LT2964417T - Būdas kiaurinėms angoms pagrinde įvesti - Google Patents
Būdas kiaurinėms angoms pagrinde įvestiInfo
- Publication number
- LT2964417T LT2964417T LTEPPCT/DE2014/100118T LT14726069T LT2964417T LT 2964417 T LT2964417 T LT 2964417T LT 14726069 T LT14726069 T LT 14726069T LT 2964417 T LT2964417 T LT 2964417T
- Authority
- LT
- Lithuania
- Prior art keywords
- openings
- substrate
- providing
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
- B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1 ns or less
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/01—Manufacture or treatment
- H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
- H10W70/095—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers of vias therein
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic materials other than metals or composite materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic materials other than metals or composite materials
- B23K2103/54—Glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic materials other than metals or composite materials
- B23K2103/56—Inorganic materials other than metals or composite materials being semiconducting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
- H10W70/63—Vias, e.g. via plugs
- H10W70/635—Through-vias
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
- H10W70/69—Insulating materials thereof
- H10W70/692—Ceramics or glasses
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
- H10W70/69—Insulating materials thereof
- H10W70/698—Semiconductor materials that are electrically insulating, e.g. undoped silicon
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Laser Beam Processing (AREA)
- Electromagnetism (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE201310103370 DE102013103370A1 (de) | 2013-04-04 | 2013-04-04 | Verfahren zum Einbringen von Durchbrechungen in ein Glassubstrat sowie ein derart hergestelltes Glassubstrat |
| DE102013112033 | 2013-10-31 | ||
| PCT/DE2014/100118 WO2014161534A2 (de) | 2013-04-04 | 2014-04-03 | Verfahren und vorrichtung zum einbringen von durchbrechungen in ein substrat sowie ein derart hergestelltes substrat |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| LT2964417T true LT2964417T (lt) | 2022-04-11 |
Family
ID=50792337
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| LTEPPCT/DE2014/100118T LT2964417T (lt) | 2013-04-04 | 2014-04-03 | Būdas kiaurinėms angoms pagrinde įvesti |
Country Status (9)
| Country | Link |
|---|---|
| US (3) | US10610971B2 (lt) |
| EP (1) | EP2964417B1 (lt) |
| JP (1) | JP6186016B2 (lt) |
| KR (1) | KR101857335B1 (lt) |
| CN (1) | CN105102177B (lt) |
| ES (1) | ES2908956T3 (lt) |
| LT (1) | LT2964417T (lt) |
| MY (1) | MY178429A (lt) |
| WO (1) | WO2014161534A2 (lt) |
Families Citing this family (77)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6121901B2 (ja) | 2010-07-12 | 2017-04-26 | ロフィン−シナー テクノロジーズ インコーポレーテッド | レーザーフィラメント形成による材料加工方法 |
| WO2014079478A1 (en) | 2012-11-20 | 2014-05-30 | Light In Light Srl | High speed laser processing of transparent materials |
| EP2754524B1 (de) | 2013-01-15 | 2015-11-25 | Corning Laser Technologies GmbH | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie |
| EP2781296B1 (de) | 2013-03-21 | 2020-10-21 | Corning Laser Technologies GmbH | Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser |
| CN105189024B (zh) * | 2013-04-04 | 2018-01-30 | Lpkf激光电子股份公司 | 用于分离基板的方法和装置 |
| US9102011B2 (en) | 2013-08-02 | 2015-08-11 | Rofin-Sinar Technologies Inc. | Method and apparatus for non-ablative, photoacoustic compression machining in transparent materials using filamentation by burst ultrafast laser pulses |
