KR940010247A - How to form alignment mark - Google Patents
How to form alignment mark Download PDFInfo
- Publication number
- KR940010247A KR940010247A KR1019920019176A KR920019176A KR940010247A KR 940010247 A KR940010247 A KR 940010247A KR 1019920019176 A KR1019920019176 A KR 1019920019176A KR 920019176 A KR920019176 A KR 920019176A KR 940010247 A KR940010247 A KR 940010247A
- Authority
- KR
- South Korea
- Prior art keywords
- alignment mark
- alignment
- origin
- axes
- center point
- Prior art date
Links
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
본발명은 반도체 소자 제조방법에 관한 것으로, 정렬을 위한 얼라인 먼트 마크 형성방법에 관한 것이다.The present invention relates to a method for manufacturing a semiconductor device, and to a method for forming an alignment mark for alignment.
종래에는 얼라인 먼트 마크를 스크라이프 라인가에 위치시켰다.Conventionally, the alignment mark was located near the stripe line.
따라서 스테퍼 노광면적의 중심점을 원점으로 하여 X, Y축상과 스크라이프 라인이 일치하지 않을 경우는 정렬오차가 발생하여 정확도가 저하되었다.Therefore, when the center point of the stepper exposure area is the origin, when the X and Y axes and the stripe lines do not coincide with each other, alignment errors occur and accuracy is lowered.
본발명은 얼라인 먼트 마크를 스테퍼 노광면적의 중심점을 원점으로 한 X, Y축상에 위치시킨다.The present invention places the alignment mark on the X and Y axes with the origin as the center point of the stepper exposure area.
따라서, 정렬 정확도가 향상된다.Thus, the alignment accuracy is improved.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제3도는 본발명의 얼라인먼트 마크를 형성한 마스크 평면도,3 is a plan view of a mask forming an alignment mark of the present invention,
제4도는 제3도 A부분 확대도.4 is an enlarged view of a portion A of FIG.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019920019176A KR940010247A (en) | 1992-10-19 | 1992-10-19 | How to form alignment mark |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019920019176A KR940010247A (en) | 1992-10-19 | 1992-10-19 | How to form alignment mark |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR940010247A true KR940010247A (en) | 1994-05-24 |
Family
ID=67210359
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019920019176A KR940010247A (en) | 1992-10-19 | 1992-10-19 | How to form alignment mark |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR940010247A (en) |
-
1992
- 1992-10-19 KR KR1019920019176A patent/KR940010247A/en not_active Application Discontinuation
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E601 | Decision to refuse application |