KR930014864A - Radial Matching Pattern - Google Patents

Radial Matching Pattern Download PDF

Info

Publication number
KR930014864A
KR930014864A KR1019910023447A KR910023447A KR930014864A KR 930014864 A KR930014864 A KR 930014864A KR 1019910023447 A KR1019910023447 A KR 1019910023447A KR 910023447 A KR910023447 A KR 910023447A KR 930014864 A KR930014864 A KR 930014864A
Authority
KR
South Korea
Prior art keywords
pattern
radial
radial pattern
matching pattern
misalignment
Prior art date
Application number
KR1019910023447A
Other languages
Korean (ko)
Other versions
KR940010645B1 (en
Inventor
신의용
Original Assignee
문정환
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 문정환, 금성일렉트론 주식회사 filed Critical 문정환
Priority to KR1019910023447A priority Critical patent/KR940010645B1/en
Publication of KR930014864A publication Critical patent/KR930014864A/en
Application granted granted Critical
Publication of KR940010645B1 publication Critical patent/KR940010645B1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

본 발명은 반도체 포토공정시 미스얼라인먼트 점검에 관한 것으로서 긴직사각형 모양이 중심점에서 등각 배열된 제1방사형 패턴을 특정 스텝에서 일체로 형성하고 그 다음 스텝에서 상기 제1방사형 패텬과 닮은 꼴이고 상기 제1방사형 패턴내에 들어갈 수 있는 면적을 가진 제2방사형패턴을 형성하여 상기 제1및 제2방사형 패턴이 합쳐진 것을 미스얼라인먼트 점검용 정합패턴으로 하는 것이 특징인 방사형 정합패턴.The present invention relates to a misalignment check during a semiconductor photo process, in which a first radial pattern in which a long rectangular shape is conformally arranged at a center point is integrally formed in a specific step, and in the next step, the first radial pattern is similar to the first radial pattern. And a second radial pattern having an area that can fit within the radial pattern, wherein the first and second radial patterns are combined to form a misalignment check matching pattern.

Description

방사형 정합패턴.Radial Matching Pattern.

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제4도는 본 발명의 방사형 정합패턴 형성도.4 is a radial matching pattern forming diagram of the present invention.

제5도는 사용 비교도.5 is a comparison of use.

Claims (2)

반도체 제조공정에서 포토공정의 미스얼라인먼트 점검용 검사패턴에 있어서 긴 직사각형 모양이 중심점에서 등각 배열된 제1방사형 패턴을 특정 스텝에서 일차로 형성하고 그 다음 스텝에서 상기 제1방사형 패턴과 닮은 꼴이고 상기 제1방사형 패턴내에 들어갈 수 있는 면적을 가진 제2방사형 패턴을 형성하여, 상기 제1및 제2방사형 패턴이 합쳐진 것을 미스얼라인먼트 점검용 정합패턴으로 하는 것이 특징인 방사형 정합패턴.In the semiconductor manufacturing process, in the inspection pattern for misalignment inspection of the photo process, a first rectangular pattern in which a long rectangular shape is conformally arranged at a center point is formed first at a specific step, and in the next step, the first radial pattern is similar to the first radial pattern. And a second radial pattern having an area that can fit within the first radial pattern, wherein the first and second radial patterns are combined to form a misalignment check matching pattern. 제1항에 있어서 상기 제1 및 제2방사형 패턴은 8방형 방사형 패턴인 것이 특징인 방사형 정합패턴.The radial matching pattern of claim 1, wherein the first and second radiation patterns are an eight-ray radial pattern. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019910023447A 1991-12-19 1991-12-19 Radial typed junction pattern KR940010645B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019910023447A KR940010645B1 (en) 1991-12-19 1991-12-19 Radial typed junction pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019910023447A KR940010645B1 (en) 1991-12-19 1991-12-19 Radial typed junction pattern

Publications (2)

Publication Number Publication Date
KR930014864A true KR930014864A (en) 1993-07-23
KR940010645B1 KR940010645B1 (en) 1994-10-24

Family

ID=19325196

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910023447A KR940010645B1 (en) 1991-12-19 1991-12-19 Radial typed junction pattern

Country Status (1)

Country Link
KR (1) KR940010645B1 (en)

Also Published As

Publication number Publication date
KR940010645B1 (en) 1994-10-24

Similar Documents

Publication Publication Date Title
DE3577912D1 (en) INTERFEROMETRIC METHODS FOR THE FABRICATION OF SEMICONDUCTOR DEVICES.
KR850000787A (en) Inspection method of photomask reticle for manufacturing semiconductor device
KR960002503A (en) Phase reversal mask manufacturing method
KR930014864A (en) Radial Matching Pattern
KR920005456A (en) Broadband amplification circuit
KR920008197A (en) High temperature heat treatment jig
KR920003532A (en) Manufacturing Method of Semiconductor Integrated Circuit in Master Slice Method
KR880010503A (en) Semiconductor devices
JPS5314579A (en) Semiconductor integrated circuit and its production
KR960019634A (en) Overlay Measurement Photomask
KR960002508A (en) Master semiconductor manufacturing method
KR920007509A (en) Thin memory module
KR960018755A (en) How to make a photo mask
KR920003407A (en) Reticle with Scum Prevention Line
KR920007222A (en) P-N junction manufacturing method using LPCVD nitride film manufacturing process
KR970022509A (en) Mask manufacturing method
KR970048925A (en) Masks used in the manufacture of semiconductor devices
KR930014891A (en) How to arrange indirect layers
KR950021050A (en) Wafer step relaxation method
KR970051891A (en) Pattern formation method using PSM (phase shift mask)
KR970022518A (en) Photo mask of exposure equipment
KR970022526A (en) Method of forming semiconductor pattern and photomask used therein
KR970028813A (en) Reticle for Semiconductor Device Manufacturing
KR960026085A (en) Reticle manufacturing method
KR920001678A (en) Manufacturing method of aluminum oxide film formation of metal wiring

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20040920

Year of fee payment: 11

LAPS Lapse due to unpaid annual fee