KR920014924A - 압축 냉각 시스템에 사용되는 불소화된 냉매용 윤활제 조성물 - Google Patents

압축 냉각 시스템에 사용되는 불소화된 냉매용 윤활제 조성물 Download PDF

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KR920014924A
KR920014924A KR1019920000635A KR920000635A KR920014924A KR 920014924 A KR920014924 A KR 920014924A KR 1019920000635 A KR1019920000635 A KR 1019920000635A KR 920000635 A KR920000635 A KR 920000635A KR 920014924 A KR920014924 A KR 920014924A
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branched
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디. 쇼트 글렌
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디. 쇼트 글렌
씨피아이 엔지니어링 써비스, 아이엔씨.,
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Abstract

내용 없음

Description

압축 냉각 시스템에 사용되는 불소화된 냉매용 윤활제 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 분지된 C-9 카복실산 점도가 증가함에 따른 여러가지 폴리올 에스테르와 HFC-134a와의 섞임성을 나타낸다. 제2도는 다양한 온도 및 오일(오일이란 윤활제 또는 합성 윤활제를 가르킨다)의 여러가지 중량 퍼센트에서의 시험 화합물 EXP-0316을 사용한 냉매 HFC-134a와의 섞임성의 범위를 나타낸다. 제3도는 에스테르 EXP-0316과 비교해 보았을때, 또 에스테르 EXP-0316과 광유를 합하여 비교해 보았을때 본 출원인의 EXP-0316가 냉매 HFC-134a와의 섞임성의 범위를 나타낸다.

Claims (48)

