KR970048927A - Mask pattern for forming fine contact hole in semiconductor device - Google Patents
Mask pattern for forming fine contact hole in semiconductor device Download PDFInfo
- Publication number
- KR970048927A KR970048927A KR1019950057038A KR19950057038A KR970048927A KR 970048927 A KR970048927 A KR 970048927A KR 1019950057038 A KR1019950057038 A KR 1019950057038A KR 19950057038 A KR19950057038 A KR 19950057038A KR 970048927 A KR970048927 A KR 970048927A
- Authority
- KR
- South Korea
- Prior art keywords
- contact hole
- pattern
- semiconductor device
- mask pattern
- contact
- Prior art date
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
본 발명은 반도체장치의 미세 콘택홀 형성을 위한 마스크 패턴에 관한 것으로, 일정크기의 사각형 형태를 갖는 콘택홀 패턴; 상기 콘택홀 패턴의 상변 및 하변에 각각 접하면서 상기 콘택홀의 바깥쪽으로 길게 배치된 복수의 더미라인; 및 상기 콘택홀 패턴의 좌변과 우변에 각각 접하면서 상기 콘택홀의 바깥쪽에 위치하는 위상 반전 패턴을 포함하는 것을 특징으로 하는 반도체장치의 미세 콘택홀 형성을 위한 마스크 패턴을 제공한다.The present invention relates to a mask pattern for forming a fine contact hole of a semiconductor device, the contact hole pattern having a rectangular shape of a predetermined size; A plurality of dummy lines disposed in contact with an upper side and a lower side of the contact hole pattern to extend outwardly of the contact hole; And a phase reversal pattern positioned at an outer side of the contact hole while being in contact with the left side and the right side of the contact hole pattern, respectively.
본 발명에 의하면, 해상도가 우수한 미세 콘택홀을 구현할 수 있다.According to the present invention, it is possible to implement a fine contact hole with excellent resolution.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 본 발명의 실시예에 의한 미세 콘택홀 형성을 우한 마스크 패턴을 도시한 평면도.2 is a plan view showing a mask pattern for the formation of a fine contact hole according to an embodiment of the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950057038A KR970048927A (en) | 1995-12-26 | 1995-12-26 | Mask pattern for forming fine contact hole in semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950057038A KR970048927A (en) | 1995-12-26 | 1995-12-26 | Mask pattern for forming fine contact hole in semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970048927A true KR970048927A (en) | 1997-07-29 |
Family
ID=66618288
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950057038A KR970048927A (en) | 1995-12-26 | 1995-12-26 | Mask pattern for forming fine contact hole in semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970048927A (en) |
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1995
- 1995-12-26 KR KR1019950057038A patent/KR970048927A/en not_active Application Discontinuation
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Withdrawal due to no request for examination |