KR900012131A - 감광성 액체 수지 조성물 및 그로부터의 3차원 물체를 제조하는 방법 - Google Patents

감광성 액체 수지 조성물 및 그로부터의 3차원 물체를 제조하는 방법 Download PDF

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KR900012131A
KR900012131A KR1019900000128A KR900000128A KR900012131A KR 900012131 A KR900012131 A KR 900012131A KR 1019900000128 A KR1019900000128 A KR 1019900000128A KR 900000128 A KR900000128 A KR 900000128A KR 900012131 A KR900012131 A KR 900012131A
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훈치커 막스
슐테스 아드리안
호프만 만프레드
클링게르트 베른트
노엘 레이덴 리챠드
알란 슈미트 크리스
베른하드 파을
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베르너 발대크
시바-가이기 아게
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
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    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
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    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
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    • G03C9/00—Stereo-photographic or similar processes
    • G03C9/08—Producing three-dimensional images
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images

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Abstract

내용 없음

Description

감광성 액체 수지 조성물 및 그로부터의 3차원 물체를 제조하는 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (20)

  1. (Ⅰ)25℃에서 점도가 500mPas이상인 2관능성이 단량체 또는 올리고머 아크릴레이트 또는 메타크릴레이트 1개 이상, (ⅱ) 하기 일반식(Ⅰ), (Ⅱ) 및 (Ⅲ)의 화합물로 구성된 군에서 선정된 트리-테트라-또는 렌타아크릴레이트 또는 렌테메타크릴레이트 1개 이상, (ⅲ) 하기 일반식 (Ⅳ)의 불포화 단관능성 단량체 화합물 1개 이상 및 (ⅳ), (ⅰ), (ⅱ) 및/또는 (ⅲ)에 대한 광중합반응 개시제를 함유하는 감광성 액체 수지 조성물.
    상기식에서, R1은 수소, 메틸, 히드록시 또는 일반식
    의 기이고 R1은 일반식
    의 기이며, n은 0, 1, 2 또는 3의 정수이고, R3및 R4는 서로 독립적으로 수소 또는 메틸이며, R5는 수소 또는 메틸이고, R6은 일반식
    의 기이며, R7은테트라히드로푸르푸릴, 시클로헥실, 2-페녹시에틸, 벤질, 이소보르닐, 글리시딜, 디시클로펜테일, 모르폴리노에틸, 디메틸아미노에틸, 디에틸아미노에틸, 또는 C1-C20직쇄 또는 측쇄 지방족 잔기이고, 또는 R5가 수소이며, R6은 추가로 피롤리디논-2-일, 이미다졸릴, 카르바졸릴, 안트라센일, 페닐, C5-C8시클로알킬, 나프텐일, 2-노르보르닐, 피리딜, N-카프로락타밀 또는 톨루일이다.
  2. 제1항에 있어서, 성분(Ⅰ)로서 적어도 1개의 하기 일반(Ⅷ)의 아크릴 또는 메타크릴산디 에스테르를 함유하는 조성물.
    상기식에서, p는 0 또는 1이고, t는 0 또는 1이며, p가 0이면, t는 2 또는 3일수 있고, X는 -O-, -S-, -SO2- 또는 -C(R10)(R11)-이며, R10및 R11은 서로 독립적으로 수소, -CF3또는 메틸이고, R7은 p가 1일 때 수소이고 또는 p가 0이면 수소 또는 메틸이며, R8은 p가 1일 때 히드록시이고 또 p가 0일 때 수소이고, 또 R9는 수소 또는 메틸임.
  3. 제2항에 있어서, 일반식(Ⅷ)에서 p가 1인 조성물.
  4. 제3항에 있어서, 일반식(Ⅷ)에서 X가 -C(CH3)2-인 조성물.
  5. 제2항에 있어서, 성분(Ⅰ)로서 p가 1인 화합물 1개 이상과 p가 0인 화합물 1개 이상을 포함하는 일반식(Ⅷ) 화합물을 함유하는 조성물.
  6. 제1항에 있어서, 성분(Ⅰ)을 전체 조성물의 약 10내지 약 80중량 %양으로 함유하는 조성물.
  7. 제3항에 있어서, 전체 조성물을 기준해서 30내지 약 60중량 %의 일반식(Ⅷ)의 화합물을 함유하는 조성물.
  8. 제1항에 있어서, R1이 메틸 또는 일반식(Ⅳ)의 가이고 또는 R2는 n이 0인 일반식(Ⅴ)의 기인 일반식(Ⅰ)의 트리아크릴레이트 또는 트리메티크릴레이트 1개 이상을 성분(Ⅱ)로서 함유하는 조성물
  9. 제1항에 있어서, 트리메틸올프판트리메타크릴레이트 또는 디펜티에리트톨펜다아크릴레이트를 성분(Ⅱ)로 함유하는 조성물.
  10. 제1항에 있어서, 전체 조성물을 기준해서 성분(Ⅱ)를 약 5내지 약 25중량 %양으로 함유하는 조성물.
  11. 제1항에 있어서 R5가 수소이고 또 R6이 일반식(Ⅶ)의 기, 피롤리돈-2-일 또는 N-카프로락트아밀인 일반식(Ⅵ)의 화합물을 성분(Ⅲ)으로 함유하는 조성물.
  12. 제11항에 있어서, 1-비닐피롤리돈, 이소보르닐아크릴레이트 및/또는 페녹시에틸아크릴레이트를 성분(Ⅲ)으로 함유하는 조성물.
  13. 제1항에 있어서, 전체 조성물을 기준해서 약 1내지 약 25중량 %의 양으로 성분(Ⅲ)을 함유하는 조성물.
  14. 제1항에 있어서, 이세토페논, 1-히드록시페닐케톤 및/또는 벤질케탈을 성분(Ⅳ)로 함유하는 조성물.
  15. 제1항에 있어서, 전체 조성물을 기준해서 약 0.1내지 약 10중량 %양으로 성분(Ⅳ)를 함유하는 조성물.
  16. 제1항에 있어서, 30℃에서 점도가 500 내지 5000mPas 범위인 조성물.
  17. 조성물을 화학선 처리시키는 것을 포함하는 제1항에 따른 조성물을 중합시키는 방법.
  18. 제1항에 따른 조성물의 본체를 액체 매질로서 함유하고 본 조성물의 지정 표면에 규정된 패턴으로 조사시켜 상기 지정 표면에서 얇은 단면의 단층을 제공하며, 또 계속해서 이러한 단층을 반복형성하여 상기 물체를 규정하는 인접 단층으로부터 소망하는 3차원 물체를 제조하는 것을 포함하는 규정된 방사선 처리될 때 그의 물리적 상태가 변화될 수 있는 액체 매질로부터 3차원 물체를 제조하는 방법.
  19. 제18항에 있어서, 방사선원이 UV-레이저 비임인 방법.
  20. 제19항에 있어서, 레이저 비임의 콤퓨터로 제어되는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900000128A 1989-01-10 1990-01-08 감광성 액체 수지 조성물 및 그로부터 3차원 물체를 제조하는 방법 KR0147812B1 (ko)

