KR920007248A - 고체 촬상 소자 제조방법 - Google Patents

고체 촬상 소자 제조방법 Download PDF

Info

Publication number
KR920007248A
KR920007248A KR1019900014501A KR900014501A KR920007248A KR 920007248 A KR920007248 A KR 920007248A KR 1019900014501 A KR1019900014501 A KR 1019900014501A KR 900014501 A KR900014501 A KR 900014501A KR 920007248 A KR920007248 A KR 920007248A
Authority
KR
South Korea
Prior art keywords
imaging device
solid state
state imaging
device manufacturing
pad
Prior art date
Application number
KR1019900014501A
Other languages
English (en)
Other versions
KR930003788B1 (ko
Inventor
이정재
Original Assignee
문정환
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 문정환, 금성일렉트론 주식회사 filed Critical 문정환
Priority to KR1019900014501A priority Critical patent/KR930003788B1/ko
Publication of KR920007248A publication Critical patent/KR920007248A/ko
Application granted granted Critical
Publication of KR930003788B1 publication Critical patent/KR930003788B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Color Television Image Signal Generators (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

내용 없음.

Description

고체 촬상 소자 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제 1(a)도 ∼ 제1(c)도는 종래의 PAD 구조에 따른 PAD 오픈 공정도.
제 2(a)도 ∼ 제2(c)도는 본 발명의 PAD 형성에 다른 PAD 오픈 공정도.
제 3(a)도, 제3(b)도는 패드오픈 부위 평면도로서, 제3(a)도는 CCD 소자 공정시 패드오픈 부위 평면도, 제3(b)도는 컬러필터 형성후 패드오픈 부위 평면도.
* 도면의 주요부분에 대한 부호의 설명
1 : 보호막 2,2a, 2b : 패드
3 : 컬러 필터층 4 : 메탈

Claims (1)

  1. 고체 촬상 소자의 제조공정에 있어서, 컬러필터 형성전 패드의 위치와 컬러필터 형성후 패드의 위치를 다르게한 것을 특징으로 하는 고체 촬상 소자 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900014501A 1990-09-13 1990-09-13 고체 촬상 소자 제조방법 KR930003788B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019900014501A KR930003788B1 (ko) 1990-09-13 1990-09-13 고체 촬상 소자 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900014501A KR930003788B1 (ko) 1990-09-13 1990-09-13 고체 촬상 소자 제조방법

Publications (2)

Publication Number Publication Date
KR920007248A true KR920007248A (ko) 1992-04-28
KR930003788B1 KR930003788B1 (ko) 1993-05-10

Family

ID=19303581

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900014501A KR930003788B1 (ko) 1990-09-13 1990-09-13 고체 촬상 소자 제조방법

Country Status (1)

Country Link
KR (1) KR930003788B1 (ko)

Also Published As

Publication number Publication date
KR930003788B1 (ko) 1993-05-10

Similar Documents

Publication Publication Date Title
JPS53108390A (en) Semiconductor device and its manufacture
FR2702953B1 (fr) Filtre anti-thrombose recuperable.
KR910001971A (ko) 반도체 장치의 제조방법
KR940012642A (ko) 고체촬상소자
KR910009099A (ko) 컬러고체촬상장치
IT8622323A0 (it) Procedimento ed elemento per ottenere un'immagine fotografica.
ATE273556T1 (de) Thermistorchips und verfahren zu deren herstellung
KR920013740A (ko) 고체촬상장치 및 그 제조방법
KR920008947A (ko) Npn형 vccd 구조의 고체 촬상소자
KR920007248A (ko) 고체 촬상 소자 제조방법
DE3874775D1 (de) Halbleiterbildsensor.
KR920003451A (ko) 자기정렬 방식에 의한 전하 촬상소자의 제조방법
KR930017195A (ko) 고체촬상소자 및 그 제법
DE69112321D1 (de) Bildverbesserung.
KR920010938A (ko) 고체 촬상 장치
KR910003802A (ko) 반도체장치 및 그 제조방법
KR910015076A (ko) Ccd 영상센서에서 포토 다이오드의 ofd 억제를 위한 방법
KR890005898A (ko) 고체촬상소자의 제조방법
KR890013931A (ko) 이미지 센서의 스미어 노이즈 억제장치 및 그의 제조방법
KR920001740A (ko) Ccd 영상센서의 차광막 구조
KR930015102A (ko) Ccd 영상소자의 칼라 필터 제조방법
KR970011909A (ko) 고체촬상소자의 칼라필터 제조방법
KR940015695A (ko) 반도체 소자의 패턴형성방법
KR970077713A (ko) 칼라 고체 촬상 소자의 구조 및 제조 방법
JPS6251763U (ko)

Legal Events

Date Code Title Description
A201 Request for examination
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20030417

Year of fee payment: 11

LAPS Lapse due to unpaid annual fee