KR960030386A - 반도체 장치 - Google Patents

반도체 장치 Download PDF

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Publication number
KR960030386A
KR960030386A KR1019960000776A KR19960000776A KR960030386A KR 960030386 A KR960030386 A KR 960030386A KR 1019960000776 A KR1019960000776 A KR 1019960000776A KR 19960000776 A KR19960000776 A KR 19960000776A KR 960030386 A KR960030386 A KR 960030386A
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South Korea
Prior art keywords
semiconductor device
oxide
range
weight ratio
substrate
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KR1019960000776A
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English (en)
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KR100363054B1 (ko
Inventor
마사하루 니시우라
아키라 모로즈미
도미오 시미즈
가츠미 야마다
시게마사 사이토
Original Assignee
나카자토 요시히코
후지 덴키 가부시키가이샤
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Publication of KR960030386A publication Critical patent/KR960030386A/ko
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Publication of KR100363054B1 publication Critical patent/KR100363054B1/ko

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Abstract

본 발명은 원료비가 염가인 산화 알루미늄 분말체를 주재료로 하여, 기계적 강도를 높이며, 응력 완화의 특수한 구조를 채용하지 않고서 기판 자체의 박형화에 의해서 방열성의 개선이 도모될 수 있도록 한 반도체 장치를 제공하는 것을 목적으로 하며, 그 구성은 파워 트랜지스터·모듈에 이용하는 CBC(Ceramic Bonding Cupper)기판(2)은 세라믹스 기판(2a)의 내면 및 외면에 박형의 동판(2b,2c)을 예컨대 다이렉트 본드·컷퍼법에 의해 직접 접합한 것으로서, 상면측의 동판(2c)에 회로 패턴이 형성되어 있다. 세라믹스 기판(2a)은 산화 알루미늄을 주성분으로 하여 이것에 산화지르코늄을 첨가하고, 또 참가제로서 산화이트륨, 산화칼슘, 산화마그네슘, 산화세륨중 어느 하나를 각각 0.1~2wt%, 0.02~0.5wt%, 0.02~0.4wt%, 0.02~0.5wt% 첨가한 고온 소성체이다. 산화 알루미늄 단일체의 세라믹스 기판과 비교하여 특히 휨 강도가 대폭 높아지고, 열전도율이 한층 더 향상된다. 기판 자체의 박형화가 가능하고 방열성에 뛰어난 반도체 장치를 얻을 수 있다.

Description

반도체 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제3도 (a)는 본 발명의 실시예에 관한 반도체 장치를 도시하는 부분 평면도이고, (b)는 제3도 (a)의 A-A' 선에 따라서 절단한 상태를 도시하는 부분 단면도.

Claims (14)

  1. 리드 프레임을 갖는 절열수지제의 케이스 틀과, 상기 케이스 틀의 한쪽의 개구를 폐쇄하는 금속제의 방열 베이스와, 상기 방열 베이스의 내면에 고착되어 상기 리드 프레임의 내부 리드 선단에 접속되는 반도체 소자가 실장된 절열기판과, 상기 케이스 틀의 내부 공간에 충전되어 상기 절열 기판 및 상기 내부 리드를 침지하는 겔형 수지 말봉재와, 상기 케이스 틀의 다른쪽의 개구를 뚜껑으로 폐쇄하는 절열수지제의 뚜껑을 가지며, 상기 절열 기판이 절연성 세라믹 기판의 외면과 내면에 접합하여 맞붙인 박(箔)형의 동판으로 이루어진 반도체 장치에 있어서, 상기 절연성 세라믹 기판은 산화 알루미늄을 주성분으로 하여 산화지르코늄을 첨가하고, 이것에 산화이트륨, 산화칼슘, 산화마그네슘, 산화세륨으로 이루어지는 군(群)에서 선택된 1종류 이상의 첨가제를 첨가하여 제작된 세라믹 소성체로 이루어지는 것을 특징으로 하는 반도체 장치.
  2. 제1항에 있어서, 상기 산화 알루미늄의 중량비가 70% 이상 100% 미만의 범위에, 상기 산화지르코늄의 중량비가 0%를 초과하여 30%까지의 범위에, 상기 선택된 첨가제의 총량의 중량비가 0.02% 이상 2% 이하의 범위에 있는 것을 특징으로 하는 반도체 장치.
  3. 제2항에 있어서, 상기 선택된 첨가제는 산화이트륨으로서, 그 중량비는 0.1% 이상 2% 이하의 범위인 것을 특징으로 하는 반도체 장치.
  4. 제2항에 있어서, 상기 선택된 첨가제는 산화칼슘으로서, 그 중량비는 0.02% 이상 0.5% 이하의 범위인 것을 특징으로 하는 반도체 장치.
  5. 제2항에 있어서, 상기 선택된 첨가제는 산화마그네슘으로서, 그 중량비는 0.02% 이상 0.4% 이하의 범위인 것을 특징으로 하는 반도체 장치
  6. 제2항에 있어서, 상기 선택된 첨가제는 산화세륨으로서, 그 중량비는 0.02% 이상 0.5% 이하의 범위인 것을 특징으로 하는 반도체 장치
  7. 제2항에 있어서, 적어도 상기 첨가제의 2종류가 첨가되어 있고, 그 총점가량의 mol%가 0.05% 이상 1.0% 이하의 범위에 있는 것을 특징으로 하는 반도체 장치
  8. 제3항 내지 제7항 중 어느 한 항에 있어서, 상기 산화 알루미늄의 중량비가 82% 이상 97% 이하의 범위이고, 상기 산화지르코늄의 중량비가 2.5% 이상 17.5% 이하의 범위인 것을 특징으로 하는 반도체 장치.
  9. 제1항 내지 제7항중 어느 한 항에 있어서, 상기 세라믹스 원료 분말체의 입자 직경은 0.5㎛ 이상 3㎛ 이하인 것을 특징으로 하는 반도체 장치.
  10. 제8항에 있어서, 상기 세라믹스 원료 분말체의 입자 직경은 0.5㎛ 이상 3㎛ 이하인 것을 특징으로 하는 반도체 장치.
  11. 제1항 내지 제7항중 어느 한 항에 있어서, 절연성 세라믹 기판의 외면과 내면에 박형의 동판을 접합하여 이루어지는 것을 특징으로 하는 반도체 장치.
  12. 제8항에 있어서, 절연성 세라믹 기판의 외면과 내면에 박형의 동판을 접합하여 이루어지는 것을 특징으로 하는 반도체 장치.
  13. 제9항에 있어서, 절연성 세라믹 기판의 외면과 내면에 박형의 동판을 접합하여 이루어지는 것을 특징으로 하는 반도체 장치.
  14. 제10항에 있어서, 절연성 세라믹 기판의 외면과 내면에 박형의 동판을 접합하여 이루어지는 것을 특징으로 하는 반도체 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960000776A 1995-01-19 1996-01-17 반도체장치 KR100363054B1 (ko)

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