KR970013080A - 불산(hf)용액을 사용한 습식세정시 파티를 감소방법 - Google Patents
불산(hf)용액을 사용한 습식세정시 파티를 감소방법 Download PDFInfo
- Publication number
- KR970013080A KR970013080A KR1019950026366A KR19950026366A KR970013080A KR 970013080 A KR970013080 A KR 970013080A KR 1019950026366 A KR1019950026366 A KR 1019950026366A KR 19950026366 A KR19950026366 A KR 19950026366A KR 970013080 A KR970013080 A KR 970013080A
- Authority
- KR
- South Korea
- Prior art keywords
- hydrofluoric acid
- solution
- wet cleaning
- reduce
- party
- Prior art date
Links
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 title claims abstract 23
- 238000004140 cleaning Methods 0.000 title claims abstract 7
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 title claims abstract 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract 8
- 238000000034 method Methods 0.000 claims abstract 5
- 239000002245 particle Substances 0.000 claims abstract 4
- 239000008367 deionised water Substances 0.000 claims 2
- 229910021641 deionized water Inorganic materials 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- 239000012530 fluid Substances 0.000 claims 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
본 발명은 불상용액의 표면장력으로 인해 파티클이 웨이퍼에 부착되는 것을 방지하기 위한 불산(HF) 용액을 사용한 습식세정시 파티클 감소방법에 관한 것으로, 불산(HF) 및 탈이온수(DeIonized water)가 혼합된 불산용액을 사용하여 웨이퍼를 세정하는 습식세정에 있어서, 상기 불산의 표면장력을 감소시키기 위해 에탄을(ethanol)을 소정정도 첨가하여 세정하는 것을 특징으로 한다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (2)
- 불산(HF) 및 탈이온수(DeIonized water)가 혼합된 불산용액을 사용하여 웨이퍼를 세정하는 습식세정에 있어서, 상기 불산 용액의 표면장력을 감소시키기 위해 에탄올(ethanol)을 소정정도 첨가하여 세정하는 것을 특징으로 하는 불산(HF) 요액을 사용한 습식세정시 파티클 감소방법.
- 제1항에 있어서, 상기 에탄올은 탈이온수와 에탄올의 혼합비가 10 대 1 내지 10대 10을 이루도록 첨가되는 것을 특징으로 하는 불산(HF) 용액을 사용한 습식세정시 파티클 감소방법.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950026366A KR970013080A (ko) | 1995-08-24 | 1995-08-24 | 불산(hf)용액을 사용한 습식세정시 파티를 감소방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950026366A KR970013080A (ko) | 1995-08-24 | 1995-08-24 | 불산(hf)용액을 사용한 습식세정시 파티를 감소방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR970013080A true KR970013080A (ko) | 1997-03-29 |
Family
ID=66595451
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950026366A KR970013080A (ko) | 1995-08-24 | 1995-08-24 | 불산(hf)용액을 사용한 습식세정시 파티를 감소방법 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR970013080A (ko) |
-
1995
- 1995-08-24 KR KR1019950026366A patent/KR970013080A/ko not_active Application Discontinuation
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E601 | Decision to refuse application |