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US29532889A 1989-01-10 1989-01-10
US295,328 1989-01-10
US32694889A 1989-03-22 1989-03-22
US326,948 1989-03-22

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JP (1) JP2887684B2 (ko)
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DE (1) DE69017477T2 (ko)
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Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05509123A (ja) * 1990-07-30 1993-12-16 デーエスエム ナムローゼ フェンノートシャップ 会合性の反応性ブレンドを含有する組成物
EP0506616B1 (de) * 1991-03-27 1998-01-21 Ciba SC Holding AG Photoempfindliches Gemisch auf Basis von Acrylaten
TW363999B (en) * 1991-06-04 1999-07-11 Vantico Ag Photosensitive compositions
EP0538866B1 (en) * 1991-10-24 1996-09-11 Tosoh Corporation Protective coating material
DE4138309C2 (de) * 1991-11-21 1995-02-09 Eos Electro Optical Syst Durch Einwirkung elektromagnetischer Strahlung vernetzbares Kunststoffmaterial
US5262232A (en) * 1992-01-22 1993-11-16 Minnesota Mining And Manufacturing Company Vibration damping constructions using acrylate-containing damping materials
TW311923B (ko) 1992-01-27 1997-08-01 Ciba Sc Holding Ag
JP2953598B2 (ja) * 1992-08-31 1999-09-27 ソニーケミカル株式会社 紫外線硬化型樹脂組成物及びこれを用いた光ディスク用保護膜
DE4243270A1 (de) * 1992-12-21 1994-06-23 Lohmann Gmbh & Co Kg Verfahren zur Vernetzung von Haftklebern durch Einsatz von Lasern
DE59407524D1 (de) * 1993-08-26 1999-02-04 Ciba Geigy Ag Flüssige strahlungshärtbare Zusammensetzung, insbesondere für die Stereolithographie
US5496682A (en) * 1993-10-15 1996-03-05 W. R. Grace & Co.-Conn. Three dimensional sintered inorganic structures using photopolymerization
US5418112A (en) * 1993-11-10 1995-05-23 W. R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
GB9504995D0 (en) * 1995-03-11 1995-04-26 Zeneca Ltd Compositions
FR2765584B1 (fr) * 1997-07-07 1999-10-22 Essilor Int Compositions de monomeres polymerisables, substrats polymeres transparents, et articles d'optique et ophtalmiques obtenus
JPH1143627A (ja) * 1997-07-30 1999-02-16 Jsr Corp 放射線硬化性樹脂組成物
CN103232567B (zh) * 2013-04-22 2015-10-28 南京工业大学 一种制备含氟丙烯酸酯或丙烯酸酯共聚物的方法
JP7104511B2 (ja) * 2017-11-30 2022-07-21 株式会社トクヤマ 光硬化型組成物
CN114641388A (zh) 2019-11-07 2022-06-17 巴斯夫欧洲公司 用于3d打印中的水洗性组合物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US4789620A (en) * 1986-03-03 1988-12-06 Mitsubishi Rayon Co. Ltd. Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates

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Publication number Publication date
CA2007295A1 (en) 1990-07-10
EP0378144A3 (en) 1991-02-27
HK1003574A1 (en) 1998-10-30
ES2068922T3 (es) 1995-05-01
JPH02228312A (ja) 1990-09-11
JP2887684B2 (ja) 1999-04-26
CA2007295C (en) 2001-02-20
EP0378144A2 (en) 1990-07-18
EP0378144B1 (en) 1995-03-08
KR0147812B1 (ko) 1998-08-17
DE69017477T2 (de) 1995-07-20
DE69017477D1 (de) 1995-04-13

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