KR920700409A - 필터의 제작과 복제방법 및 필터부 감광체의 제조방법 - Google Patents
필터의 제작과 복제방법 및 필터부 감광체의 제조방법Info
- Publication number
- KR920700409A KR920700409A KR1019900702465A KR900702465A KR920700409A KR 920700409 A KR920700409 A KR 920700409A KR 1019900702465 A KR1019900702465 A KR 1019900702465A KR 900702465 A KR900702465 A KR 900702465A KR 920700409 A KR920700409 A KR 920700409A
- Authority
- KR
- South Korea
- Prior art keywords
- photosensitive material
- hologram
- layer
- filter
- light
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000010367 cloning Methods 0.000 title 1
- 230000003362 replicative effect Effects 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 14
- 239000010410 layer Substances 0.000 claims 13
- 239000012790 adhesive layer Substances 0.000 claims 3
- 238000010030 laminating Methods 0.000 claims 2
- 230000010076 replication Effects 0.000 claims 1
- 238000013518 transcription Methods 0.000 claims 1
- 230000035897 transcription Effects 0.000 claims 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/203—Filters having holographic or diffractive elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
- G03C7/04—Additive processes using colour screens; Materials therefor; Preparing or processing such materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
- G03C7/04—Additive processes using colour screens; Materials therefor; Preparing or processing such materials
- G03C7/06—Manufacture of colour screens
- G03C7/10—Manufacture of colour screens with regular areas of colour, e.g. bands, lines, dots
- G03C7/12—Manufacture of colour screens with regular areas of colour, e.g. bands, lines, dots by photo-exposure
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14708—Cover layers comprising organic material
- G03G5/14713—Macromolecular material
- G03G5/14747—Macromolecular material obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- G03G5/14773—Polycondensates comprising silicon atoms in the main chain
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/20—Copying holograms by holographic, i.e. optical means
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0402—Recording geometries or arrangements
- G03H2001/0415—Recording geometries or arrangements for recording reflection holograms
- G03H2001/0417—Recording geometries or arrangements for recording reflection holograms for recording single beam Lippmann hologram wherein the object is illuminated by reference beam passing through the recording material
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0402—Recording geometries or arrangements
- G03H2001/0439—Recording geometries or arrangements for recording Holographic Optical Element [HOE]
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2249—Holobject properties
- G03H2001/2263—Multicoloured holobject
- G03H2001/2271—RGB holobject
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
- Holo Graphy (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제3도 및 제4도는 본 발명의 칼라 필터의 제작방법을 설명하기 위한 도면,
제5도는 본 발명의 칼라 홀로그램의 복제방법을 설명하기 위한 도면이다.
Claims (11)
- 감광재료와 소정의 패턴을 구비한 마스크를 소정간격 분리해서 대향 배치하고, 감광재료 및 마스크에 각각 반대방향으로 부터 광을 조사해서 홀로그램을 제작하고, 다음으로 상기 홀로그램과 감광재료를 소정간격 분리해서 대향 배치하고, 감광재료를 통해서 홀로그램에 광을 조사하고, 반사회전광과 조사광의 간섭호를 감광재료 가운데에 기록하는 것을 특징으로 하는 칼라 필터의 제작방법.
- 감광재료와 소정의 패턴을 구비한 마스크를 소정간격 분리해서 대향 배치하고, 감광재료 및 마스크에 각각 반대방향으로 부터 R, G, B광에 의해서, 마스크 위치를 이동하여 3회 노출해서 홀로그램을 제작하고, 다음으로 상기 홀로그램과 감광재료를 소정간격 분리해서 대향 배치하고 감광재료측으로 부터 R, G, B광을 각각 조사하고, 반사회절광과 참조광의 간섭호를 감광재료 가운데에 기록하는 것을 특징으로 하는 칼라 필터의 제작방법.
- 제1항 또는 제2항에 있어서, 상기 패턴이 스트라이트 패턴으로 구성된 것을 특징으로 하는 칼라 필터의 제작방법.
- R, G, B정보가 기록된 마스터 홀로그램과 감광재료를 대향 배치하고, 감광재료측으로 부터 R, G, B의 3색 혼합광을 조사하고, 마스크 홀로그램의 R, G, B정보를 감광재료에 전사 복제하는 것을 특징으로 하는 칼라 홀로그램의 복제방법.
- 제4항에 있어서, R, G, B정보가 칼라 필터에 의해서 패턴으로 구성된 것을 특징으로 하는 칼라 홀로그램의 복제방법.
- 제4항에 있어서, 상기 R, G, B정보가 스트라이프 패턴으로 구성된 것을 특징으로 하는 홀로그램의 복제 방법.
- 제4항에 있어서, 칼라 홀로그램이 리프만 홀로그램으로 구성된 것을 특징으로 하는 홀로그램의 복제 방법.
- 제5항에 있어서, 감광재료와 마스터 홀로그램과의 간격은 스트라이프 간격의 1/2 이하로 구성된 것을 특징으로 하는 칼라 홀로그램의 복제방법.
