KR970048967A - Photomask with Multiple Overlay Keys - Google Patents

Photomask with Multiple Overlay Keys Download PDF

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Publication number
KR970048967A
KR970048967A KR1019950046356A KR19950046356A KR970048967A KR 970048967 A KR970048967 A KR 970048967A KR 1019950046356 A KR1019950046356 A KR 1019950046356A KR 19950046356 A KR19950046356 A KR 19950046356A KR 970048967 A KR970048967 A KR 970048967A
Authority
KR
South Korea
Prior art keywords
photomask
overlay
keys
overlay keys
mask substrate
Prior art date
Application number
KR1019950046356A
Other languages
Korean (ko)
Inventor
김재호
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950046356A priority Critical patent/KR970048967A/en
Publication of KR970048967A publication Critical patent/KR970048967A/en

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Abstract

복수의 오버레이 키(ovdrlay key)들을 갖는 포토마스크에 관하여 개시한다. 본 발명은 마스크 기판의 중앙에 제1오버레이 키가 형성된 중앙영역과 상기 중앙영역의 주변에 형성된 주변영역으로 구성되는 포토마스크에 있어서, 상기 주변영역에 복수의 제2오버레이 키가 형성되어 있는 것을 특징으로 하는 포토마스크를 제공한다. 상기 제2오버레이 키는 상기 마스크 기판의 엣지에 4개 형성되어 있다. 본 발명의 포토마스크는 주변영역의 엣지에 오버레이 키가 마련되어 장비가 장비간의 트러짐 정도를 직접 확인할 수 있다.A photomask having a plurality of overlay keys is disclosed. The present invention provides a photomask comprising a central area having a first overlay key formed in a center of a mask substrate and a peripheral area formed around the central area, wherein a plurality of second overlay keys are formed in the peripheral area. A photomask is provided. Four second overlay keys are formed on an edge of the mask substrate. In the photomask of the present invention, the overlay key is provided at the edge of the peripheral area so that the equipment can directly check the degree of breakdown between the equipment.

Description

복수의 오버레이 키를 갖는 포토마스크Photomask with Multiple Overlay Keys

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제2도는 본 발명에 의한 포토마스크의 평면도이다.2 is a plan view of a photomask according to the present invention.

Claims (2)

마스크 기판의 중앙에 제1오버레이 키가 형성된 중앙영역과 상기 중앙영역의 주변에 형성된 주변영역으로 구성되는 포토마스크에 있어서, 상기 주변영역에 복수의 제2오버레이 키가 형성되어 있는 것을 특징으로 하는 포토마스크.A photomask comprising a center region in which a first overlay key is formed in a center of a mask substrate and a peripheral region formed around the center region, wherein a plurality of second overlay keys are formed in the peripheral region. Mask. 제1항에 있어서, 상기 제2오버레이 키는 상기 마스크 기판의 엣지에 4개 형성되는 것을 특징으로 하는 포토마스크.The photomask of claim 1, wherein four second overlay keys are formed at edges of the mask substrate. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950046356A 1995-12-04 1995-12-04 Photomask with Multiple Overlay Keys KR970048967A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950046356A KR970048967A (en) 1995-12-04 1995-12-04 Photomask with Multiple Overlay Keys

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950046356A KR970048967A (en) 1995-12-04 1995-12-04 Photomask with Multiple Overlay Keys

Publications (1)

Publication Number Publication Date
KR970048967A true KR970048967A (en) 1997-07-29

Family

ID=66593488

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950046356A KR970048967A (en) 1995-12-04 1995-12-04 Photomask with Multiple Overlay Keys

Country Status (1)

Country Link
KR (1) KR970048967A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010029893A (en) * 1999-09-24 2001-04-16 다니구찌 이찌로오, 기타오카 다카시 Photomask, semiconductor device, and method for exposing through photomask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010029893A (en) * 1999-09-24 2001-04-16 다니구찌 이찌로오, 기타오카 다카시 Photomask, semiconductor device, and method for exposing through photomask

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