  1. 분지된 카복실산을 포함하는 산과 폴리하이드릭 알콜로 만들어진 에스테르로 구성되며 윤활시키기에 적당한 정도의 냉매에 대한 윤활제의 중량퍼센트와 20℉-80℉의 온도에서 염소화되지않고 불소화된 탄화수소 냉매에 섞일수 있으며 압축 냉각에 적당한 점도를 지니는 윤활제 조성물.
  2. 제1항에 있어서, 상기 에스테르가 모노, 디, 또는 트리-펜타에리트리톨, 네오펜틸 알콜, 트리메틸올 프로판 또는 트리메틸올 에탄중 최소한 하나로 만들어지고 윤활제가 3중량%일때 섞일수 있는 조성물.
  3. 제2항에 있어서, 상기 분지된 산의 탄소수가 C4-C10인 조성물.
  4. 제3항에 있어서, 상기 분지된 산이 C8-C9인 조성물.
  5. 제4항에 있어서, 필수적으로 분지된 C9산을 100% 포함하는 조성물.
  6. 제5항에 있어서, 상기한 산들이 직쇄 탄소 코아(core) 및 여기서부터 뻗어나온 최소한 두개의 가지를 포함하는 조성물.
  7. 제6항에 있어서, 상기한 산이 3,5,5-트리메틸헥산산인 조성물.
  8. 제5항에 있어서, 상기한 산이 네오산인 조성물.
  9. 제1항에 있어서, 상기한 산이 네오산인 조성물.
  10. 제1항에 있어서, 상기한 산이 3차 부틸 그룹을 포함하는 조성물.
  11. 제10항에 있어서, 상기한 산이 3,5,5-트리메틸헥산산인 조성물.
  12. 제1항에 있어서, 상기한 산이 직쇄 탄소 코아 및 여기서부터 뻗어나온 최소한 두개의 가지를 포함하는 조성물.
  13. 제2항에 있어서, 사용되는 전체 산의 25-100중량%가 분지된 카복실산인 조성물.
  14. 제13항에 있어서, 분지된 산의 퍼센트가 50-80%인 조성물.
  15. 제2항에 있어서, 상기한 산이 70-100%분지된 C9인 조성물.
  16. 제2항에 있어서, 디펜타에리트리톨 에스테르와 혼합된 트리메틸올프로판 폴리 에스테르를 더 포함하는 조성물.
  17. 제16항에 있어서, 상기 트리메틸올프로판 폴리올 에스테르를 0-95% 포함하는 조성물.
  18. 제12항에 있어서, 상기 트리메틸올프로판 폴리올 에스테르가 트리메틸올프로판과 분지된 카복실산에서부터 만들어진 조성물.
  19. 제17항에 있어서, 상기 트리메틸올프로판 폴리올 에스테르가 트리메틸올프로판과 직쇄 카복실산으로 부터 만들어진 조성물.
  20. 제19항에 있어서, 상기한 산이 C8또는 C9산으로 구성된 조성물.
  21. 제19항에 있어서, 트리메티올프로판 폴리올 에스테르가 만들어지는 상기한 산이 C5-C7산인 조성물.
  22. 제21항에 있어서, 50 : 50비율의 C5: C7선형산을 더 포함하는 조성물.
  23. 제2항에 있어서, 디펜타에리트리톨 에스테르와 혼합된 모노, 트리 또는 테트라-펜타에리트리톨 폴리올에스테르를 더 포함하는 조성물.
  24. 제23항에 있어서, 상기한 모노, 트리, 테트라-펜타에리트리톨 폴리올 에스테르가 모노, 트리 또는 테트라-펜타에리트리톨과 분지된 카복실산으로 만들어진 조성물.
  25. 제24항에 있어서, 최소한 12wt%되는 상기한 디-펜타에리트리톨 에스테르를 포함하는 조성물.
  26. 제1항에 있어서, 혼합되어 있는 광유를 더 포함하는 조성물.
  27. 제26항에 있어서, 용액내에 기껏해야 5%되는 상기 광유를 포함하는 조성물.
  28. 제1항에 있어서, 혼합되어있는 알킬 벤젠을 더 포함하는 조성물.
  29. 제28항에 있어서, 용액내에 기껏해야 5%되는 상기 광유를 포함하는 조성물.
  30. 제1항에 있어서, 상기 에스테르가 혼합물의 최소한 45중량%를 구성하는 분지된 산과 직쇄 산이 혼합된산 혼합물로부터 유도된 조성물.
  31. 제1항에 있어서, 상기 냉매가 테트라플루오로디메틸 에테르인 조성물.
  32. 제1항에 있어서, 70-90%의 C9분지된 산과 10-30%의 선형 C7, C8및 C10산을 포함하는 조성물.
  33. 제32항에 있어서, 모노펜타에리트톨3,5,5-트리메틸헥산산 70%와 선형인 C7, C8및 C10산 30%로 구성된 조성물.
  34. 제33항에 있어서, 분지된 C9산과 디펜타에리트리톨로부터 만들어진 에스테르와 혼합된 조성물.
  35. 제32항에 있어서, 바람직하게는 85-100%의 분지된 산을 포함하고 상기 알콜이 디펜타에리트리톨인 조성물.
  36. 제2항에 있어서, 상기한 조성물의 점도를 조절하기위해 상기 알콜들의 혼합물을 포함하는 조성물.
  37. 분지된 카복실산과 폴리하이드릭 알콜로 만들어진 에스테르로 구성되며 냉매에 대한 윤활제의 중량 퍼센트가 3%이고 20℉-80℉되는 온도에서 염소화되지 않고 불소화된 탄화수소 냉매에 섞일수 있으며 40℃에서 컴프레써에 적당한 점도를 지닌 조성물을 사용하는 것을 포함하는 압축 냉각 장치를 윤활시키는 방법.
  38. 냉매에 대한 윤활제의 중량 퍼세트가 3%이고 온도가 20℉-80℉일때 냉매와 섞일수 있으며 분지된 카복실산과 폴리하이드릭 알콜로 만들어진 에스테르로 구성된 윤활제 조성물을 하이드로플루오로카본 냉매와 혼합하는 것을 포함하는 압축 냉각 시스템에 사용하기위한 유체 조성물의 제조방법.
  39. 제38항에 있어서, 냉매내에서의 윤활제 조성물의 섞임성을 거의 줄이지 않으면서 윤활제 조성물의 점도를 최소한 39cSt까지 증가시키는 단계들을 더 포함하는 방법.
  40. 제38항에 있어서, 상기한 점도를 증가시키는 단계가 분지된 산과 선형산으로부터 윤활제 조성물을 만들고 분지된 카복실산 대선형 카복실산의 비율을 증가시키는 것으로서 더 정의되는 방법.
  41. 제37항에 있어서, 상기 분지된 카복실산의 범위가 C4-C9인 방법.
  42. 제40항에 있어서, 상기 분지된 카복실산의 범위가 C8과 C9산인 방법.
  43. 제40항에 있어서, 사용된 전체산의 25-100중량%가 분지된 카복실산인 방법.
  44. 제38에 있어서, 상기 카복실산이 선형 및 분지된 산으로 구성되고 분지된 산 대 선형산의 비율을 증가시켜 섞임성을 높이는 단계를 포함하는 방법.
  45. 냉매에 대한 윤활제의 중량%가 3-5%이고 30℉-60℉온도에서 냉매에 섞일수 있으며 40℃에서의 점도가 최소한 약 150cSt이며, 약 70%의 분지된 C9-카복실산 및 약 30%의 선형 C7-C10카복실산으로 구성된 산들과 디펜타에리트리톨로 부터 유도된 디펜타에리트리톨 에스테르 윤활제와 테트라플루오로에탄 냉매로 구성된 압축 냉각에 적당한 유체 조성물.
  46. 제45항에 있어서, 상기한 선형산이 약 15%의 C-7산과 약 15%의 C-8 및 C-10산으로 구성된 조성물.
  47. 냉매에 대한 윤활제의 중량%가 3-5%이고 약 0℉-190℉온도에서 냉매에 섞일수 있으며 40℃에서의 점도가 최소한 약 60cSt이며, 약 70%의 분지된 C9-카복실산 및 약 30%의 선형 C7-C10카복실산으로 구성된 산들과 모노펜타에리트리톨로 만들어진 모노펜타에리트리톨 에스테르 윤활제와 테트라플루오로에탄 냉매로 구성된 압축 냉각에 적당한 유체 조성물.
  48. 제47항에 있어서, 상기 선형산이 약 30%의 C-7, C-8 및 C-10산들로 구성된 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920000635A 1991-01-17 1992-01-17 압축 냉각용 윤활제 유체 조성물, 이의 제조방법 및 이를 이용하여 압축냉각장치를 윤활시키는 방법 KR100194542B1 (ko)

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