KR970023757A - Reticle for Semiconductor Device Manufacturing - Google Patents

Reticle for Semiconductor Device Manufacturing Download PDF

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Publication number
KR970023757A
KR970023757A KR1019950037820A KR19950037820A KR970023757A KR 970023757 A KR970023757 A KR 970023757A KR 1019950037820 A KR1019950037820 A KR 1019950037820A KR 19950037820 A KR19950037820 A KR 19950037820A KR 970023757 A KR970023757 A KR 970023757A
Authority
KR
South Korea
Prior art keywords
reticle
semiconductor device
contact hole
hole pattern
device manufacturing
Prior art date
Application number
KR1019950037820A
Other languages
Korean (ko)
Inventor
고재승
송문국
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950037820A priority Critical patent/KR970023757A/en
Publication of KR970023757A publication Critical patent/KR970023757A/en

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Abstract

원하는 콘택홀 패턴이 형성된 반도체소자 제조용 레티클이 개시되어 있다.A reticle for manufacturing a semiconductor device having a desired contact hole pattern is disclosed.

본 발명의 레티클은 반도체 웨이퍼상에 전사하기 위하여 레티클상에 형성하는 콘택홀 패턴이 사각형의 각 꼭지점 부근이 외부로 확장된 꽃무늬 형상으로 된 것을 특징으로 한다.The reticle of the present invention is characterized in that the contact hole pattern formed on the reticle in order to be transferred onto the semiconductor wafer has a floral pattern in which the vicinity of each vertex of the rectangle is extended to the outside.

따라서 웨이퍼상에 원하는 사각형의 콘택홀 패턴을 정확히 전사할 수 있어 콘택의 신뢰성이 향상되는 효과가 있다.Therefore, the desired rectangular contact hole pattern can be accurately transferred onto the wafer, thereby improving the reliability of the contact.

Description

반도체소자 제조용 레티클Reticle for Semiconductor Device Manufacturing

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 벌명의 일 실시예에 따른 꽃무늬형 콘택홀 패턴이 형성된 레티클을 나타낸 도면이다.2 is a view showing a reticle formed with a floral contact hole pattern according to an embodiment of the present invention.

Claims (1)

반도체 웨이퍼상에 전사하기 위하여 레티클상에 형성하는 콘택홀 패턴이 사각형의 각 꼭지점부근이 외부로 확장된 꽂무늬 영상으로 된 것을 특징으로 하는 반도체소자 제조용 레티클.A reticle for manufacturing a semiconductor device, characterized in that a contact hole pattern formed on a reticle for transferring onto a semiconductor wafer is a plug-in image in which each corner vertex is extended to the outside. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950037820A 1995-10-28 1995-10-28 Reticle for Semiconductor Device Manufacturing KR970023757A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950037820A KR970023757A (en) 1995-10-28 1995-10-28 Reticle for Semiconductor Device Manufacturing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950037820A KR970023757A (en) 1995-10-28 1995-10-28 Reticle for Semiconductor Device Manufacturing

Publications (1)

Publication Number Publication Date
KR970023757A true KR970023757A (en) 1997-05-30

Family

ID=66584287

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950037820A KR970023757A (en) 1995-10-28 1995-10-28 Reticle for Semiconductor Device Manufacturing

Country Status (1)

Country Link
KR (1) KR970023757A (en)

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