KR970028813A - Reticle for Semiconductor Device Manufacturing - Google Patents
Reticle for Semiconductor Device Manufacturing Download PDFInfo
- Publication number
- KR970028813A KR970028813A KR1019950044257A KR19950044257A KR970028813A KR 970028813 A KR970028813 A KR 970028813A KR 1019950044257 A KR1019950044257 A KR 1019950044257A KR 19950044257 A KR19950044257 A KR 19950044257A KR 970028813 A KR970028813 A KR 970028813A
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor device
- reticle
- manufacturing
- size
- scribe line
- Prior art date
Links
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
본 발명은 반도체장치 제조용 레티클에 관한 것으로서, 상세하기로는 메인 칩, 스크라이브 라인 및 얼라인먼트 마크로 이루어진 반도체장치 제조용 레티클에 있어서, 상기 얼라인먼트 마크가 스크라이브 라인 영역의 X방향 및 Y방향의 폭의 크기에 구애받지 않고 배치될 수 있는 크기를 갖는 것을 특징으로 하는 반도체장치 제조용 레이클이 개시되어 있다. 본 발명에 의하면, 스크라이브 라인 영역의 크기를 축소할 수 있어서 메인 칩의 밀도가 증가된 고집적화 반도체장치를 제조할 수 있다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reticle for manufacturing a semiconductor device, and more particularly, in a semiconductor device manufacturing reticle consisting of a main chip, a scribe line, and an alignment mark, wherein the alignment mark is independent of the size of the width in the X and Y directions of the scribe line region. A device for manufacturing a semiconductor device is disclosed which has a size that can be arranged without. According to the present invention, it is possible to reduce the size of the scribe line region, thereby manufacturing a highly integrated semiconductor device having an increased density of the main chip.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2a도는 본 발명의 레티클의 형태를 보여주는 배치도이고,Figure 2a is a layout showing the shape of the reticle of the present invention,
제2b도는 본 발명의 일실시예에 따른 얼라인먼트 마크를 나타낸 도면이다.2b illustrates an alignment mark according to an embodiment of the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950044257A KR970028813A (en) | 1995-11-28 | 1995-11-28 | Reticle for Semiconductor Device Manufacturing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950044257A KR970028813A (en) | 1995-11-28 | 1995-11-28 | Reticle for Semiconductor Device Manufacturing |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970028813A true KR970028813A (en) | 1997-06-24 |
Family
ID=66588279
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950044257A KR970028813A (en) | 1995-11-28 | 1995-11-28 | Reticle for Semiconductor Device Manufacturing |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970028813A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990021288A (en) * | 1997-08-30 | 1999-03-25 | 윤종용 | Reticle for Semiconductor Device Manufacturing |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60170935A (en) * | 1984-02-16 | 1985-09-04 | Nec Corp | Photomask for integrated circuit |
US4849313A (en) * | 1988-04-28 | 1989-07-18 | Vlsi Technology, Inc. | Method for making a reticle mask |
JPH05341499A (en) * | 1992-06-08 | 1993-12-24 | Matsushita Electron Corp | Reticle for stepper |
JPH06342745A (en) * | 1993-06-01 | 1994-12-13 | Oki Electric Ind Co Ltd | Mark for measuring alignment accuracy |
KR100210899B1 (en) * | 1994-03-22 | 1999-07-15 | 김영환 | Photomask fabrication method for wafer manufacture |
-
1995
- 1995-11-28 KR KR1019950044257A patent/KR970028813A/en not_active Application Discontinuation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60170935A (en) * | 1984-02-16 | 1985-09-04 | Nec Corp | Photomask for integrated circuit |
US4849313A (en) * | 1988-04-28 | 1989-07-18 | Vlsi Technology, Inc. | Method for making a reticle mask |
JPH05341499A (en) * | 1992-06-08 | 1993-12-24 | Matsushita Electron Corp | Reticle for stepper |
JPH06342745A (en) * | 1993-06-01 | 1994-12-13 | Oki Electric Ind Co Ltd | Mark for measuring alignment accuracy |
KR100210899B1 (en) * | 1994-03-22 | 1999-07-15 | 김영환 | Photomask fabrication method for wafer manufacture |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990021288A (en) * | 1997-08-30 | 1999-03-25 | 윤종용 | Reticle for Semiconductor Device Manufacturing |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |