KR970028813A - Reticle for Semiconductor Device Manufacturing - Google Patents

Reticle for Semiconductor Device Manufacturing Download PDF

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Publication number
KR970028813A
KR970028813A KR1019950044257A KR19950044257A KR970028813A KR 970028813 A KR970028813 A KR 970028813A KR 1019950044257 A KR1019950044257 A KR 1019950044257A KR 19950044257 A KR19950044257 A KR 19950044257A KR 970028813 A KR970028813 A KR 970028813A
Authority
KR
South Korea
Prior art keywords
semiconductor device
reticle
manufacturing
size
scribe line
Prior art date
Application number
KR1019950044257A
Other languages
Korean (ko)
Inventor
김영호
하헌환
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950044257A priority Critical patent/KR970028813A/en
Publication of KR970028813A publication Critical patent/KR970028813A/en

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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

본 발명은 반도체장치 제조용 레티클에 관한 것으로서, 상세하기로는 메인 칩, 스크라이브 라인 및 얼라인먼트 마크로 이루어진 반도체장치 제조용 레티클에 있어서, 상기 얼라인먼트 마크가 스크라이브 라인 영역의 X방향 및 Y방향의 폭의 크기에 구애받지 않고 배치될 수 있는 크기를 갖는 것을 특징으로 하는 반도체장치 제조용 레이클이 개시되어 있다. 본 발명에 의하면, 스크라이브 라인 영역의 크기를 축소할 수 있어서 메인 칩의 밀도가 증가된 고집적화 반도체장치를 제조할 수 있다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reticle for manufacturing a semiconductor device, and more particularly, in a semiconductor device manufacturing reticle consisting of a main chip, a scribe line, and an alignment mark, wherein the alignment mark is independent of the size of the width in the X and Y directions of the scribe line region. A device for manufacturing a semiconductor device is disclosed which has a size that can be arranged without. According to the present invention, it is possible to reduce the size of the scribe line region, thereby manufacturing a highly integrated semiconductor device having an increased density of the main chip.

Description

반도체장치 제조용 레티클Reticle for Semiconductor Device Manufacturing

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2a도는 본 발명의 레티클의 형태를 보여주는 배치도이고,Figure 2a is a layout showing the shape of the reticle of the present invention,

제2b도는 본 발명의 일실시예에 따른 얼라인먼트 마크를 나타낸 도면이다.2b illustrates an alignment mark according to an embodiment of the present invention.

Claims (2)

메인 칩, 스크라이브 라인 및 얼라인먼크 마크로 이루어진 반도체장치 제조용 레티클에 있어서, 상기 얼라인먼트 마크가 스크라이브 라인 영역의 X방향 및 Y방향의 폭의 크기에 구애받지 않고 배치될 수 있는 크기를 갖는 것을 특징으로 하는 반도체장치 제조용 레티클.A reticle for manufacturing a semiconductor device comprising a main chip, a scribe line, and an alignment monk mark, wherein the alignment mark has a size that can be arranged irrespective of the size of the width of the scribe line region in the X and Y directions. Reticle for semiconductor device manufacturing. 제1항에 있어서, 상기 얼라인먼트 마크는 X방향의 폭이 80~100㎛이고, Y방향의 폭이 80~95㎛인 크기를 갖는 것을 특징으로 하는 반도체장치 제조용 레티클.The reticle for manufacturing a semiconductor device according to claim 1, wherein the alignment mark has a size in which the width in the X direction is 80 to 100 µm and the width in the Y direction is 80 to 95 µm. ※ 참고사항:최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950044257A 1995-11-28 1995-11-28 Reticle for Semiconductor Device Manufacturing KR970028813A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950044257A KR970028813A (en) 1995-11-28 1995-11-28 Reticle for Semiconductor Device Manufacturing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950044257A KR970028813A (en) 1995-11-28 1995-11-28 Reticle for Semiconductor Device Manufacturing

Publications (1)

Publication Number Publication Date
KR970028813A true KR970028813A (en) 1997-06-24

Family

ID=66588279

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950044257A KR970028813A (en) 1995-11-28 1995-11-28 Reticle for Semiconductor Device Manufacturing

Country Status (1)

Country Link
KR (1) KR970028813A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990021288A (en) * 1997-08-30 1999-03-25 윤종용 Reticle for Semiconductor Device Manufacturing

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60170935A (en) * 1984-02-16 1985-09-04 Nec Corp Photomask for integrated circuit
US4849313A (en) * 1988-04-28 1989-07-18 Vlsi Technology, Inc. Method for making a reticle mask
JPH05341499A (en) * 1992-06-08 1993-12-24 Matsushita Electron Corp Reticle for stepper
JPH06342745A (en) * 1993-06-01 1994-12-13 Oki Electric Ind Co Ltd Mark for measuring alignment accuracy
KR100210899B1 (en) * 1994-03-22 1999-07-15 김영환 Photomask fabrication method for wafer manufacture

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60170935A (en) * 1984-02-16 1985-09-04 Nec Corp Photomask for integrated circuit
US4849313A (en) * 1988-04-28 1989-07-18 Vlsi Technology, Inc. Method for making a reticle mask
JPH05341499A (en) * 1992-06-08 1993-12-24 Matsushita Electron Corp Reticle for stepper
JPH06342745A (en) * 1993-06-01 1994-12-13 Oki Electric Ind Co Ltd Mark for measuring alignment accuracy
KR100210899B1 (en) * 1994-03-22 1999-07-15 김영환 Photomask fabrication method for wafer manufacture

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990021288A (en) * 1997-08-30 1999-03-25 윤종용 Reticle for Semiconductor Device Manufacturing

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