KR960040357A - 화장용 조성물 또는 약제학적 조성물의 제조에 사용되는 레티노이드의 용도 - Google Patents

화장용 조성물 또는 약제학적 조성물의 제조에 사용되는 레티노이드의 용도 Download PDF

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KR960040357A
KR960040357A KR1019960014519A KR19960014519A KR960040357A KR 960040357 A KR960040357 A KR 960040357A KR 1019960014519 A KR1019960014519 A KR 1019960014519A KR 19960014519 A KR19960014519 A KR 19960014519A KR 960040357 A KR960040357 A KR 960040357A
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radical
naphthyl
adamantyl
salt
benzoic acid
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KR1019960014519A
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베르나르돈 쟝-미쉘
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브라함 쉬르트
쌍트르 앵떼르나씨오날 드 로세르슈 데르마똘로지끄 갈데르마
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Publication of KR960040357A publication Critical patent/KR960040357A/ko

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Abstract

본 발명은 화장용조성물 또는 약제학적조성물의 제조에서 활성화제로 사용되는 레티노이드계 화합물에 관한 것이며, 이들 조성물은 RAR수용체의 과조절 및/또는 비타민 A 과다증에 대한 질환 및/또는 병을 치료하는 것이다.

Description

화장용 조성물 또는 약제학적 조성물의 제조에 사용되는 레티노이드의 용도.
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (24)

