KR920005131B1 - 녹색발광다이오드의 제조방법 - Google Patents
녹색발광다이오드의 제조방법 Download PDFInfo
- Publication number
- KR920005131B1 KR920005131B1 KR1019890009713A KR890009713A KR920005131B1 KR 920005131 B1 KR920005131 B1 KR 920005131B1 KR 1019890009713 A KR1019890009713 A KR 1019890009713A KR 890009713 A KR890009713 A KR 890009713A KR 920005131 B1 KR920005131 B1 KR 920005131B1
- Authority
- KR
- South Korea
- Prior art keywords
- single crystal
- crystal substrate
- gap single
- epd
- growth layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/817—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
- H10H20/821—Bodies characterised by their shape, e.g. curved or truncated substrates of the light-emitting regions, e.g. non-planar junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/066—Gp III-V liquid phase epitaxy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/973—Substrate orientation
Landscapes
- Led Devices (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP88-170253 | 1988-07-08 | ||
| JP63-170253 | 1988-07-08 | ||
| JP63170253A JPH0220077A (ja) | 1988-07-08 | 1988-07-08 | 緑色発光ダイオードの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR900002474A KR900002474A (ko) | 1990-02-28 |
| KR920005131B1 true KR920005131B1 (ko) | 1992-06-26 |
Family
ID=15901513
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019890009713A Expired KR920005131B1 (ko) | 1988-07-08 | 1989-07-07 | 녹색발광다이오드의 제조방법 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5032539A (enExample) |
| EP (1) | EP0350058B1 (enExample) |
| JP (1) | JPH0220077A (enExample) |
| KR (1) | KR920005131B1 (enExample) |
| DE (1) | DE68919551T2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3624451B2 (ja) * | 1995-03-17 | 2005-03-02 | 昭和電工株式会社 | 発光素子用GaPエピタキシャル基板 |
| JP3752451B2 (ja) | 2001-12-17 | 2006-03-08 | 株式会社日立製作所 | 沸騰水型原子炉用制御棒の製造方法 |
| US8436362B2 (en) | 2009-08-24 | 2013-05-07 | Micron Technology, Inc. | Solid state lighting devices with selected thermal expansion and/or surface characteristics, and associated methods |
| US9945048B2 (en) * | 2012-06-15 | 2018-04-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor structure and method |
| DK201400055U3 (da) * | 2014-03-28 | 2015-07-10 | Plantui Oy | Anordning til hydroponisk dyrkning |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3868281A (en) * | 1968-07-05 | 1975-02-25 | Ibm | Luminescent device and method therefor |
| JPS5331617B2 (enExample) * | 1972-08-21 | 1978-09-04 | ||
| US4001056A (en) * | 1972-12-08 | 1977-01-04 | Monsanto Company | Epitaxial deposition of iii-v compounds containing isoelectronic impurities |
| US3844904A (en) * | 1973-03-19 | 1974-10-29 | Bell Telephone Labor Inc | Anodic oxidation of gallium phosphide |
| US3969164A (en) * | 1974-09-16 | 1976-07-13 | Bell Telephone Laboratories, Incorporated | Native oxide technique for preparing clean substrate surfaces |
| US4008106A (en) * | 1975-11-13 | 1977-02-15 | The United States Of America As Represented By The Secretary Of The Army | Method of fabricating III-V photocathodes |
| US4032370A (en) * | 1976-02-11 | 1977-06-28 | International Audio Visual, Inc. | Method of forming an epitaxial layer on a crystalline substrate |
| JPS5839374B2 (ja) * | 1978-12-26 | 1983-08-30 | 松下電器産業株式会社 | 半導体基板の処理方法 |
| JPS5626480A (en) * | 1979-08-10 | 1981-03-14 | Oki Electric Ind Co Ltd | Semiconductor light emitting device and manufacturing process thereof |
| US4498225A (en) * | 1981-05-06 | 1985-02-12 | The United States Of America As Represented By The Secretary Of The Army | Method of forming variable sensitivity transmission mode negative electron affinity photocathode |
