KR970048925A - Masks used in the manufacture of semiconductor devices - Google Patents
Masks used in the manufacture of semiconductor devices Download PDFInfo
- Publication number
- KR970048925A KR970048925A KR1019950057028A KR19950057028A KR970048925A KR 970048925 A KR970048925 A KR 970048925A KR 1019950057028 A KR1019950057028 A KR 1019950057028A KR 19950057028 A KR19950057028 A KR 19950057028A KR 970048925 A KR970048925 A KR 970048925A
- Authority
- KR
- South Korea
- Prior art keywords
- mask
- dlc
- dummy
- mask pattern
- pattern
- Prior art date
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- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
촛점심도 마진 및 해상도를 증가시킬 수 있는 DLC(dummy fined mask) 마스크에 관하여 개시한다. 본 발명은 마스크 기판에 콘택용 마스크 패턴과 더미용 마스크 패턴을 갖는 DLC 마스크에 있어서, 상기 콘택용 마스크 패턴은 상기 마스크 기판의 제1영역에 형성되고, 상기 더미용 마스크 패턴은 상기 마스크 기판의 제2영역에 형성된 것을 특징으로 하는 DLC 마스크를 제공한다. 본 발명은 콘택용 마스크 패턴과 더미용 마스크 패턴을 나누어 배치함으로써 마스크를 검사시 결함의 검사가 쉬워지고, DLC 마스크의 장점 또한 유지할 수 있다.Disclosed is a dummy fined mask (DLC) mask that can increase the depth of focus margin and resolution. A DLC mask having a contact mask pattern and a dummy mask pattern on a mask substrate, wherein the contact mask pattern is formed in a first region of the mask substrate, and the dummy mask pattern is formed on the mask substrate. Provided is a DLC mask formed in two regions. According to the present invention, by arranging the contact mask pattern and the dummy mask pattern separately, it is easy to inspect defects when inspecting the mask and maintain the advantages of the DLC mask.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 본 발명에 의한 DLC 마스크를 도시한 평면도이다.2 is a plan view showing a DLC mask according to the present invention.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950057028A KR970048925A (en) | 1995-12-26 | 1995-12-26 | Masks used in the manufacture of semiconductor devices |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950057028A KR970048925A (en) | 1995-12-26 | 1995-12-26 | Masks used in the manufacture of semiconductor devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR970048925A true KR970048925A (en) | 1997-07-29 |
Family
ID=66618282
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950057028A KR970048925A (en) | 1995-12-26 | 1995-12-26 | Masks used in the manufacture of semiconductor devices |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR970048925A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100389567B1 (en) * | 1999-08-19 | 2003-06-27 | 엔이씨 일렉트로닉스 코포레이션 | Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus |
-
1995
- 1995-12-26 KR KR1019950057028A patent/KR970048925A/en not_active Application Discontinuation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100389567B1 (en) * | 1999-08-19 | 2003-06-27 | 엔이씨 일렉트로닉스 코포레이션 | Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WITN | Withdrawal due to no request for examination |