KR910007967A - 방사선에 대한 광중합성 조성물의 감도를 조정하는 방법 - Google Patents
방사선에 대한 광중합성 조성물의 감도를 조정하는 방법 Download PDFInfo
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- KR910007967A KR910007967A KR1019900017200A KR900017200A KR910007967A KR 910007967 A KR910007967 A KR 910007967A KR 1019900017200 A KR1019900017200 A KR 1019900017200A KR 900017200 A KR900017200 A KR 900017200A KR 910007967 A KR910007967 A KR 910007967A
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- photopolymerizable composition
- photopolymerizable
- medium
- radiation
- general formula
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- 239000000203 mixture Substances 0.000 title claims 16
- 230000005855 radiation Effects 0.000 title claims 5
- 230000035945 sensitivity Effects 0.000 title claims 4
- 238000000034 method Methods 0.000 claims 8
- -1 acrylate ester Chemical class 0.000 claims 7
- 150000001875 compounds Chemical class 0.000 claims 7
- 229910052739 hydrogen Inorganic materials 0.000 claims 4
- 239000001257 hydrogen Substances 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 4
- 238000010521 absorption reaction Methods 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 3
- 239000000178 monomer Substances 0.000 claims 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 230000000379 polymerizing effect Effects 0.000 claims 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 claims 1
- 125000004135 2-norbornyl group Chemical group [H]C1([H])C([H])([H])C2([H])C([H])([H])C1([H])C([H])([H])C2([H])* 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 1
- 238000002835 absorbance Methods 0.000 claims 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 claims 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 1
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000002883 imidazolyl group Chemical group 0.000 claims 1
- 125000006203 morpholinoethyl group Chemical group [H]C([H])(*)C([H])([H])N1C([H])([H])C([H])([H])OC([H])([H])C1([H])[H] 0.000 claims 1
- UUEVFMOUBSLVJW-UHFFFAOYSA-N oxo-[[1-[2-[2-[2-[4-(oxoazaniumylmethylidene)pyridin-1-yl]ethoxy]ethoxy]ethyl]pyridin-4-ylidene]methyl]azanium;dibromide Chemical compound [Br-].[Br-].C1=CC(=C[NH+]=O)C=CN1CCOCCOCCN1C=CC(=C[NH+]=O)C=C1 UUEVFMOUBSLVJW-UHFFFAOYSA-N 0.000 claims 1
- 125000004076 pyridyl group Chemical group 0.000 claims 1
- 238000007711 solidification Methods 0.000 claims 1
- 230000008023 solidification Effects 0.000 claims 1
- 125000003944 tolyl group Chemical group 0.000 claims 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerization Catalysts (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (12)
- 광중합성 조성물이 광중합시키는 상이한 방출선의 방사선에 대해 동일한 흡광도를 가지도록 방사선에 대한 감도를 조정함으로써 개별적인 광개시제의 농도비를 선정하는 것을 포함하는, UV/VIS 레이저 광원으로부터의 상이한 파장의 방출선을 조사시킴으로써 광중합될 수 있고 광중합성 화합물과 2종 이상의 광개시제를 함유하는 광중합성 조성물의 제조방법.
- 제1항에 있어서, 광중합성 화합물이 자유라디칼에 의해 중합될 수 있는 화합물 또는 이들 화합물의 혼합물인 방법.
- 제2항에 있어서, 자유 라디칼에 의해 중합될 수 있는 화합물이 아크레이트 에스테르 및/또는 메타아크릴레이트 에스테르기를 2내지 5개 함유하는 방법.
- 제1항에 있어서, 광개시제 하나에 있어서 흡수도가 최대인 최장파장이 350 내지 400nm이고 제2광개시제에 있어서 흡수도가 최대인 최장판장이 제1광개시제의 상기 최대흡수도 파장보다 짧은, 2종의 광개시제의 혼합물을 사용하는 방법.
- i) 제1항에 따른 광중합성 조성물을 용기 내에서 매질로서 사용하고, ii) 상기 매질의 예정된 용적 분율을 UV/VIS 광원으로부터의 상이한 방출선으로 동시에 조사하여 조사된 부위에서 매질의 예정된 부분이 응고되도록 하는 것을 포함하는, 강도 특성이 3차원 물체의 제조에 충분치 못하고 조사됨으로써 3차원 물체의 제조에 적절한 강도를 갖게 되는 제1항에 따른 광중합성 조성물로부터 출발하여 3차원 물체를 제조하는 방법.