  1. RAR수용체의 과조절, 비타민 A과다중, 또는 이들 모두와 관련된 질환 또는 병의 치료에 사용되는 약제학적 조성물의 제조 또는 화장용 조성물에서 활성화제로 유효량 사용되는 하나이상의 하기식(Ⅰ)의 레티노이드계화합물, 그의 염 및 그의 키랄유사체:
    〔식 중, -R1은 (ⅰ)-CH3라디칼 (ⅱ)-CH2OH 라디칼 (ⅲ)-O-R3라디칼 (ⅳ)-CO-R4라디칼을 나타내며 R3및 R4는 하기 의미를 갖고, -Ar은 하기 식의 라디칼이며 :
    R5는 하기 의미를 갖고, -R2는 : (a)－(X)n－(CH2)p－R6라디칼 (b)－(X)n－(CH2)q－R7라디칼 (c)－CH＝CH－(CH2)s－R6라디칼 (d)－CH＝CH－(CH2)t－R7라디칼을 나타내며 R6, R7, X, n, p, q, s 및 t는 하기 의미를 갖고, 이것은 하기를 의미하며 :－R3는 수소원자, 저급알킬 라디칼 또는－(CH2)m－(CO)n－R8라디칼을 나타내고, R8, m 및 n은 하기와 동일한 의미를 갖고, －R4는 : (a)수소원자, (b) 저급 알킬 라디칼, (c)하기 식의 라디칼:(d)－OR9라디칼을 나타내며, R′, R″ 및 R9은 하기와 동일한 의미를 가지며, －R5은 수소 또는 할로겐원자, 탄소수 1내지 20의 직쇄 또는 측쇄 알킬 라디칼, 히드록시 라디칼 또는 －OR10또는 －OCOR10라디칼을 나타내고, R10은 하기와 동일한 의미를 가지며, －R6은 수소원자, 탄소수 1내지 20의 직쇄 또는 측쇄 알킬라디칼, 알케닐라디칼 또는 알키닐라디칼을 나타내고, －R7은 아릴라디칼, 히드록시가 메톡시 또는 아세톡시 또는 아세토니드의 형태로 임의로 보호된 모노-또는 폴리히드록시알킬 라디칼, 아민 작용기가 하나 또는 두개의 저급알킬기로 임의로치환된 아미노알킬라디칼, 폴리에테르라디칼, －COR4라디칼, 포화 또는 불포화 복소환 라디칼 또는 대안적으로 아미노아릴 라디칼을 나타내며,－R8은 저급알킬 라디칼 또는 포화복소환을 나타내고, －R9은 수소원자, 탄소수 1내지 20의 직쇄 또는 측쇄 알킬라디칼, 알케닐라디칼, 모노-또는 폴리히드록시알킬 라디칼, 임의로치환된 아릴 또는 아르알킬라디칼 또는 당 잔기 또는 아미노산 또는 펩티드잔기를 나타내며, －R10은 저급알킬라디칼을 나타내고, －X는 산소 원자 또는 －S(R)r라디칼을 나타내며, －R′및 R″는 동일하거나 상이하며, 수소원자, 저급알킬라디칼, 모노-또는 폴리히드록시알킬 라디칼, 임의로치환된 아릴라디칼 또는 아미노산, 펩티드 또는 당잔기 또는 대안적으로, 함께 포화복소환을 형성하고, ―m은 1내지 3의 정수이며, ―n은 0 및 1의 정수이고, ―p는 5 내지 12의 정수이며, ―q는 0내지 12의 정수이고, ―r은 0내지 2의 정수이며, ―s는 3 내지 10의 정수이고, ―t는 0내지 10의 정수이다.〕
  2. 제1항에 있어서, 식(Ⅰ)의 화합물이 알칼리금속 또는 알칼리토금속 또는 대안적으로 아연 또는 유기아민의 염형태로 제공되는 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체.
  3. 제1항 또는 제2항에 있어서, 저급알킬 라디칼이 메틸, 에틸, 이소프로필, 부틸, ｔ-부틸 및 헥실라디칼을 함유하는 군으로부터 선택되는 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체.
  4. 제1항 또는 제2항에 있어서, 탄소수 1 내지 20의 직쇄 또는 측쇄 알킬라디칼이 메틸, 에틸, 프로필, 2-에틸헥실, 옥틸, 도데실, 헥사데실 및 옥타데실 라디칼을 함유하는 군으로부터 선택되는 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체.
  5. 제1항또는 2항에 있어서, 모노히드록시알킬 라디칼이 히드록시메틸, 2-히드록시에틸, 2-히드록시프로필또는 3-히드록시프로필 라디칼을 함유하는 군으로부터 선택되는 것을 특징으로 하는 레티노이드계 화합물, 그의 염 및 그의 키랄유사체.
  6. 제1항 또는 2항에 있어서, 폴리히드록시알킬 라디칼이 2,3-디히드록시프로필, 2,3,4-트리히드록시부틸 및 2,3,4,5-테트라히드록시펜틸 라디칼 또는 펜타에리트리톨 잔기를 함유하는 군으로부터 선택되는 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체.
  7. 제1항 또는 2항에 있어서, 아릴 라디칼은 하나이상의 할로겐원자, 히드록시 또는 니트로작용기에 의하여 임의로치환된 페닐 라디칼인 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체.
  8. 제1항 또는 2항에 있어서, 아르알킬 라디칼이 하나이상 할로겐원자, 히드록시 또는 니트로작용기에 의하여 임의로 치환된 벤질 또는 펜에틸 라디칼을 함유하는 군으로부터 선택되는 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체.
  9. 제1항 또는 2항에 있어서, 아케닐 라디칼이 탄소수 2 내지 5를 포함하며 하나이상의 에틸렌계불포화물, 특히 아릴라디칼을 갖는 라디칼을 함유하는 군으로부터 선택되는 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체.
  10. 제1항 또는 2항에 있어서, 당 잔기가 글루코스, 갈락토스, 만노스 또는 글루쿠론산 잔기를 함유하는 군으로부터 선택되는 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체.
  11. 제1항 또는 2항에 있어서, 아미노산잔기가 리신, 글리신 또는 아스파르트산에서 유도된잔기를 함유하는 군으로부터 선택되는 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체.
  12. 제1항 또는 2항에 있어서, 펩티드잔기가 디펩티드 또는 트리펩티드잔기를 함유하는 군으로부터 선택되는 것을 특징으로 하는 레티노이드계 화합물, 그의 염 및 그의 키랄유사체.
  13. 제1항 또는 제2항에 있어서, 포화복소환 라디칼이 Ｃ1-Ｃ6알킬 또는 모노-또는 폴리히드록시알킬라디칼에 의하여 4위치에서 임의로 치환된, 피페리디노, 모르폴리노, 피롤리디노 또는 피페라지노 라디칼을 함유하는 군으로부터 선택되는 것을 특징으로 하는 리티노이드계화합물, 그의 염 및 그의 키랄유사체.
  14. 제1항 또는 2항에 있어서, 불포화 복소환이 피리딘, 푸란 또는 티오펜 라디칼로부터 선택되는 것을 특징으로 하는 레티노이드계 화합물, 그의 염 및 그의 키랄유사체.
  15. 제1항 또는 2항에 있어서, 할로겐 원자가 불소, 염소 및 브롬을 함유하는 군으로부터 선택되는 것을 특징으로 하는 레티노이드계 화합물, 그의 염 및 그의 키랄유사체.
