KR970063562A - 하이브리드 코일 인덕터 및 다중 반경 돔 실링을 갖는 rf 플라즈마 반응기 - Google Patents

하이브리드 코일 인덕터 및 다중 반경 돔 실링을 갖는 rf 플라즈마 반응기 Download PDF

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Publication number
KR970063562A
KR970063562A KR1019970003267A KR19970003267A KR970063562A KR 970063562 A KR970063562 A KR 970063562A KR 1019970003267 A KR1019970003267 A KR 1019970003267A KR 19970003267 A KR19970003267 A KR 19970003267A KR 970063562 A KR970063562 A KR 970063562A
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KR
South Korea
Prior art keywords
plasma reactor
base
seal
height
range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019970003267A
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English (en)
Korean (ko)
Inventor
하나와 히로지
지. 윈 제랄드
엠.마 다이아나
엠. 샐즈맨 필립
케이. 로웬하르트 피터
자오 알렌
Original Assignee
조셉 제이. 스위니
어플라이드 머티어리얼스, 인코포레이티드
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Application filed by 조셉 제이. 스위니, 어플라이드 머티어리얼스, 인코포레이티드 filed Critical 조셉 제이. 스위니
Publication of KR970063562A publication Critical patent/KR970063562A/ko
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32513—Sealing means, e.g. sealing between different parts of the vessel

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
  • Chemical Vapour Deposition (AREA)
KR1019970003267A 1996-02-02 1997-02-03 하이브리드 코일 인덕터 및 다중 반경 돔 실링을 갖는 rf 플라즈마 반응기 Withdrawn KR970063562A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/597,445 US5777289A (en) 1995-02-15 1996-02-02 RF plasma reactor with hybrid conductor and multi-radius dome ceiling
US8/597,445 1996-02-02

Publications (1)

Publication Number Publication Date
KR970063562A true KR970063562A (ko) 1997-09-12

Family

ID=24391536

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970003267A Withdrawn KR970063562A (ko) 1996-02-02 1997-02-03 하이브리드 코일 인덕터 및 다중 반경 돔 실링을 갖는 rf 플라즈마 반응기

Country Status (5)

Country Link
US (2) US5777289A (https=)
EP (1) EP0788138A3 (https=)
JP (1) JPH1027785A (https=)
KR (1) KR970063562A (https=)
TW (1) TW310444B (https=)

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US6673199B1 (en) 2001-03-07 2004-01-06 Applied Materials, Inc. Shaping a plasma with a magnetic field to control etch rate uniformity
US7513971B2 (en) * 2002-03-18 2009-04-07 Applied Materials, Inc. Flat style coil for improved precision etch uniformity
US7232767B2 (en) * 2003-04-01 2007-06-19 Mattson Technology, Inc. Slotted electrostatic shield modification for improved etch and CVD process uniformity
JP4394073B2 (ja) * 2003-05-02 2010-01-06 東京エレクトロン株式会社 処理ガス導入機構およびプラズマ処理装置
US20080011426A1 (en) * 2006-01-30 2008-01-17 Applied Materials, Inc. Plasma reactor with inductively coupled source power applicator and a high temperature heated workpiece support
KR100824974B1 (ko) * 2006-08-17 2008-04-28 (주)아이씨디 플라즈마 처리장치의 안테나
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US9591738B2 (en) * 2008-04-03 2017-03-07 Novellus Systems, Inc. Plasma generator systems and methods of forming plasma
US20090284421A1 (en) * 2008-05-16 2009-11-19 Yuri Glukhoy RF antenna assembly having an antenna with transversal magnetic field for generation of inductively coupled plasma
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US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
US8916022B1 (en) 2008-09-12 2014-12-23 Novellus Systems, Inc. Plasma generator systems and methods of forming plasma
JP5572329B2 (ja) * 2009-01-15 2014-08-13 株式会社日立ハイテクノロジーズ プラズマ処理装置およびプラズマ生成装置
JP5410950B2 (ja) * 2009-01-15 2014-02-05 株式会社日立ハイテクノロジーズ プラズマ処理装置
US8222822B2 (en) 2009-10-27 2012-07-17 Tyco Healthcare Group Lp Inductively-coupled plasma device
JP5451324B2 (ja) * 2009-11-10 2014-03-26 株式会社日立ハイテクノロジーズ プラズマ処理装置
EP2552340A4 (en) 2010-03-31 2015-10-14 Univ Colorado State Res Found PLASMA DEVICE WITH LIQUID GAS INTERFACE
JP2013529352A (ja) 2010-03-31 2013-07-18 コロラド ステート ユニバーシティー リサーチ ファウンデーション 液体−気体界面プラズマデバイス
WO2012082854A2 (en) 2010-12-17 2012-06-21 Mattson Technology, Inc. Inductively coupled plasma source for plasma processing
US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation
WO2014161199A1 (zh) * 2013-04-03 2014-10-09 Wang Dongjun 等离子体增强原子层沉积设备
JP6750534B2 (ja) 2017-02-24 2020-09-02 東京エレクトロン株式会社 成膜装置
US11521828B2 (en) 2017-10-09 2022-12-06 Applied Materials, Inc. Inductively coupled plasma source
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Also Published As

Publication number Publication date
TW310444B (en) 1997-07-11
JPH1027785A (ja) 1998-01-27
US5777289A (en) 1998-07-07
US6248250B1 (en) 2001-06-19
EP0788138A2 (en) 1997-08-06
EP0788138A3 (en) 1998-01-07

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