MD3372B1 - Procedeu de obtinere a fotoelementelor (variante) - Google Patents

Procedeu de obtinere a fotoelementelor (variante) Download PDF

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Publication number
MD3372B1
MD3372B1 MDA20060106A MD20060106A MD3372B1 MD 3372 B1 MD3372 B1 MD 3372B1 MD A20060106 A MDA20060106 A MD A20060106A MD 20060106 A MD20060106 A MD 20060106A MD 3372 B1 MD3372 B1 MD 3372B1
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MD
Moldova
Prior art keywords
impurities
diffusion
deposition
novelty
processes
Prior art date
Application number
MDA20060106A
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English (en)
Other versions
MD3372C2 (ro
Inventor
Sergiu SISIANU
Teodor Sisianu
Serghei Railean
Original Assignee
Sergiu SISIANU
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sergiu SISIANU filed Critical Sergiu SISIANU
Priority to MDA20060106A priority Critical patent/MD3372C2/ro
Publication of MD3372B1 publication Critical patent/MD3372B1/ro
Publication of MD3372C2 publication Critical patent/MD3372C2/ro

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  • Electrodes Of Semiconductors (AREA)
  • Photovoltaic Devices (AREA)

Abstract

Inventia se refera la tehnologia dispozitivelor cu semiconductori, in special la procedeele de obtinere a celulelor fotovoltaice. Procedeul, conform primei variante, include procesele de depunere chimica sau din vapori a peliculelor din impuritati pe suprafata plachetei de semiconductor, de difuzie, de oxidare si depunere a contactelor ohmice. Noutatea consta in aceea ca procesele de difuzie a impuritatilor din diferite surse cu formarea jonctiunilor de tipul n+ - p, sau p+ - n, sau n+ - p – p+, oxidare, depunere contactelor ohmice, si depunere a peliculelor antireflectoare se efectueaza cu prelucrarea fototermica rapida. Noutatea procedeului, conform variantei a doua, consta in aceea ca peuna sau ambele suprafete opuse ale plachetei de semiconductor de tipul „p” sau „n” se depune o sursa de difuzie in forma de pelicula sticloasa dopatacu una din impuritati, donor sau acceptor, de exemplu, siliciura de fosfor sau siliciura de bor, prin metoda oxidarii anodice sau a depunerii chimicein prezenta razelor ultraviolete sau in lipsa luminii, dupa care are loc prelucrarea fototermica rapida a plachetei, difuzia impuritatilor cu formarea jonctiunilor de tipul n+- p, sau p+ - n, sau n+ - p – p+, sau p+ - n – n+ in vid, in aer sau in prezenta unui gaz inert, de exemplu, argon, si depunerea peliculelor antireflectoare. Noutatea procedeului, conform variantei a treia, consta in aceea ca pe una din suprafetele plachetei de semiconductor de tipul „p” sau „n” se depune o sursa de difuzie in forma de pelicula sticloasa dopata cu una din impuritatile donor, de exemplu, siliciura de fosfor, iar pe suprafata opusa a placii de semiconductor se depune o alta sursa de difuzie de tip acceptor in forma de pelicula metalica, de exemplu, dinaluminiu, prin metoda evaporarii in vid, sau oxidarii anodice, sau prin depunerea chimica in prezenta razelor ultraviolete sau in lipsa luminii; dupacare are loc prelucrarea fototermica rapida a plachetei, difuzia impuritatilor cu formarea jonctiunilor de tipul n+ - p, sau p+ - n, sau n+ - p – p+,sau p+ - n – n in vid, in aer sau in prezenta unui gaz inert, de exemplu, argon, si depunerea peliculelor antireflectoare. Noutatea procedeului, conform variantei a patra, consta in aceea ca el include procesele de difuzie a impuritatilor din diferite surse cu formarea jonctiunilor conform revendicarilor 1, 2 sau 3, apoi, dupa curatirea suprafeteiplachetei, are loc depunerea contactelor ohmice de metal, de exemplu, Al sau Ni, sau Cu, sau pasta de Ag, sau contacte ohmice stravezii de InSnO, urmate de prelucrarea fototermica rapida in vid, in aer sau in camera cu gaze inerte, de exemplu, cu argon, si depunerea peliculelor antireflectoare. Noutatea procedeului, conform variantei a cincea, consta in aceea ca el include procesele de difuzie a impuritatilor din diferite surse cu formarea jonctiunilor si depunerea contactelor ohmice conform revendicarilor 1, 2, 3, sau 4, dupa care are loc depunerea peliculei stravezii cu proprietati de antireflector
MDA20060106A 2006-03-31 2006-03-31 Procedeu de obtinere a celuler fotovoltaice (variante) MD3372C2 (ro)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MDA20060106A MD3372C2 (ro) 2006-03-31 2006-03-31 Procedeu de obtinere a celuler fotovoltaice (variante)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MDA20060106A MD3372C2 (ro) 2006-03-31 2006-03-31 Procedeu de obtinere a celuler fotovoltaice (variante)

Publications (2)

Publication Number Publication Date
MD3372B1 true MD3372B1 (ro) 2007-07-31
MD3372C2 MD3372C2 (ro) 2008-02-29

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Family Applications (1)

Application Number Title Priority Date Filing Date
MDA20060106A MD3372C2 (ro) 2006-03-31 2006-03-31 Procedeu de obtinere a celuler fotovoltaice (variante)

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MD (1) MD3372C2 (ro)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD4554B1 (ro) * 2017-10-18 2018-02-28 Государственный Университет Молд0 Procedeu de majorare a eficienţei celulelor fotovoltaice pe baza p+InP-p-InP-n+CdS

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD175Z (ro) * 2008-02-25 2010-10-31 Институт Электронной Инженерии И Промышленных Технологий Академии Наук Молдовы Dispozitiv de obţinere a peliculelor supraconductoare
MD20080058A (ro) * 2008-02-25 2009-08-31 Институт Электронной Инженерии И Промышленных Технологий Академии Наук Молдовы Dispozitiv de obţinere a peliculelor supraconductoare
MD353Z (ro) * 2010-02-24 2011-10-31 Институт Электронной Инженерии И Промышленных Технологий Ventil supraconductor de spin
MD4182C1 (ro) * 2011-04-15 2013-04-30 Государственный Университет Молд0 Dispozitiv semiconductor cu joncţiune p-n în relief (variante)
MD4261B1 (ro) * 2011-05-12 2013-11-30 Государственный Университет Молд0 Procedeu de fabricare a dispozitivului semiconductor cu joncţiune p-n în relief (variante)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6569249B1 (en) * 2000-04-18 2003-05-27 Clemson University Process for forming layers on substrates

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD4554B1 (ro) * 2017-10-18 2018-02-28 Государственный Университет Молд0 Procedeu de majorare a eficienţei celulelor fotovoltaice pe baza p+InP-p-InP-n+CdS

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MD3372C2 (ro) 2008-02-29

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