| US10017410B2 (en) | 2013-10-25 | 2018-07-10 | Rofin-Sinar Technologies Llc | Method of fabricating a glass magnetic hard drive disk platter using filamentation by burst ultrafast laser pulses |
| US10005152B2 (en) | 2013-11-19 | 2018-06-26 | Rofin-Sinar Technologies Llc | Method and apparatus for spiral cutting a glass tube using filamentation by burst ultrafast laser pulses |
| US11053156B2 (en) | 2013-11-19 | 2021-07-06 | Rofin-Sinar Technologies Llc | Method of closed form release for brittle materials using burst ultrafast laser pulses |
| US10252507B2 (en) | 2013-11-19 | 2019-04-09 | Rofin-Sinar Technologies Llc | Method and apparatus for forward deposition of material onto a substrate using burst ultrafast laser pulse energy |
| US9517929B2 (en) | 2013-11-19 | 2016-12-13 | Rofin-Sinar Technologies Inc. | Method of fabricating electromechanical microchips with a burst ultrafast laser pulses |
| US10144088B2 (en) | 2013-12-03 | 2018-12-04 | Rofin-Sinar Technologies Llc | Method and apparatus for laser processing of silicon by filamentation of burst ultrafast laser pulses |
| US9815730B2 (en) | 2013-12-17 | 2017-11-14 | Corning Incorporated | Processing 3D shaped transparent brittle substrate |
| US9517963B2 (en) | 2013-12-17 | 2016-12-13 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| US9701563B2 (en) | 2013-12-17 | 2017-07-11 | Corning Incorporated | Laser cut composite glass article and method of cutting |
| US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
| US9676167B2 (en) | 2013-12-17 | 2017-06-13 | Corning Incorporated | Laser processing of sapphire substrate and related applications |
| US9850160B2 (en) | 2013-12-17 | 2017-12-26 | Corning Incorporated | Laser cutting of display glass compositions |
| US20150165560A1 (en) | 2013-12-17 | 2015-06-18 | Corning Incorporated | Laser processing of slots and holes |
| US10442719B2 (en) | 2013-12-17 | 2019-10-15 | Corning Incorporated | Edge chamfering methods |
| US9938187B2 (en) | 2014-02-28 | 2018-04-10 | Rofin-Sinar Technologies Llc | Method and apparatus for material processing using multiple filamentation of burst ultrafast laser pulses |
| CN106687419A (zh) | 2014-07-08 | 2017-05-17 | 康宁股份有限公司 | 用于激光处理材料的方法和设备 |
| US10611667B2 (en) | 2014-07-14 | 2020-04-07 | Corning Incorporated | Method and system for forming perforations |
| EP3169476A1 (en) * | 2014-07-14 | 2017-05-24 | Corning Incorporated | Interface block; system for and method of cutting a substrate being transparent within a range of wavelengths using such interface block |
| EP3169479B1 (en) | 2014-07-14 | 2019-10-02 | Corning Incorporated | Method of and system for arresting incident crack propagation in a transparent material |
| US11648623B2 (en) | 2014-07-14 | 2023-05-16 | Corning Incorporated | Systems and methods for processing transparent materials using adjustable laser beam focal lines |
| US9757815B2 (en) | 2014-07-21 | 2017-09-12 | Rofin-Sinar Technologies Inc. | Method and apparatus for performing laser curved filamentation within transparent materials |
| US10047001B2 (en) | 2014-12-04 | 2018-08-14 | Corning Incorporated | Glass cutting systems and methods using non-diffracting laser beams |
| JP6104354B2 (ja) * | 2014-12-16 | 2017-03-29 | 旭硝子株式会社 | 貫通孔形成方法、貫通孔形成装置、および貫通孔を有するガラス基板の製造方法 |
| WO2016115017A1 (en) | 2015-01-12 | 2016-07-21 | Corning Incorporated | Laser cutting of thermally tempered substrates using the multi photon absorption method |
| EP3102358A4 (en) | 2015-01-13 | 2017-10-25 | Rofin-Sinar Technologies, Inc. | Method and system for scribing brittle material followed by chemical etching |