- 제5항에 있어서, i) 먼저, 상기 광중합성 조성물을 용기중에서 매질로서 사용하고, ii) 상기 매질의 선정된 표면을 그 총면적에 걸쳐 또는 예정된 패턴대로 UV/VIS 레이저 광원으로부터의 상이한 방출선으로 동시에 조사하여 조사된 부위에서 층이 목적하는 두께까지 응고되도록 하며, iii) 응고된 층 위에 광중합성 매질의 새로운 층을 만들고, iv) 서로 접착되어 함께 3차원 물체를 형성하는 연속 응고층을 만들기 위하여 단계 ii)에 따라 표면을 반복적으로 조사하는 단계를 포함하는, 3차원 물체의 제조방법.
- 제1항에 있어서, 광중합성 조성물의 점도가 500내지 800mPas(25℃에서)이고, 액체상태에서 완전히 중합된 상태로 될 때의 용적 수축이 액체 조성물에 대해 8용적% 미만인 방법.
- 제1항에 있어서, 광중합성 조성물이 2-, 3-, 4- 또는 5관능가의 단량체 또는 소중합체 아크릴레이트 또는 메타아크릴레이트 에스테르를 함유하며 점도가 500 내지 8000mPas(25℃에서)인 방법.
- 제1항에 있어서, 250 내지 450nm 내에서 광중합성 조성물을 중합시킬 수 있고 방사선에 대한 감도가 250mJ/㎠미만이거나, 또는 450 내지 800nm 내에서 광중합성 조성물을 중합시킬 수 있고 방사선에 대한 감도가 2J/㎠미만인 방법.
- 제1항에 있어서, 광중합성 조성물이 광중합성 단량체로서 하기와 같은 것을 함유하는 방법. a) 점도가 500mPas(25℃에서) 이상인, 2관가능가의 단량체 또는 소중합체 아크릴레이트 또는 메타아크릴레이트 1이상; (b) 하기 일반식 (I), (II) 또는 (III)의 화합물 1이상:상기 식에서 R1은 수소, 메틸, 히드록실 또는 일반식의 라디칼이고, R2는 일반식(V)의 기이며, n은 0내지 3이고, R3및 R4는 서로 독립적으로 수소 또는 메틸이다. c) 하기 일반식(VI)의 화합물 1이상 :상기 식에서, R5는 수소 또는 메틸이고, R6는 일반식(VII)의 기이고, R7은 테트라히드로푸르푸릴, 시클로헥실, 2-페놀시에틸, 벤질, 이소보르닐, 글리시딜, 디시클로펜텐일, 모르폴리노에틸, 디멜틸아미노에틸, 디에틸아미노에틸 또는 직쇄 또는 측쇄일 수 있는 C1-C20알킬 라디칼로부터 선정되며, 또는 R5가 수소인 경우 R6은 피롤리딘온-2-일, 이미다졸릴, 카르바졸릴, 안트라센일, 페닐 C5-C8시클로알킬, 나프텐일, 2-노르보르닐, 피디딜, N-카프로락탐일 또는 톨릴일 수 있다.
- 제1항에 있어서, UV 범위 및/또는 가시광 범위에서 다중선 방식으로 작동되는 Ar-이온 레이저 및 구리 증기 레이저로부터 광원을 선정하는 방법.
