DE69716260D1 - Photoaktive verbindungen verwendbar mit enger wellenlänge band ultraviolet (uv) härtende systeme - Google Patents

Photoaktive verbindungen verwendbar mit enger wellenlänge band ultraviolet (uv) härtende systeme

Info

Publication number
DE69716260D1
DE69716260D1 DE69716260T DE69716260T DE69716260D1 DE 69716260 D1 DE69716260 D1 DE 69716260D1 DE 69716260 T DE69716260 T DE 69716260T DE 69716260 T DE69716260 T DE 69716260T DE 69716260 D1 DE69716260 D1 DE 69716260D1
Authority
DE
Germany
Prior art keywords
wavelength band
narrow wavelength
compounds
photoactive
curing systems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69716260T
Other languages
English (en)
Inventor
Bowers, Jr
Rajamani Nagarajan
Pittman, Jr
E Sony Joensson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Albemarle Corp
Original Assignee
Albemarle Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Albemarle Corp filed Critical Albemarle Corp
Application granted granted Critical
Publication of DE69716260D1 publication Critical patent/DE69716260D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/46Friedel-Crafts reactions
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/47Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation using phosgene
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/67Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
    • C07C45/68Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
    • C07C45/70Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction with functional groups containing oxygen only in singly bound form
    • C07C45/71Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction with functional groups containing oxygen only in singly bound form being hydroxy groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/587Unsaturated compounds containing a keto groups being part of a ring
    • C07C49/687Unsaturated compounds containing a keto groups being part of a ring containing halogen
    • C07C49/697Unsaturated compounds containing a keto groups being part of a ring containing halogen containing six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/587Unsaturated compounds containing a keto groups being part of a ring
    • C07C49/753Unsaturated compounds containing a keto groups being part of a ring containing ether groups, groups, groups, or groups
    • C07C49/755Unsaturated compounds containing a keto groups being part of a ring containing ether groups, groups, groups, or groups a keto group being part of a condensed ring system with two or three rings, at least one ring being a six-membered aromatic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D311/00Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/78Ring systems having three or more relevant rings
    • C07D311/80Dibenzopyrans; Hydrogenated dibenzopyrans
    • C07D311/82Xanthenes
    • C07D311/84Xanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
    • C07D311/86Oxygen atoms, e.g. xanthones
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D335/00Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12Thioxanthenes
    • C07D335/14Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
    • C07D335/16Oxygen atoms, e.g. thioxanthones
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Adhesives Or Adhesive Processes (AREA)
DE69716260T 1996-05-20 1997-05-19 Photoaktive verbindungen verwendbar mit enger wellenlänge band ultraviolet (uv) härtende systeme Expired - Lifetime DE69716260D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US1712796P 1996-05-20 1996-05-20
PCT/US1997/008512 WO1997044364A1 (en) 1996-05-20 1997-05-19 Photoactive compounds for use with narrow wavelength band ultraviolet (uv) curing systems

Publications (1)

Publication Number Publication Date
DE69716260D1 true DE69716260D1 (de) 2002-11-14

Family

ID=21780874

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69716260T Expired - Lifetime DE69716260D1 (de) 1996-05-20 1997-05-19 Photoaktive verbindungen verwendbar mit enger wellenlänge band ultraviolet (uv) härtende systeme

Country Status (10)

Country Link
US (1) US6140385A (de)
EP (1) EP0900237B1 (de)
JP (1) JP2000510868A (de)
KR (1) KR20000015839A (de)
AT (1) ATE225813T1 (de)
AU (1) AU3208097A (de)
BR (1) BR9709761A (de)
CA (1) CA2255629A1 (de)
DE (1) DE69716260D1 (de)
WO (1) WO1997044364A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6254803B1 (en) 1998-03-25 2001-07-03 Cryovac, Inc. Oxygen scavengers with reduced oxidation products for use in plastic films
US6255248B1 (en) 1999-07-09 2001-07-03 Cryovac, Inc. Oxygen scavenging composition with improved properties and method of using same
US6875400B2 (en) 2000-12-22 2005-04-05 Cryovac, Inc. Method of sterilizing and initiating a scavenging reaction in an article
US6486230B1 (en) 2001-04-05 2002-11-26 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Polyesters by photochemical cyclopolymerization
US6593389B1 (en) 2001-04-05 2003-07-15 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Polyimides by photochemical cyclopolymerization
MXPA05007662A (es) 2003-01-16 2006-03-10 Ian Orde Michael Jacobs Metodos, composiciones y mezclas para formar articulos que tienen resistencia a fisura de tension ambiental mejorada.
US7262229B2 (en) * 2004-05-03 2007-08-28 Flint Group Ink for excimer curing
US8262952B2 (en) 2007-10-31 2012-09-11 Bausch & Lomb Incorporated Molds for production of ophthalmic devices
WO2010117371A1 (en) * 2009-04-10 2010-10-14 Hewlett-Packard Development Company, L.P. Energy activated film and method of making the same
US11225061B2 (en) 2015-05-29 2022-01-18 Cryovac, Llc Oxygen scavenging films

