KR910013473A - Method of forming a transparent conductive film pattern using the lift-off method - Google Patents
Method of forming a transparent conductive film pattern using the lift-off method Download PDFInfo
- Publication number
- KR910013473A KR910013473A KR1019890018413A KR890018413A KR910013473A KR 910013473 A KR910013473 A KR 910013473A KR 1019890018413 A KR1019890018413 A KR 1019890018413A KR 890018413 A KR890018413 A KR 890018413A KR 910013473 A KR910013473 A KR 910013473A
- Authority
- KR
- South Korea
- Prior art keywords
- forming
- conductive film
- transparent conductive
- film pattern
- lift
- Prior art date
Links
Landscapes
- Manufacturing Of Electric Cables (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
내용 없음.No content.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2a도 내지 제2d도는 본 발명에 따른 리프트-오프면을 이용한 투명도전막 패턴의 형성방법을 설명하기 위한 도면.2A to 2D are views for explaining a method of forming a transparent conductive film pattern using a lift-off surface according to the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019890018413A KR910013473A (en) | 1989-12-12 | 1989-12-12 | Method of forming a transparent conductive film pattern using the lift-off method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019890018413A KR910013473A (en) | 1989-12-12 | 1989-12-12 | Method of forming a transparent conductive film pattern using the lift-off method |
Publications (1)
Publication Number | Publication Date |
---|---|
KR910013473A true KR910013473A (en) | 1991-08-08 |
Family
ID=67662457
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890018413A KR910013473A (en) | 1989-12-12 | 1989-12-12 | Method of forming a transparent conductive film pattern using the lift-off method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR910013473A (en) |
-
1989
- 1989-12-12 KR KR1019890018413A patent/KR910013473A/en not_active IP Right Cessation
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR920007105A (en) | Etching Method of Al-based Material Film | |
KR840000387A (en) | Method of manufacturing transfer paper and cosmetic material using the same | |
KR910013473A (en) | Method of forming a transparent conductive film pattern using the lift-off method | |
KR937000886A (en) | Formation method of fine resist pattern | |
KR910020802A (en) | How to make a mask | |
KR910013463A (en) | Opening Method of Semiconductor Device | |
KR910008792A (en) | Manufacturing method of double sided semiconductor device | |
KR910013481A (en) | Electric conductive film forming method | |
KR920022422A (en) | Pattern Formation Method | |
KR920003448A (en) | Method of forming a buried layer of a bipolar device | |
KR920001649A (en) | How to remove polyetch surplus | |
KR920003433A (en) | Etching method using RIE method | |
KR910020833A (en) | Dry etching method by oxide mask | |
KR920001678A (en) | Manufacturing method of aluminum oxide film formation of metal wiring | |
KR960002479A (en) | Method of forming photosensitive pattern of semiconductor device | |
KR910013526A (en) | How to Form Contact Holes for Wiring | |
KR890007605A (en) | Manufacturing method of speaker grid | |
KR970022514A (en) | Structure of PSM | |
KR920003407A (en) | Reticle with Scum Prevention Line | |
KR910020493A (en) | Double exposure method by double coating of resist | |
KR890005851A (en) | Device Separation Method of Semiconductor Device | |
KR880009432A (en) | Electrode Formation Method of Optical Device Array | |
KR860000139A (en) | Manufacturing method of shrinkable PVC recycled film | |
KR970016801A (en) | Photographing process to obtain good photoresist pattern | |
KR910014231A (en) | Automatic return method of electronic typewriter |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
SUBM | Submission of document of abandonment before or after decision of registration |