- 특히 서로 접착되어 있는 연속 응고층으로 만들어진 3차원 물체 형태로 광중합된 층을 제조하는데 사용하는 제1항에 따른 조성물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH3901/89-0 | 1989-10-27 | ||
| CH390189 | 1989-10-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR910007967A true KR910007967A (ko) | 1991-05-30 |
| KR0155169B1 KR0155169B1 (ko) | 1998-12-01 |
Family
ID=4265938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019900017200A KR0155169B1 (ko) | 1989-10-27 | 1990-10-26 | 방사선에 대한 광중합성 조성물의 감도를 조정하는 방법 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US5573889A (ko) |
| EP (1) | EP0425440B1 (ko) |
| JP (1) | JP3099126B2 (ko) |
| KR (1) | KR0155169B1 (ko) |
| CA (1) | CA2028537C (ko) |
| DE (1) | DE59007720D1 (ko) |
| HK (1) | HK1004762A1 (ko) |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0487086B2 (en) * | 1990-11-22 | 2008-08-13 | Canon Kabushiki Kaisha | Method of preparing volume type phase hologram member using a photosensitive recording medium |
| JP2873126B2 (ja) * | 1991-04-17 | 1999-03-24 | 日本ペイント株式会社 | 体積ホログラム記録用感光性組成物 |
| JPH0586149A (ja) * | 1991-09-30 | 1993-04-06 | I C I Japan Kk | 光立体成形用樹脂組成物並びに立体成形体の形成方法 |
| TW311923B (ko) * | 1992-01-27 | 1997-08-01 | Ciba Sc Holding Ag | |
| JPH05287008A (ja) * | 1992-04-08 | 1993-11-02 | Tokuyama Soda Co Ltd | 光重合性組成物及びその重合方法 |
| US5418112A (en) * | 1993-11-10 | 1995-05-23 | W. R. Grace & Co.-Conn. | Photosensitive compositions useful in three-dimensional part-building and having improved photospeed |
| DE4424101A1 (de) * | 1994-07-08 | 1996-01-11 | Basf Lacke & Farben | Strahlenhärtbare Lacke und deren Verwendung zur Herstellung matter Lackfilme |
| JP3478630B2 (ja) * | 1995-02-09 | 2003-12-15 | 富士写真フイルム株式会社 | 光重合性組成物 |
| USRE37962E1 (en) * | 1995-02-28 | 2003-01-07 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition containing a sensitizing dye and a titanocene compound |
| US5700849A (en) * | 1996-02-23 | 1997-12-23 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition containing a sensitizing dye and a titanocene compound |
| GB9504995D0 (en) * | 1995-03-11 | 1995-04-26 | Zeneca Ltd | Compositions |
| US5731363A (en) * | 1995-03-20 | 1998-03-24 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition containing sensitizing dye and titanocene compound |
| US5707780A (en) * | 1995-06-07 | 1998-01-13 | E. I. Du Pont De Nemours And Company | Photohardenable epoxy composition |
| JP3651713B2 (ja) * | 1996-02-29 | 2005-05-25 | 富士写真フイルム株式会社 | 光重合性組成物 |
| EP0897558B1 (en) | 1996-05-09 | 2000-09-27 | Dsm N.V. | Photosensitive resin composition for rapid prototyping and a process for the manufacture of 3-dimensional objects |
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-
1990
- 1990-10-19 EP EP90810802A patent/EP0425440B1/de not_active Expired - Lifetime
- 1990-10-19 DE DE59007720T patent/DE59007720D1/de not_active Expired - Fee Related
- 1990-10-25 CA CA002028537A patent/CA2028537C/en not_active Expired - Fee Related
- 1990-10-26 JP JP02290579A patent/JP3099126B2/ja not_active Expired - Fee Related
- 1990-10-26 KR KR1019900017200A patent/KR0155169B1/ko not_active IP Right Cessation
-
1995
- 1995-05-09 US US08/437,737 patent/US5573889A/en not_active Expired - Lifetime
-
1996
- 1996-01-29 US US08/592,899 patent/US5645973A/en not_active Expired - Fee Related
-
1998
- 1998-05-07 HK HK98103939A patent/HK1004762A1/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CA2028537A1 (en) | 1991-04-28 |
| EP0425440B1 (de) | 1994-11-17 |
| KR0155169B1 (ko) | 1998-12-01 |
| DE59007720D1 (de) | 1994-12-22 |
| JPH03160001A (ja) | 1991-07-10 |
| US5573889A (en) | 1996-11-12 |
| US5645973A (en) | 1997-07-08 |
| EP0425440A1 (de) | 1991-05-02 |
| JP3099126B2 (ja) | 2000-10-16 |
| CA2028537C (en) | 2000-01-25 |
| HK1004762A1 (en) | 1998-12-04 |
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