KR960023221A - 표면경도 향상을 위한 스텔라이트재의 코팅방법 - Google Patents
표면경도 향상을 위한 스텔라이트재의 코팅방법 Download PDFInfo
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- KR960023221A KR960023221A KR1019940040274A KR19940040274A KR960023221A KR 960023221 A KR960023221 A KR 960023221A KR 1019940040274 A KR1019940040274 A KR 1019940040274A KR 19940040274 A KR19940040274 A KR 19940040274A KR 960023221 A KR960023221 A KR 960023221A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Chemical Vapour Deposition (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
본 발명은 정비 및 공작용 기어, 부싱, 슬리브재료등으로 사용되는 스텔라이트재 질화층 및 Ti 화합물 코팅층을 형성하는 방법에 관한 것으로써, 스텔라이트재를 플라즈마 확산처리, 및 플라즈마 화학증착처리를 연속적으로 실시하여 확산질화층과 Ti-화합물층을 형성함으로써 스텔라이트재의 표면경도를 향상시키고자 하는데, 그 목적이 있다.
본 발명은 표면경도를 향상시키기 위하여 스텔라이트재에 코팅층을 형성하는 방법에 있어서, 스텔라이트재를 플라즈마 질화처리하여 CrN 및 Cr2N의 혼합코팅층을 형성한 다음, Ti 공급원: TiCl4용액, N 공급원: N2가스, C 공급원: CH4, 플라즈마 발생원: H2및 Ar 가스, 기판온도: 550∼750℃ 및 인가전압: 600∼700V의 증착조건으로 플라즈마 증착하여 상기 혼합 코팅층위에 TiN/TiCN/Tic 피막을 형성하여 스텔라이트재의 표면 경도를 향상시키는 방법을 그 요지로 한다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 통상적인 플라즈마 화학증착처리장치의 개략도, 제2도는 본 발명에 따라 스텔라이트재를 플라즈마 질화처리(확산처리) 및 플라즈마 화학증착처리한 후의 코팅층의 구조도.
Claims (1)
- 표면경로를 향상시키기 위하여 스텔라이트재에 코팅층을 형성하는 방법에 있어서, 스텔라이트재를 플라즈마 질화처리하여 CrN 및 Cr2N의 혼합코팅층을 형성한 다음, Ti 공급원: TiCL4용액, N 공급원: N2가스, C 공급원:CH4, 플라즈마 발생원: H2및 Ar 가스, 기판온도: 550∼750℃ 및 인가전압: 600∼700V의 증착조건으로 플라즈마 증착하여 상기 혼합 코팅층위에 TiN/TiCN/Tic 피막을 형성하는 것을 특징으로 하는 표면경도 향상을 위한 스텔라이트재의 코팅방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1019940040274A KR0146878B1 (ko) | 1994-12-31 | 1994-12-31 | 표면경도 향상을 위한 스텔라이트재의 코팅방법 |
Applications Claiming Priority (1)
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KR1019940040274A KR0146878B1 (ko) | 1994-12-31 | 1994-12-31 | 표면경도 향상을 위한 스텔라이트재의 코팅방법 |
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KR960023221A true KR960023221A (ko) | 1996-07-18 |
KR0146878B1 KR0146878B1 (ko) | 1998-11-02 |
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KR1019940040274A KR0146878B1 (ko) | 1994-12-31 | 1994-12-31 | 표면경도 향상을 위한 스텔라이트재의 코팅방법 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100825509B1 (ko) * | 2006-08-22 | 2008-04-25 | 홍명수 | 용융금속 도금설비용 저널베어링 및 그 제조방법 |
Families Citing this family (2)
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JP3530021B2 (ja) * | 1998-05-25 | 2004-05-24 | 株式会社日立製作所 | 真空処理装置及びその処理台 |
KR101381639B1 (ko) * | 2013-06-05 | 2014-04-04 | 주식회사 인팩 | 추력 분산을 갖는 부시 |
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1994
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100825509B1 (ko) * | 2006-08-22 | 2008-04-25 | 홍명수 | 용융금속 도금설비용 저널베어링 및 그 제조방법 |
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KR0146878B1 (ko) | 1998-11-02 |
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