KR940014373A - (시클로)지방족 에폭시 화합물 - Google Patents

(시클로)지방족 에폭시 화합물 Download PDF

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Publication number
KR940014373A
KR940014373A KR1019930029452A KR930029452A KR940014373A KR 940014373 A KR940014373 A KR 940014373A KR 1019930029452 A KR1019930029452 A KR 1019930029452A KR 930029452 A KR930029452 A KR 930029452A KR 940014373 A KR940014373 A KR 940014373A
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South Korea
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formula
radicals
cyclo
formulation
radical
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KR1019930029452A
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KR100294774B1 (ko
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스타인만 베티나
볼프 진-피에르
슐츠테쓰 아드리안
훈지케르 막스
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베르너 발데크
시바-가이기 아게
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/38—Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C07D303/40—Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals by ester radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/24—Di-epoxy compounds carbocyclic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3218—Carbocyclic compounds

Abstract

분자내 1이상의 아크릴레이트기와 1이상의 환형 지방족 에폭시기를 포함하는 신규 (시클로)지방족 에폭시화합물은 도포 배합물, 접착제, 제조용으로 또는 스테레오리토그래픽에서 사용될 수 있다. 이들은 응집성 균일 네트워크를 포함하기 때문에, 제조되는 3차원 제품은 매우 양호한 그린 강도와 매우 양호한 강도 특성을 갖는다.

Description

(시클로)지방족 에폭시 화합물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (9)

  1. 하기식(Ⅰ) 및 (Ⅱ)의 신규 (시클로)지방족 에폭시 화합물 :
    및
    상기식에서, a는 일반식의 라디칼이고, A는 시클로헥실 라디칼 또는 일반식의 수소화된 라디칼이며, R은 일반식의 라디칼, 비치환 또는 치환된 1가 내지 6가 지방족 알코올 라디칼, 비치환 또는 치환된 방향족-지방족 알코올 라디칼, 비치환 또는 치환된 1가 내지 4가 폴리에테르 라디칼 또는 폴리에스테르 라디칼, 비치환 또는 치환된 1가 내지 4가 폴리카프롤락톤 라디칼, 비치환 또는 치환된 1가 내지 4가 폴리우레탄 라디칼 또는 하기식의 라디칼 ;
    R1은 수소 또는 CH3이며, x는1 내지 6의 정수이고, y는 2내지 20의 정수이며, z는 1 내지 10의 정수이고, R3및 R4는 각각 독립적으로 비치환 또는 치환된 지방족, 방향족 또는 환형지방족 탄화수소 라디칼이다.
  2. 제 1항에 있어서, 일반식(Ⅰ)의 (시클로)지방족 에폭시 화합물.
  3. A가 시클로헥실 라디칼, R〔-CH2-〕Y기 또는 하기식의 라디칼인 일반식(Ⅰ)의 (시클로)지방족 에폭시 화합물 :
    상기식에서 y, z 및 R1은 제 1항에서 일반식(Ⅰ)에 대해 정의한바와 같고, x는 2이다.
  4. 라디칼 R을 도입하여 하기식(Ⅳ)의 디에스테르-디카르복시산을 형성하여 글리시딜 (메틸)아크릴레이트와 더 반응하여 하기식(Ⅴ)의 생성물을 형성하며 제조된 디아크릴레이트가 후속적으로 일반식(Ⅰ)의 (시클로)지방족 에폭시 화합물로 산화되거나, 또는 상응하는 불포화 카르복시기를 함유하고 (메트)아크릴레이트기를 함유하는 화합물이 산화되어 일반식(Ⅱ)의 화합물로 되는 화합물 1몰 이상과 일반식(Ⅲ)의 불포화된 환형 무수물 1몰 이상을 반응시키는 것을 포함하는 일반식(Ⅰ)의 (시클로)지방족 에폭시 화합물의 제조방법 ;
    상기식에서 x, R 및 R1은 제 1항에 정의한 바와 같다.
  5. 하기 성분을 포함하는 배합물 : a) 일반식(Ⅰ)내지 (Ⅱ)의 (시클로)지방족 에폭시 화합물 5내지 60중량%, b) 라디칼 광개시제 0 내지 10중량%, c) 종래 부가제 0 내지 10중량%, d) 모노-, 디- 또는 다관능성 (메트)아크릴레이트 0 내지 40중량%, e) 디- 또는 다관능성 에폭시드 30 내지 70%중량, f) OH-말단 폴리에테르 또는 폴리에스테르 5 내지 40중량% 및 g) 양이온성 광개시제 0.5 내지 5중량%.
  6. 도포 조성물, 접착제, 포토레지스트 제조용 또는 스테레오리토그래픽의 용도로서 제5항에 정의된 배합물의 용도.
  7. 상기 배합물을 화학선으로 조사시키는 것을 포함하는, 제5항에 정의되어 있는 배합물을 증합시키는 방법.
  8. UV- 및 또는 VIS 광원으로 전체 표면 또는 미리 결정된 형태의 액체 배합물 층을 조사하고, 조사된 범위내의 층을 원하는 층 두께로 고형화한 다음, 고형화된 층 위에 배합물의 새로운 층을 형성하고, 전체 표면 또는 미리 결정된 형태에 상기와 같이 조사하며, 이렇게 반복된 도포 및 조사에 의해 서로서로 부착된 고형 층 다수로부터 3차원 제품이 제조되는 것을 포함하는, 리토그래피 기술에 의해 제5항에 정의되어 있는 배합물로부터 3차원 제품을 제조하는 방법.
  9. 제 8항에 있어서, 레이저 빔, 바람직하기로는 컴퓨터로 조정되는 레이저 빔을 광원으로 사용하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019930029452A 1992-12-23 1993-12-22 (시클로)지방족에폭시화합물 KR100294774B1 (ko)

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Application Number Priority Date Filing Date Title
CH394392 1992-12-23
CH92-2/3943 1992-12-23

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KR940014373A true KR940014373A (ko) 1994-07-18
KR100294774B1 KR100294774B1 (ko) 2001-09-17

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US (2) US5468886A (ko)
EP (1) EP0604364B1 (ko)
JP (1) JPH06228271A (ko)
KR (1) KR100294774B1 (ko)
AT (1) ATE163438T1 (ko)
AU (2) AU672645B2 (ko)
CA (1) CA2112010C (ko)
DE (1) DE59308175D1 (ko)
ES (1) ES2114601T3 (ko)
HK (1) HK1005623A1 (ko)
TW (1) TW259797B (ko)

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Publication number Priority date Publication date Assignee Title
KR20170096280A (ko) * 2016-02-15 2017-08-24 삼성디스플레이 주식회사 플렉서블 표시장치 및 그것의 하드 코팅 고분자 제조방법

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AU672645B2 (en) 1996-10-10
CA2112010C (en) 2000-03-07
EP0604364A3 (de) 1995-01-04
EP0604364A2 (de) 1994-06-29
EP0604364B1 (de) 1998-02-25
DE59308175D1 (de) 1998-04-02
AU5263993A (en) 1994-07-07
JPH06228271A (ja) 1994-08-16
US5468886A (en) 1995-11-21
ES2114601T3 (es) 1998-06-01
AU683002B2 (en) 1997-10-23
AU1009097A (en) 1997-03-06
TW259797B (ko) 1995-10-11
ATE163438T1 (de) 1998-03-15
KR100294774B1 (ko) 2001-09-17
CA2112010A1 (en) 1994-06-24
HK1005623A1 (en) 1999-01-15
US5599651A (en) 1997-02-04

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