KR940011107U - 노광 장치의 칩 확대율 보정 패턴 - Google Patents
노광 장치의 칩 확대율 보정 패턴Info
- Publication number
- KR940011107U KR940011107U KR2019920019967U KR920019967U KR940011107U KR 940011107 U KR940011107 U KR 940011107U KR 2019920019967 U KR2019920019967 U KR 2019920019967U KR 920019967 U KR920019967 U KR 920019967U KR 940011107 U KR940011107 U KR 940011107U
- Authority
- KR
- South Korea
- Prior art keywords
- exposure apparatus
- correction pattern
- magnification correction
- chip magnification
- chip
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR92019967U KR960001466Y1 (ko) | 1992-10-16 | 1992-10-16 | 노광 장치의 칩 확대율 보정 패턴 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR92019967U KR960001466Y1 (ko) | 1992-10-16 | 1992-10-16 | 노광 장치의 칩 확대율 보정 패턴 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR940011107U true KR940011107U (ko) | 1994-05-27 |
KR960001466Y1 KR960001466Y1 (ko) | 1996-02-17 |
Family
ID=19341951
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR92019967U KR960001466Y1 (ko) | 1992-10-16 | 1992-10-16 | 노광 장치의 칩 확대율 보정 패턴 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR960001466Y1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100298193B1 (ko) * | 1998-06-16 | 2001-11-15 | 박종섭 | 웨이퍼의수평정렬을위한레티클 |
-
1992
- 1992-10-16 KR KR92019967U patent/KR960001466Y1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100298193B1 (ko) * | 1998-06-16 | 2001-11-15 | 박종섭 | 웨이퍼의수평정렬을위한레티클 |
Also Published As
Publication number | Publication date |
---|---|
KR960001466Y1 (ko) | 1996-02-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20030120 Year of fee payment: 8 |
|
LAPS | Lapse due to unpaid annual fee |