| HUE055461T2 (hu) | 2015-03-24 | 2021-11-29 | Corning Inc | Kijelzõ üveg kompozíciók lézeres vágása és feldolgozása |
| WO2016160391A1 (en) | 2015-03-27 | 2016-10-06 | Corning Incorporated | Gas permeable window and method of fabricating the same |
| TW201704177A (zh) * | 2015-06-10 | 2017-02-01 | 康寧公司 | 蝕刻玻璃基板的方法及玻璃基板 |
| EP3319911B1 (en) | 2015-07-10 | 2023-04-19 | Corning Incorporated | Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same |
| CN107926110B (zh) * | 2015-08-21 | 2021-04-30 | 康宁股份有限公司 | 具有低介电性质的玻璃基材组装件 |
| CN107922259B (zh) | 2015-09-04 | 2021-05-07 | Agc株式会社 | 玻璃板的制造方法、玻璃板、玻璃物品的制造方法、玻璃物品以及玻璃物品的制造装置 |
| US10410883B2 (en) | 2016-06-01 | 2019-09-10 | Corning Incorporated | Articles and methods of forming vias in substrates |
| US10794679B2 (en) | 2016-06-29 | 2020-10-06 | Corning Incorporated | Method and system for measuring geometric parameters of through holes |
| EP3508458B1 (en) | 2016-09-01 | 2022-03-16 | Agc Inc. | Method for manufacturing glass product |
| CN109803786B (zh) | 2016-09-30 | 2021-05-07 | 康宁股份有限公司 | 使用非轴对称束斑对透明工件进行激光加工的设备和方法 |
| US11542190B2 (en) | 2016-10-24 | 2023-01-03 | Corning Incorporated | Substrate processing station for laser-based machining of sheet-like glass substrates |
| EP3542395A4 (en) | 2016-11-18 | 2020-06-17 | Samtec, Inc. | Filling materials and methods of filling through holes of a substrate |
| EP3587367B1 (en) | 2017-02-21 | 2023-10-18 | AGC Inc. | Glass plate and manufacturing method of glass plate |
| JP6531877B2 (ja) | 2017-02-21 | 2019-06-19 | Agc株式会社 | ガラス板およびガラス板の製造方法 |
| KR20190116378A (ko) * | 2017-03-06 | 2019-10-14 | 엘피케이에프 레이저 앤드 일렉트로닉스 악티엔게젤샤프트 | 전자기 방사선과 후속 에칭공정을 이용해 재료 안으로 적어도 하나의 리세스를 도입하기 위한 방법 |
| TWI681445B (zh) * | 2017-03-06 | 2020-01-01 | 德商Lpkf雷射暨電子股份公司 | 用於製造技術遮罩之方法以及藉助於可再用遮罩施加及/或移除圖案化材料之方法 |
| US11072041B2 (en) | 2017-03-06 | 2021-07-27 | Lpkf Laser & Electronics Ag | Method for producing a technical mask |
| CN110545948B (zh) * | 2017-05-15 | 2022-02-25 | Lpkf激光电子股份公司 | 借助激光诱导的深度蚀刻来加工、尤其分割基板的方法 |
| US10580725B2 (en) | 2017-05-25 | 2020-03-03 | Corning Incorporated | Articles having vias with geometry attributes and methods for fabricating the same |
| US11078112B2 (en) | 2017-05-25 | 2021-08-03 | Corning Incorporated | Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same |
| US11156774B2 (en) | 2017-10-04 | 2021-10-26 | Lpkf Laser & Electronics Ag | Optical component and method for the production thereof |
| MY197514A (en) * | 2017-11-10 | 2023-06-19 | Lpkf Laser & Electronics Ag | Method and device for the integration of semiconductor wafers |
| US12180108B2 (en) | 2017-12-19 | 2024-12-31 | Corning Incorporated | Methods for etching vias in glass-based articles employing positive charge organic molecules |
| JP7407499B2 (ja) * | 2017-12-26 | 2024-01-04 | 株式会社ディスコ | 凹部又は貫通孔の形成方法、電極の形成方法 |
| US11554984B2 (en) | 2018-02-22 | 2023-01-17 | Corning Incorporated | Alkali-free borosilicate glasses with low post-HF etch roughness |
| US12009225B2 (en) | 2018-03-30 | 2024-06-11 | Samtec, Inc. | Electrically conductive vias and methods for producing same |
| DE102020100848B4 (de) | 2019-01-29 | 2023-07-27 | Lpkf Laser & Electronics Aktiengesellschaft | Verfahren zur Mikrostrukturierung eines Glassubstrats mittels Laserstrahlung |
| JP7230650B2 (ja) | 2019-04-05 | 2023-03-01 | Tdk株式会社 | 無機材料基板の加工方法、デバイス、およびデバイスの製造方法 |
| DE102019111634A1 (de) * | 2019-05-06 | 2020-11-12 | Lpkf Laser & Electronics Ag | Verfahren zur Herstellung von Mikrostrukturen in einem Glassubstrat |
| KR102771848B1 (ko) | 2019-05-13 | 2025-02-21 | 엘피케이에프 레이저 앤드 일렉트로닉스 에스이 | 캐리어 기판을 구비하는 디스플레이를 제조하기 위한 방법, 이 방법에 따라 제조된 캐리어 기판, 그리고 유연한 디스플레이를 위해 의도된 커버 유리 |