| JPS5916391A (ja) * | 1982-07-19 | 1984-01-27 | Matsushita Electric Ind Co Ltd | 負性抵抗緑色発光素子の製造方法 |
| JPS5922374A (ja) * | 1982-07-28 | 1984-02-04 | Matsushita Electric Ind Co Ltd | 緑色発光ダイオ−ドの製造方法 |
| JPS5922376A (ja) * | 1982-07-28 | 1984-02-04 | Matsushita Electric Ind Co Ltd | 純緑色発光ダイオ−ドおよびその製造方法 |
| JPS5923579A (ja) * | 1982-07-29 | 1984-02-07 | Matsushita Electric Ind Co Ltd | 緑色系発光ダイオ−ドおよびその製造方法 |
| JPS59214276A (ja) * | 1983-05-20 | 1984-12-04 | Showa Denko Kk | リン化ガリウム緑色発光素子の製造方法 |
| JPS63151086A (ja) * | 1986-12-16 | 1988-06-23 | Sanken Electric Co Ltd | ガリウム燐緑色発光ダイオ−ドの製造方法 |
-
1988
- 1988-07-08 JP JP63170253A patent/JPH0220077A/ja active Granted
-
1989
- 1989-07-06 US US07/375,961 patent/US5032539A/en not_active Expired - Lifetime
- 1989-07-07 EP EP89112469A patent/EP0350058B1/en not_active Expired - Lifetime
- 1989-07-07 KR KR1019890009713A patent/KR920005131B1/ko not_active Expired
- 1989-07-07 DE DE68919551T patent/DE68919551T2/de not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE68919551T2 (de) | 1995-05-04 |
| JPH0220077A (ja) | 1990-01-23 |
| US5032539A (en) | 1991-07-16 |
| KR900002474A (ko) | 1990-02-28 |
| EP0350058A3 (en) | 1990-05-30 |
| EP0350058B1 (en) | 1994-11-30 |
| JPH0531316B2 (enExample) | 1993-05-12 |
| EP0350058A2 (en) | 1990-01-10 |
| DE68919551D1 (de) | 1995-01-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Craford et al. | Vapor phase epitaxial materials for LED applications | |
| Matsunami et al. | SiC blue LED's by liquid-phase epitaxy | |
| US4575742A (en) | Epitaxial wafer for use in the production of an infrared LED | |
| US4216484A (en) | Method of manufacturing electroluminescent compound semiconductor wafer | |
| KR920005131B1 (ko) | 녹색발광다이오드의 제조방법 | |
| JPWO2001033642A1 (ja) | 燐化ガリウム発光素子及びその製造方法 | |
| US3951700A (en) | Method of manufacturing a gallium phosphide light-emitting device | |
| EP0631330B1 (en) | A GaP pure green light emitting element substrate | |
| US3934260A (en) | Red light-emitting gallium phosphide device | |
| RU60269U1 (ru) | Светодиодная гетероструктура на подложке из монокристаллического сапфира | |
| JP3633806B2 (ja) | エピタキシャルウエハ及び、これを用いて製造される発光ダイオード | |
| JP4024965B2 (ja) | エピタキシャルウエハおよび発光ダイオード | |
| JP2000312032A (ja) | 化合物半導体エピタキシャルウエハとその製造方法及び、これを用いて製造される発光ダイオード | |
| JPS63213378A (ja) | 半導体発光素子の製造方法 | |
| JP3353703B2 (ja) | エピタキシャルウエーハ及び発光ダイオード | |
| JPH1065211A (ja) | 発光ダイオード | |
| JP2646927B2 (ja) | 半導体光素子並びに発光ダイオードの製造方法 | |
| JP3326261B2 (ja) | 燐化ガリウム緑色発光ダイオードおよびその製造方法 | |
| JPH0330311B2 (enExample) | ||
| JP2001036133A (ja) | エピタキシャルウエハおよび発光ダイオード | |
| JPS6158991B2 (enExample) | ||
| JPH09167855A (ja) | 半導体光素子及び発光ダイオード | |
| JPS6175573A (ja) | 発光ダイオ−ドの製造方法 | |
| JP2001031500A (ja) | エピタキシャルウエハの製造方法および発光ダイオード | |
| JPH11121794A (ja) | りん化ひ化ガリウムエピタキシャルウエハ及び発光ダイオード |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| G160 | Decision to publish patent application | ||
| PG1605 | Publication of application before grant of patent |
St.27 status event code: A-2-2-Q10-Q13-nap-PG1605 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U11-oth-PR1002 Fee payment year number: 1 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 7 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 8 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 9 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 10 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 11 |
|
| FPAY | Annual fee payment |
Payment date: 20030530 Year of fee payment: 12 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 12 |
|
| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20040627 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20040627 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |