KR930014891A - How to arrange indirect layers - Google Patents
How to arrange indirect layers Download PDFInfo
- Publication number
- KR930014891A KR930014891A KR1019910023299A KR910023299A KR930014891A KR 930014891 A KR930014891 A KR 930014891A KR 1019910023299 A KR1019910023299 A KR 1019910023299A KR 910023299 A KR910023299 A KR 910023299A KR 930014891 A KR930014891 A KR 930014891A
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- alignment pattern
- alignment
- layers
- aligned
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
본 발명은 반도체기판의 기본층위에 여러층을 간접적으로 정렬할 때 정렬정도를 향상시키는 방법에 관한 것으로, 제1층 위에 제2층을 정렬할 때, 제2층의 제2정렬용 패턴(5)을 제1층의 제1정렬용 패턴(4) 위에 형성시키고, 제1정렬용 패턴(4)과 제2정렬용 패턴(5)으로부터 정렬용 신호 S를 얻어서 S의 처음 피크 P3와 최종피크 P6를 기준으로 하여 P3와 P6의 중앙에 제3층을 정렬시키는 방법이다.The present invention relates to a method for improving the degree of alignment when indirectly aligning a plurality of layers on the base layer of the semiconductor substrate, when the second layer is aligned on the first layer, the second alignment pattern (5) ) Is formed on the first alignment pattern 4 of the first layer, and an alignment signal S is obtained from the first alignment pattern 4 and the second alignment pattern 5 to obtain the first peak P3 and the final peak of S. The third layer is aligned with the center of P3 and P6 based on P6.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 본 발명의 간접층 정렬방법을 성명하기 위한 도면2 is a diagram for clarifying the indirect layer alignment method of the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019910023299A KR950000107B1 (en) | 1991-12-18 | 1991-12-18 | Method of indirect layer alignment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019910023299A KR950000107B1 (en) | 1991-12-18 | 1991-12-18 | Method of indirect layer alignment |
Publications (2)
Publication Number | Publication Date |
---|---|
KR930014891A true KR930014891A (en) | 1993-07-23 |
KR950000107B1 KR950000107B1 (en) | 1995-01-09 |
Family
ID=19325071
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910023299A KR950000107B1 (en) | 1991-12-18 | 1991-12-18 | Method of indirect layer alignment |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR950000107B1 (en) |
-
1991
- 1991-12-18 KR KR1019910023299A patent/KR950000107B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR950000107B1 (en) | 1995-01-09 |
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