| US12036792B2 (en) | 2019-07-17 | 2024-07-16 | Scrona Ag | Electrohydrodynamic print head with structured feed layer |
| WO2021008700A1 (en) | 2019-07-17 | 2021-01-21 | Scrona Ag | Inkjet print head with contamination robustness |
| DE102019121827A1 (de) * | 2019-08-13 | 2021-02-18 | Trumpf Laser- Und Systemtechnik Gmbh | Laserätzen mit variierender Ätzselektivität |
| TW202529284A (zh) | 2019-09-30 | 2025-07-16 | 美商山姆科技公司 | 導電通孔和其製造方法 |
| DE102019217466A1 (de) * | 2019-11-12 | 2021-05-12 | Lpkf Laser & Electronics Ag | Reaktionsgefäße aus Glas, Herstellungsverfahren und Verfahren zur Analyse |
| DE102021100144A1 (de) | 2020-01-09 | 2021-07-15 | Lpkf Laser & Electronics Aktiengesellschaft | Verfahren zur Bearbeitung eines Glases |
| KR102311023B1 (ko) * | 2020-05-26 | 2021-10-08 | 윤창희 | 가공 효율성을 향상시킨 이중소재 이체형 플라즈마 에칭 플레이트 |
| DE102020114195A1 (de) | 2020-05-27 | 2021-12-02 | Lpkf Laser & Electronics Aktiengesellschaft | Verfahren zum Einbringen einer Ausnehmung in ein Substrat |
| EP4296244A1 (de) | 2022-06-21 | 2023-12-27 | LPKF Laser & Electronics SE | Substratträger aus glas zur bearbeitung eines substrats und ein verfahren zu dessen herstellung |
| DE102022116784A1 (de) | 2022-07-05 | 2024-01-11 | Lpkf Laser & Electronics Aktiengesellschaft | Mikromechanische Kammstruktur aus Glas sowie zugehöriges Verfahren und Verwendung |
| DE102022116783B3 (de) | 2022-07-05 | 2023-09-14 | Lpkf Laser & Electronics Aktiengesellschaft | Mikrostruktur aus Glas, Mikro-Mechanik und zugehörige Verwendung |
| DE102022127259B4 (de) | 2022-10-18 | 2026-02-12 | Lpkf Laser & Electronics Aktiengesellschaft | Verfahren sowie Vorrichtung zur Abbildung eines Strahls auf ein Objekt und Verfahren zum Einbringen einer Öffnung in ein Werkstück mittels dieses Verfahrens |
| DE102022130976B3 (de) | 2022-11-23 | 2023-11-30 | Lpkf Laser & Electronics Aktiengesellschaft | Monolithische Membran aus Glas, Doppel-Vertikalmembran-Anordnung, mikromechanische Federstruktur und zugehöriges Herstellungsverfahren |
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-
2014
- 2014-04-03 WO PCT/DE2014/100118 patent/WO2014161534A2/de not_active Ceased
- 2014-04-03 US US14/781,599 patent/US10610971B2/en active Active
- 2014-04-03 EP EP14726069.9A patent/EP2964417B1/de active Active
- 2014-04-03 KR KR1020157027412A patent/KR101857335B1/ko active Active
- 2014-04-03 LT LTEPPCT/DE2014/100118T patent/LT2964417T/lt unknown
- 2014-04-03 CN CN201480019446.7A patent/CN105102177B/zh active Active
- 2014-04-03 ES ES14726069T patent/ES2908956T3/es active Active
- 2014-04-03 JP JP2015561940A patent/JP6186016B2/ja active Active
- 2014-04-03 MY MYPI2015703466A patent/MY178429A/en unknown
-
2020
- 2020-02-24 US US16/798,453 patent/US11618104B2/en active Active
-
2023
- 2023-02-28 US US18/175,557 patent/US12365051B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP2964417A2 (de) | 2016-01-13 |
| US20230201970A1 (en) | 2023-06-29 |
| KR20150128802A (ko) | 2015-11-18 |
| KR101857335B1 (ko) | 2018-05-11 |
| JP6186016B2 (ja) | 2017-08-23 |
| US10610971B2 (en) | 2020-04-07 |
| WO2014161534A3 (de) | 2014-11-27 |
| JP2016517626A (ja) | 2016-06-16 |
| US20200189039A1 (en) | 2020-06-18 |
| US12365051B2 (en) | 2025-07-22 |
| WO2014161534A2 (de) | 2014-10-09 |
| CN105102177A (zh) | 2015-11-25 |
| CN105102177B (zh) | 2018-02-27 |
| ES2908956T3 (es) | 2022-05-04 |
| MY178429A (en) | 2020-10-13 |
| EP2964417B1 (de) | 2022-01-12 |
| US11618104B2 (en) | 2023-04-04 |
| US20160059359A1 (en) | 2016-03-03 |
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