  16. 제1항에 있어서, 화합물이 하기를 포함하는 군으로부터 선택되는 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체 : 2-히드록시-4〔7-(1-아다만틸)-6-벤질옥시-2-나프틸〕벤조산, 2-히드록시-4-〔7-(1-아다만틸)-6-헥실옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤조산, 5-〔7-(1-아다만틸)-6-벤질옥시-2-나프틸〕-2-티오펜카르복실산, 4-〔7-(1-아다만틸)-6-벤질옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-벤질옥시카르보닐-2-나프틸〕벤조산, 2-히드록시-4-〔7-(1-아다만틸)-6-(4-플루오로벤질)옥시-2-나프틸〕벤조산, 6-〔7-(1-아다만틸)6-메톡시에톡시메톡시-2-나프틸〕니코틴산, 4-〔7-(1-아다만틸)-6-헵틸옥시-2-나프틸〕벤조산, 2-히드록시-4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤조산, 2-클로로-4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-히드록시헥실옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-히드록시프로필-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-히드록시옥틸옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-히드록시에틸-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-히드록시헵틸옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-히드록시펜틸옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-(4-모르폴리노)에틸옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-(1-피페리디노)에틸옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-카르바모일펜틸옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-에톡시카르보닐펜틸옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-에톡시카르보닐부틸옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-카르복시펜틸옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-카르복시부틸옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤젠메탄올, 4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤즈알데히드, 4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤조산 모르폴리드, Ｎ-에틸-4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤즈아미드, 4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤즈아미드, Ｎ-(4-히드록시페닐)-4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤즈아미드, 4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤졸린피페라진, 프로필4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤조에이트, 4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕페닐 아세테이트, 4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕페놀, 4-〔7-(1-아다만틸)-6-메톡시에시메톡시-2-나프틸〕펜옥시에틸모르폴린 히드로클로라이드, 4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕펜옥시에틸피페리딘 히드로클로라이드, 헥실 4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤조에이트, Ｎ-4-〔7-(1-아다만틸)-6-메톡시에톡시메톡시-2-나프틸〕벤조일〕〕글루탐산, 4-〔7-(1-아다만틸)-6-메톡시헥실옥시-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-메톡시메톡시프로필-2-나프틸〕벤조산, 4-〔7-(1-아다만틸)-6-메톡시메톡시에틸-2-나프틸〕벤조산.
  17. 제1항에 있어서, ―R1이―CO―R4라디칼이고, ―R2가 ―(X)n―(CH2)p―R6또는―(X)n―(CH2)q―R7라디칼이며, ―Ar은 식(a) 또는 (b)의 라디칼을 나타내는 것을 특징으로 하는 식(I)에 대응하는 레티노이드계 화합물, 그의 염 및 그의 키랄유사체.
  18. 제1항 또는 제2항에 있어서, RAR 수용체의 과조절, 비타민Ａ과다증, 또는 이들 모두와 관련된 질환 또는 병이 염증성, 알레르기성 및 면역요소로 이루어진 군에서 선택된 하나이상의 요소에 의하여 나타내는 것을 특징으로 하는 레티노이드계 화합물, 그의 염 및 그의 키랄유사체.
  19. 제1항 또는 제2항에 있어서, 식(Ｉ)의 화합물이 레티노이드계 활성을 갖는 다른 화합물, 비타민Ｄ 또는 그들의 유도체, 코르티코스테로이드, 유리 라디칼, α-히드록시 또는 α-케토산을 조절하는 화합물 또는 그들의 유도체, 또는 대안적으로 이온채널블록커와 조합하여 사용되는 것을 특징으로 하는 레티노이드계 화합물, 그의 염 및 그의 키랄유사체.
  20. 제1항 또는 2항에 있어서, 화장용 또는 약제학적조성물이 장내또는 비경구투여되는 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체.
  21. 제1항 또는 2항에 있어서, 화장용또는 약제학조성물이 국소적으로 또는 눈에 투여되는 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체.
  22. 제21항에 있어서, 식(Ｉ)의 화합물이 조성물의 총중량에 대하여 0.001중량% 내지 5중량%의 농도로 사용되는 것을 특징으로 하는 레티노이드계화합물, 그의 염 및 그의 키랄유사체.
  23. Ｒ7이 나프틸라디칼의 6위치에 있는 탄소의 α위치에 탄소를 갖는 폴리에테르 라디칼인, 제1항내지 제22항중의 어느 한항에서 정의한바와 같은 식(Ⅰ)의 화합물인 것을 특징으로 하는 화합물.
  24. 제23항에 있어서, 화합물이 4-〔7-(1-아다만틸)-6-메톡시메톡시프로필-2-나프틸〕벤조산 및 4-〔7-(1-아다만틸)-6-메톡시메톡시에틸-2-나프틸〕벤조산에서 선택되는 것을 특징으로 하는 화합물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개되는 것임.
KR1019960014519A 1995-05-03 1996-05-03 화장용 조성물 또는 약제학적 조성물의 제조에 사용되는 레티노이드의 용도 KR960040357A (ko)

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NZ286444A (en) 2001-03-30
IL118076A (en) 2001-09-13
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US5952382A (en) 1999-09-14
FR2733684A1 (fr) 1996-11-08
BR9601630A (pt) 1998-03-31
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IL118076A0 (en) 1996-08-04
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