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3366691A (en) * 1966-01-28 1968-01-30 Dow Chemical Co Preparation of dihydroxybenzophenones
US3595900A (en) * 1968-07-01 1971-07-27 Minnesota Mining & Mfg Cyanatophenyl-terminated polyarylene ethers
CH535195A (de) * 1970-08-28 1973-03-31 Sandoz Ag Verfahren zur Herstellung von neuen 2-Hydroxy-4'-phenoxybenzophenonverbindungen
FR2138875A1 (en) * 1971-05-24 1973-01-05 Thiemann Chem Pharm Fab Substd aminoalkanoylamino (thi)xanthones and acridones - - with psychotherapeutic and/or sedative activity
US4007209A (en) * 1972-07-01 1977-02-08 Badische Anilin- & Soda-Fabrik Aktiengesellschaft Acetals which act as photoinitiators
US4043887A (en) * 1977-01-17 1977-08-23 Eastman Kodak Company Benzophenone initiators for the photopolymerization of unsaturated compounds
US4199420A (en) * 1978-04-06 1980-04-22 Stauffer Chemical Company Alkoxymethylbenzophenones as photoinitiators for photopolymerizable compositions and process based thereon
DE3008411A1 (de) * 1980-03-05 1981-09-10 Merck Patent Gmbh, 6100 Darmstadt Neue aromatisch-aliphatische ketone, ihre verwendung als photoinitiatoren sowie photopolymerisierbare systeme enthaltend solche ketone
CH643552A5 (de) * 1980-05-06 1984-06-15 Ciba Geigy Ag Thioxanthoncarbonsaeuren und thioxanthoncarbonsaeurederivate.
US4518788A (en) * 1981-03-13 1985-05-21 General Electric Company Aromatic polyvinyl ethers and heat curable molding compositions obtained therefrom
JPS5978339A (ja) * 1982-10-28 1984-05-07 Fuji Photo Film Co Ltd 光重合性組成物
JPS59172518A (ja) * 1983-03-23 1984-09-29 Toshiba Corp 光硬化性エポキシ樹脂系組成物
US4529490A (en) * 1983-05-23 1985-07-16 General Electric Company Photopolymerizable organic compositions and diaryliodonium ketone salts used therein
US4767797A (en) * 1983-06-20 1988-08-30 Asahi Kasei Kogyo Kabushiki Kaisha Photocurable compositions of poly(ethynylphenyl)acetylene, its copolymer and composition thereof
JPS6063532A (ja) * 1983-08-16 1985-04-11 Fuji Photo Film Co Ltd 光重合性組成物
EP0150891A1 (de) * 1984-01-05 1985-08-07 The Wellcome Foundation Limited Tricyclische Verbindungen, Verfahren zu deren Herstellung, Präparate, welche solche Verbindungen enthalten und deren Verwendung in der Medizin
US4602097A (en) * 1984-06-11 1986-07-22 Ulano Corporation Water soluble photoinitiator benzophenone and thioxanthenone ethoxy-ether derivatives
US4577034A (en) * 1985-02-14 1986-03-18 The Dow Chemical Company Autoxidation of bis(ortho dialkyl-phenoxy)benzophenones
JPS61223020A (ja) * 1985-03-29 1986-10-03 Toshiba Corp 光硬化性エポキシ樹脂系組成物
US4691059A (en) * 1985-08-30 1987-09-01 Minnesota Mining And Manufacturing Company Copolymerizable UV stabilizers
US4714726A (en) * 1986-06-04 1987-12-22 W. R. Grace & Co. Low temperature single step curing polyimide adhesive
FR2617160B1 (fr) * 1987-06-23 1989-12-01 Rhone Poulenc Chimie Procede de preparation de diphenoxy 4,4' benzophenone
US4843179A (en) * 1988-01-05 1989-06-27 Raychem Corporation Preparation of 4,4'-diphenoxybenzophenone
DE59007720D1 (de) * 1989-10-27 1994-12-22 Ciba Geigy Ag Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen.
US5310862A (en) * 1991-08-20 1994-05-10 Toray Industries, Inc. Photosensitive polyimide precursor compositions and process for preparing same
US5504391A (en) * 1992-01-29 1996-04-02 Fusion Systems Corporation Excimer lamp with high pressure fill
JPH0789895A (ja) * 1993-02-09 1995-04-04 Asahi Glass Co Ltd 含フッ素ベンゾフェノン誘導体およびその用途
US5685754A (en) * 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor

Also Published As

Publication number Publication date
JP2000510868A (ja) 2000-08-22
ATE225813T1 (de) 2002-10-15
EP0900237A1 (de) 1999-03-10
CA2255629A1 (en) 1997-11-27
EP0900237B1 (de) 2002-10-09
AU3208097A (en) 1997-12-09
KR20000015839A (ko) 2000-03-15
WO1997044364A1 (en) 1997-11-27
US6140385A (en) 2000-10-31
BR9709761A (pt) 2000-01-11

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8332 No legal effect for de