KR970002480A - 투영 노광 장치 및 회로 기판의 노광 방법 - Google Patents

투영 노광 장치 및 회로 기판의 노광 방법 Download PDF

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Publication number
KR970002480A
KR970002480A KR1019960011833A KR19960011833A KR970002480A KR 970002480 A KR970002480 A KR 970002480A KR 1019960011833 A KR1019960011833 A KR 1019960011833A KR 19960011833 A KR19960011833 A KR 19960011833A KR 970002480 A KR970002480 A KR 970002480A
Authority
KR
South Korea
Prior art keywords
circuit board
exposure apparatus
projection
exposure
exposure method
Prior art date
Application number
KR1019960011833A
Other languages
English (en)
Other versions
KR100206631B1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP16333595A external-priority patent/JP3460131B2/ja
Priority claimed from JP16672895A external-priority patent/JP3520881B2/ja
Application filed filed Critical
Publication of KR970002480A publication Critical patent/KR970002480A/ko
Application granted granted Critical
Publication of KR100206631B1 publication Critical patent/KR100206631B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019960011833A 1995-06-29 1996-04-19 투영 노광 장치 및 회로 기판의 노광 방법 KR100206631B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP16333595A JP3460131B2 (ja) 1995-06-29 1995-06-29 投影露光装置
JP95-163335 1995-06-29
JP16672895A JP3520881B2 (ja) 1995-07-03 1995-07-03 露光装置
JP95-166728 1995-07-03

Publications (2)

Publication Number Publication Date
KR970002480A true KR970002480A (ko) 1997-01-24
KR100206631B1 KR100206631B1 (ko) 1999-07-01

Family

ID=26488799

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960011833A KR100206631B1 (ko) 1995-06-29 1996-04-19 투영 노광 장치 및 회로 기판의 노광 방법

Country Status (2)

Country Link
US (1) USH1774H (ko)
KR (1) KR100206631B1 (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6455214B1 (en) 1997-03-24 2002-09-24 Nikon Corporation Scanning exposure method detecting focus during relative movement between energy beam and substrate
WO1999039374A1 (fr) 1998-01-29 1999-08-05 Nikon Corporation Procede d'exposition et dispositif associe
WO2000001001A1 (fr) 1998-06-29 2000-01-06 Nikon Corporation Procede d'exposition a un balayage, appareil d'exposition a un balayage et procede de production de ce dernier, et dispositif et procede de fabrication de ce dernier
JP2000082651A (ja) * 1998-09-04 2000-03-21 Nec Corp 走査露光装置及び走査露光方法
US7023521B2 (en) * 1999-04-13 2006-04-04 Nikon Corporation Exposure apparatus, exposure method and process for producing device
JP2001015420A (ja) * 1999-06-30 2001-01-19 Toshiba Corp 半導体ウエハのパターン露光方法およびパターン露光装置
US7561270B2 (en) 2000-08-24 2009-07-14 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
TW527526B (en) * 2000-08-24 2003-04-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6278515B1 (en) 2000-08-29 2001-08-21 International Business Machines Corporation Method and apparatus for adjusting a tilt of a lithography tool
JP3652329B2 (ja) * 2002-06-28 2005-05-25 キヤノン株式会社 走査露光装置、走査露光方法、デバイス製造方法およびデバイス
JP4474108B2 (ja) * 2002-09-02 2010-06-02 株式会社 日立ディスプレイズ 表示装置とその製造方法および製造装置
JP5197198B2 (ja) 2008-07-04 2013-05-15 キヤノン株式会社 結像光学系、露光装置、及びデバイス製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0727857B2 (ja) * 1985-09-09 1995-03-29 株式会社ニコン 投影光学装置
US4999699A (en) * 1990-03-14 1991-03-12 International Business Machines Corporation Solder interconnection structure and process for making
JP3271348B2 (ja) * 1993-01-14 2002-04-02 株式会社ニコン レベリング合わせ面計測方法及び露光装置
US5461237A (en) * 1993-03-26 1995-10-24 Nikon Corporation Surface-position setting apparatus

Also Published As

Publication number Publication date
USH1774H (en) 1999-01-05
KR100206631B1 (ko) 1999-07-01

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