- 투명지지체위에 투명전극층 및 광도전층을 순차적으로 적층한 제1적층체와, 캐리어 필름상에 박리층을 삽입해서 광도전층, 투명 전극층을 순차적으로 적층한 제2적층체를 제1적층체에 설치한 접착층과 제2적층체에 설치한 투명 전극을 대향시켜서 적층하고, 다음으로 캐리어 필름을 박리하는 것을 특징으로 하는 필터부 감광체의 복제방법.
- 투명지지체 상에 투명 전극층 및 광도전층을 순차적으로 적층한 감광체에 필터층을 설치하고, 캐리어 필름상에 박리층을 삽입해서 필터층, 접착제층을 순차적으로 적층한 적층체와 투명 지지체상에 투명 전극층, 광도전층을 순차적으로 적층한 감광체를 적층체에 설치한 접착체층과 감광체에 설치한 지지체를 대향시켜서 적층하고, 다음으로 캐리어 필름을 박리하는 것을 특징으로 하는 필터부 감광체의 제조방법.
- 제10항에 있어서, 상기 캐리어 필름을 박리할 때에 열전사에 의해 필터층을 감광체 지지체 상에 전사하는 것을 특징으로 하는 필터부 감광체의 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6425989A JPH0734043B2 (ja) | 1989-03-16 | 1989-03-16 | カラーフィルタの作製方法 |
JP??064260? | 1989-03-16 | ||
JP6426089A JP2807254B2 (ja) | 1989-03-16 | 1989-03-16 | カラーフィルタの作製方法 |
JP1-64259 | 1989-03-16 | ||
JP??064259? | 1989-03-16 | ||
JP1-064259 | 1989-03-16 | ||
JP??067250? | 1989-03-18 | ||
JP6725089A JPH02245763A (ja) | 1989-03-18 | 1989-03-18 | フィルタ付感光体の製造方法 |
PCT/JP1990/000339 WO1990010881A1 (fr) | 1989-03-16 | 1990-03-15 | Procede de production et de duplication de filtres, et procede de production d'organes photosensibles pourvus de ces filtres |
JPPJP90/00339 | 1990-03-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR920700409A true KR920700409A (ko) | 1992-02-19 |
KR100187797B1 KR100187797B1 (ko) | 1999-06-15 |
Family
ID=27298425
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900702465A KR100187797B1 (ko) | 1989-03-16 | 1990-11-16 | 필터의 제작과 복제방법 및 필터부감광체의 제조방법 |
Country Status (7)
Country | Link |
---|---|
US (2) | US5650247A (ko) |
EP (2) | EP0423352B1 (ko) |
KR (1) | KR100187797B1 (ko) |
CA (1) | CA2028851C (ko) |
DE (2) | DE69034082T2 (ko) |
ES (2) | ES2116981T3 (ko) |
WO (1) | WO1990010881A1 (ko) |
Cited By (1)
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KR100608883B1 (ko) * | 1999-09-21 | 2006-08-03 | 엘지.필립스 엘시디 주식회사 | 액정표시장치용 홀로그램 확산판 제조방법 및 그를 이용한 액정표시소자 |
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- 1990-03-15 DE DE69034082T patent/DE69034082T2/de not_active Expired - Fee Related
- 1990-03-15 EP EP90904686A patent/EP0423352B1/en not_active Expired - Lifetime
- 1990-03-15 ES ES90904686T patent/ES2116981T3/es not_active Expired - Lifetime
- 1990-03-15 WO PCT/JP1990/000339 patent/WO1990010881A1/ja active IP Right Grant
- 1990-03-15 ES ES97114989T patent/ES2195060T3/es not_active Expired - Lifetime
- 1990-03-15 US US07/613,684 patent/US5650247A/en not_active Expired - Lifetime
- 1990-03-15 EP EP97114989A patent/EP0816876B1/en not_active Expired - Lifetime
- 1990-03-15 DE DE69032388T patent/DE69032388T2/de not_active Expired - Fee Related
- 1990-11-16 KR KR1019900702465A patent/KR100187797B1/ko not_active IP Right Cessation
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KR100608883B1 (ko) * | 1999-09-21 | 2006-08-03 | 엘지.필립스 엘시디 주식회사 | 액정표시장치용 홀로그램 확산판 제조방법 및 그를 이용한 액정표시소자 |
Also Published As
Publication number | Publication date |
---|---|
CA2028851C (en) | 2000-02-15 |
EP0816876B1 (en) | 2003-05-28 |
EP0816876A2 (en) | 1998-01-07 |
ES2195060T3 (es) | 2003-12-01 |
DE69034082D1 (de) | 2003-07-03 |
ES2116981T3 (es) | 1998-08-01 |
CA2028851A1 (en) | 1990-09-17 |
EP0423352A1 (en) | 1991-04-24 |
US5635317A (en) | 1997-06-03 |
EP0423352A4 (en) | 1993-03-17 |
EP0423352B1 (en) | 1998-06-10 |
DE69034082T2 (de) | 2004-04-01 |
DE69032388T2 (de) | 1998-10-08 |
KR100187797B1 (ko) | 1999-06-15 |
DE69032388D1 (de) | 1998-07-16 |
WO1990010881A1 (fr) | 1990-09-20 |
EP0816876A3 (en) | 1998-10-21 |
US5650247A (en) | 1997-07-22 |
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