JPH1027785A5 - - Google Patents

Info

Publication number
JPH1027785A5
JPH1027785A5 JP1997055376A JP5537697A JPH1027785A5 JP H1027785 A5 JPH1027785 A5 JP H1027785A5 JP 1997055376 A JP1997055376 A JP 1997055376A JP 5537697 A JP5537697 A JP 5537697A JP H1027785 A5 JPH1027785 A5 JP H1027785A5
Authority
JP
Japan
Prior art keywords
inches
plasma reactor
base
ceiling
height
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997055376A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1027785A (ja
Filing date
Publication date
Priority claimed from US08/597,445 external-priority patent/US5777289A/en
Application filed filed Critical
Publication of JPH1027785A publication Critical patent/JPH1027785A/ja
Publication of JPH1027785A5 publication Critical patent/JPH1027785A5/ja
Pending legal-status Critical Current

Links

JP9055376A 1996-02-02 1997-02-03 ハイブリッドインダクタ及びマルチ半径ドーム形シーリングを有するｒｆプラズマリアクタ Pending JPH1027785A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/597,445 US5777289A (en) 1995-02-15 1996-02-02 RF plasma reactor with hybrid conductor and multi-radius dome ceiling
US08/597445 1996-02-02

Publications (2)

Publication Number Publication Date
JPH1027785A JPH1027785A (ja) 1998-01-27
JPH1027785A5 true JPH1027785A5 (https=) 2004-12-16

Family

ID=24391536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9055376A Pending JPH1027785A (ja) 1996-02-02 1997-02-03 ハイブリッドインダクタ及びマルチ半径ドーム形シーリングを有するｒｆプラズマリアクタ

Country Status (5)

Country Link
US (2) US5777289A (https=)
EP (1) EP0788138A3 (https=)
JP (1) JPH1027785A (https=)
KR (1) KR970063562A (https=)
TW (1) TW310444B (https=)

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JP5572329B2 (ja) * 2009-01-15 2014-08-13 株式会社日立ハイテクノロジーズ プラズマ処理装置およびプラズマ生成装置
JP5410950B2 (ja) * 2009-01-15 2014-02-05 株式会社日立ハイテクノロジーズ プラズマ処理装置
US8222822B2 (en) 2009-10-27 2012-07-17 Tyco Healthcare Group Lp Inductively-coupled plasma device
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EP2552340A4 (en) 2010-03-31 2015-10-14 Univ Colorado State Res Found PLASMA DEVICE WITH LIQUID GAS INTERFACE
JP2013529352A (ja) 2010-03-31 2013-07-18 コロラド ステート ユニバーシティー リサーチ ファウンデーション 液体−気体界面プラズマデバイス
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US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
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JP6750534B2 (ja) 2017-02-24 2020-09-02 東京エレクトロン株式会社 成膜装置
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