012707 chemical precursor Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/216—ZnO
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
Abstract
【解決手段】本発明の方法は、基材上に酸化亜鉛コーティングを堆積させるための化学気相堆積方法であって、亜鉛含有化合物を含む第1の前駆体気体流と水を含む第2の前駆体気体流とを基材の表面に送達し、前記基材の表面上で前記第1及び第2の前駆体気体流を、酸化亜鉛コーティングが前記表面上に5nm/秒よりも速い堆積速度で形成されるための十分に短い時間で混合させることを特徴とする。
【選択図】なし
Description
R1R2Zn又はR1R2Zn−[R3R4N(CHR5)n(CH2)m(CHR6)nNR7R8]
ただし、R1−8は、同一又は異なるアルキル基又はアリール基(例えばメチル、エチル、イソプロピル、n−プロピル、n−ブチル、sec−ブチル、フェニル又は置換フェニルなど)であり得、1つ以上のフッ素含有置換基を含み得る。
R5及びR6は、H又はアルキル基若しくはアリール基で有り得る。
nは、0又は1であり得る。
mは、nが0の場合は1〜6であり得、nが1の場合は0〜6であり得る。
Claims (13)
- 基材上に酸化亜鉛コーティングを堆積させるための化学気相堆積方法であって、
(a)亜鉛含有化合物を含む第1の前駆体気体流を生成するステップと、
(b)水を含む第2の前駆体気体流を生成するステップと、
(c)前記第1及び第2の前駆体気体流を、被覆されるガラス基材の表面の近傍の位置に送達するステップと、
(d)前記第1及び第2の前駆体気体流を互いに混合して前駆体混合物を生成し、該前駆体混合物を、前記亜鉛含有化合物と前記水との間の反応を行わせるのに十分な温度にある前記基材の表面に接触させるステップとを含み、
前記第1及び第2の前駆体気体流が、酸化亜鉛コーティングが前記表面上に5nm/秒よりも速い堆積速度で形成されるための十分に短い時間で混合されることを特徴とする方法。 - 請求項1に記載の方法であって、
前記ガラス基材が、400℃以上の温度に加熱されることを特徴とする方法。 - 請求項2に記載の方法であって、
前記ガラス基材が、500〜700℃の温度に加熱されることを特徴とする方法。 - 請求項2に記載の方法であって、
前記亜鉛含有化合物が次の化学式で表されることを特徴とする方法。
R1R2Zn又はR1R2Zn−[R3R4N(CHR5)n(CH2)m(CHR6)nNR7R8]
ただし、R1−8は、同一又は異なる、例えばメチル、エチル、イソプロピル、n−プロピル、n−ブチル、sec−ブチル、フェニル又は置換フェニルなどのアルキル基又はアリール基であり得、1つ以上のフッ素含有置換基を含み得る。
R5及びR6は、H又はアルキル基若しくはアリール基であり得る。
nは、0又は1であり得る。
mは、nが0の場合は1〜6であり得、nが1の場合は0〜6であり得る。 - 請求項1に記載の方法であって、
前記亜鉛含有化合物及び水が、1秒未満の時間で混合されることを特徴とする方法。 - 請求項5に記載の方法であって、
前記亜鉛含有化合物及び水が、0.5秒未満の時間で混合されることを特徴とする方法。 - 請求項6に記載の方法であって、
前記亜鉛含有化合物及び水が、70〜100ミリ秒の時間で混合されることを特徴とする方法。 - 請求項1に記載の方法であって、
前記酸化亜鉛コーティングの堆積速度が、20nm/秒よりも速いことを特徴とする方法。 - 請求項1に記載の方法であって、
前記前駆体混合物のモルパーセント(mol%)が、3〜14mol%であることを特徴とする方法。 - 請求項4に記載の方法であって、
前記亜鉛含有化合物が、Me2Zn、Me2Zn−TMPDA[TMPDA=N,N,N´,N´−テトラメチル−1,3−プロパンジアミン]、Me2Zn−TEEDA[TEEDA=N,N,N´,N´−テトラエチルエチレンジアミン]、Me2Zn−TMEDA[TMEDA=N,N,N´,N´−テトラメチルエチレンジアミン]、Et2Zn、Et2Zn−TEEDA、Et2Zn−TMPDA、及びEt2Zn−TMEDAから成る群より選択される1つを含むことを特徴とする方法。 - 基材上に酸化亜鉛コーティングを堆積させるための化学気相堆積方法であって、
(a)亜鉛含有化合物を含む第1の前駆体気体流を生成するステップと、
(b)水含有酸素源を含む第2の前駆体気体流を生成するステップと、
(c)前記第1及び第2の前駆体気体流を、被覆されるガラス基材の表面の近傍の位置に送達するステップと、
(d)前記第1及び第2の前駆体気体流を互いに混合して前駆体混合物を生成し、該前駆体混合物を、前記亜鉛含有化合物と前記水との間の反応を行わせるのに十分な温度にある前記基材の表面に接触させるステップとを含み、
前記第1及び第2の前駆体気体流が、酸化亜鉛コーティングが前記表面上に5nm/秒よりも速い堆積速度で形成されるための十分に短い時間で混合されることを特徴とする方法。 - 請求項11に記載の方法であって、
前記水含有酸素源が、所定量の水を含むアルコールであることを特徴とする方法。 - 請求項12に記載の方法であって、
前記アルコールが2−ブタノールであり、前記水の所定量が1〜10mol%であることを特徴とする方法。
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US84091406P | 2006-08-29 | 2006-08-29 | |
US60/840,914 | 2006-08-29 |
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JP2009526591A Division JP2010502832A (ja) | 2006-08-29 | 2007-05-03 | 酸化亜鉛被覆物品の作成方法 |
