KR930014864A - Radial Matching Pattern - Google Patents
Radial Matching Pattern Download PDFInfo
- Publication number
- KR930014864A KR930014864A KR1019910023447A KR910023447A KR930014864A KR 930014864 A KR930014864 A KR 930014864A KR 1019910023447 A KR1019910023447 A KR 1019910023447A KR 910023447 A KR910023447 A KR 910023447A KR 930014864 A KR930014864 A KR 930014864A
- Authority
- KR
- South Korea
- Prior art keywords
- pattern
- radial
- radial pattern
- matching pattern
- misalignment
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
본 발명은 반도체 포토공정시 미스얼라인먼트 점검에 관한 것으로서 긴직사각형 모양이 중심점에서 등각 배열된 제1방사형 패턴을 특정 스텝에서 일체로 형성하고 그 다음 스텝에서 상기 제1방사형 패텬과 닮은 꼴이고 상기 제1방사형 패턴내에 들어갈 수 있는 면적을 가진 제2방사형패턴을 형성하여 상기 제1및 제2방사형 패턴이 합쳐진 것을 미스얼라인먼트 점검용 정합패턴으로 하는 것이 특징인 방사형 정합패턴.The present invention relates to a misalignment check during a semiconductor photo process, in which a first radial pattern in which a long rectangular shape is conformally arranged at a center point is integrally formed in a specific step, and in the next step, the first radial pattern is similar to the first radial pattern. And a second radial pattern having an area that can fit within the radial pattern, wherein the first and second radial patterns are combined to form a misalignment check matching pattern.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제4도는 본 발명의 방사형 정합패턴 형성도.4 is a radial matching pattern forming diagram of the present invention.
제5도는 사용 비교도.5 is a comparison of use.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019910023447A KR940010645B1 (en) | 1991-12-19 | 1991-12-19 | Radial typed junction pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019910023447A KR940010645B1 (en) | 1991-12-19 | 1991-12-19 | Radial typed junction pattern |
Publications (2)
Publication Number | Publication Date |
---|---|
KR930014864A true KR930014864A (en) | 1993-07-23 |
KR940010645B1 KR940010645B1 (en) | 1994-10-24 |
Family
ID=19325196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910023447A KR940010645B1 (en) | 1991-12-19 | 1991-12-19 | Radial typed junction pattern |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR940010645B1 (en) |
-
1991
- 1991-12-19 KR KR1019910023447A patent/KR940010645B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR940010645B1 (en) | 1994-10-24 |
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Legal Events
Date | Code | Title | Description |
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20040920 Year of fee payment: 11 |
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LAPS | Lapse due to unpaid annual fee |