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JP6039402B2 JP6039402B2 (ja) | 2016-12-07 |
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JP2012276582A Active JP6039402B2 (ja) | 2006-08-29 | 2012-12-19 | 酸化亜鉛被覆物品の作成方法 |
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US (1) | US7732013B2 (ja) |
EP (1) | EP2059627B1 (ja) |
JP (2) | JP2010502832A (ja) |
KR (1) | KR101383946B1 (ja) |
CN (1) | CN101553601B (ja) |
AU (1) | AU2007290844B2 (ja) |
BR (1) | BRPI0716387A2 (ja) |
MX (1) | MX2009002181A (ja) |
MY (1) | MY147893A (ja) |
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FI123645B (fi) * | 2010-04-20 | 2013-08-30 | Beneq Oy | Aerosoliavusteinen kaasukasvatusjärjestelmä |
EP2688850B1 (en) * | 2011-03-23 | 2018-02-21 | Pilkington Group Limited | Method of depositing zinc oxide coatings by chemical vapor deposition |
KR101225739B1 (ko) * | 2011-04-22 | 2013-01-23 | 삼성코닝정밀소재 주식회사 | 광전지용 산화아연계 투명 도전막 및 그 제조방법 |
US9776914B2 (en) * | 2012-03-16 | 2017-10-03 | Pilkington Group Limited | Chemical vapor deposition process for depositing zinc oxide coatings, method for forming a conductive glass article and the coated glass articles produced thereby |
KR101466842B1 (ko) * | 2012-11-28 | 2014-11-28 | 코닝정밀소재 주식회사 | 투명전극용 산화아연계 박막 제조방법 |
US20230142848A1 (en) * | 2020-04-01 | 2023-05-11 | Adeka Corporation | Zinc compound, thin-film forming raw material, thin-film, and method of producing thin-film |
Citations (2)
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JPS58500173A (ja) * | 1981-03-06 | 1983-02-03 | バテル メモリアル インステイチユ−ト | 鉱物性酸化物被覆を支持体に蒸着する方法及び装置 |
WO2005072947A1 (en) * | 2004-01-23 | 2005-08-11 | Arkema Inc. | Solar control films composed of metal oxide heterostructures, and method of making same |
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JP2001023907A (ja) * | 1999-07-07 | 2001-01-26 | Mitsubishi Heavy Ind Ltd | 成膜装置 |
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2007
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AU2007290844B2 (en) | 2011-08-04 |
MY147893A (en) | 2013-01-31 |
US7732013B2 (en) | 2010-06-08 |
EP2059627A1 (en) | 2009-05-20 |
EP2059627B1 (en) | 2015-08-05 |
CN101553601A (zh) | 2009-10-07 |
JP6039402B2 (ja) | 2016-12-07 |
MX2009002181A (es) | 2009-04-22 |
CN101553601B (zh) | 2012-12-12 |
AU2007290844A1 (en) | 2008-03-06 |
JP2010502832A (ja) | 2010-01-28 |
US20080057200A1 (en) | 2008-03-06 |
BRPI0716387A2 (pt) | 2013-01-01 |
RU2447031C2 (ru) | 2012-04-10 |
KR20090061635A (ko) | 2009-06-16 |
RU2009111377A (ru) | 2010-10-10 |
WO2008027087A1 (en) | 2008-03-06 |
KR101383946B1 (ko) | 2014-04-10 |
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