KR920000394A - 극저온 에어로졸을 사용한 표면세척 방법 - Google Patents

극저온 에어로졸을 사용한 표면세척 방법 Download PDF

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Publication number
KR920000394A
KR920000394A KR1019910009142A KR910009142A KR920000394A KR 920000394 A KR920000394 A KR 920000394A KR 1019910009142 A KR1019910009142 A KR 1019910009142A KR 910009142 A KR910009142 A KR 910009142A KR 920000394 A KR920000394 A KR 920000394A
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South Korea
Prior art keywords
argon
stream
particles
aerosol
gas
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KR1019910009142A
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KR940001024B1 (ko
Inventor
토마스 맥덜모트 웨인
카알 옥코빅 리처드
장 우 진
윈슬로우 쿠퍼 더글라스
슈왈츠 알렉산더
레위스 우프 헨리
Original Assignee
윌리암 에프. 마쉬
에어 프로덕츠 앤드 케미칼스, 인코오포레이티드
하워드 지. 피거로아
인터내셔날 비지니스 머신즈 코오포레이숀
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Application filed by 윌리암 에프. 마쉬, 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드, 하워드 지. 피거로아, 인터내셔날 비지니스 머신즈 코오포레이숀 filed Critical 윌리암 에프. 마쉬
Publication of KR920000394A publication Critical patent/KR920000394A/ko
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Publication of KR940001024B1 publication Critical patent/KR940001024B1/ko

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/08—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for polishing surfaces, e.g. smoothing a surface by making use of liquid-borne abrasives
    • B24C1/086—Descaling; Removing coating films
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0092—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/003—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods using material which dissolves or changes phase after the treatment, e.g. ice, CO2
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00—Abrasive blasting machines or devices; Plants
    • B24C3/32—Abrasive blasting machines or devices; Plants designed for abrasive blasting of particular work, e.g. the internal surfaces of cylinder blocks
    • B24C3/322—Abrasive blasting machines or devices; Plants designed for abrasive blasting of particular work, e.g. the internal surfaces of cylinder blocks for electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)

Abstract

내용 없음

Description

극저온 에어로졸을 사용한 표면세척 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
이 도면은 본 발명의 바람직한 실시태양을 보여주는 개략도이다.

Claims (17)

  1. 적어도 거의가 고체 아르곤 입자들인 에어로졸의 임핀징 스트림을 사용하여 입자 및/또는 필름을 포함한 표면으로 부터 오염물 입자 및/또는 필름을 제거하는 방법으로서, 팽창전의 스트림 압력하에서 아르곤의 액화점 이상의 오도로, 가압된 기체 아르곤 입자인 에어로졸을 형성하기 위해 상기 팽창에 의해 수득한 것을 냉각시킴으로써 상기 스트림중 적어도 거의 대부분이 고체인 아르곤 입자를 형성시키는 단계 및 상기 오염물 입자 및/또는 필름을 제거하기 위해 표면에 상기 에어로졸을 분사시키는 단계를 포함하는 방법.
  2. 제1항에 있어서, 상기 아르곤을 포함한 스트림이 질소 담체가스중 적어도 대부분이 고체 아르곤 입자인 에어로졸을 형성하기 위해 팽창후 기체상태로 남아 있는 질소 담체 가스를 포함하는 것인 방법.
  3. 제2항에 있어서, 아르곤/질소의 비는 아르곤이 약 10%내지 100부피%이고 나머지는 질소인 방법.
  4. 제1항에 있어서, 상기 아르곤을 포함한 스트림의 팽창이 진공 상태로 유지되는 존 내에서 수행되는 방법
  5. 제1항에 있어서, 상기 아르곤을 포함한 스트림을 상기 팽창단계전에, 스트림중의 응축 가능한 불순물을 응축시키기 위해 아르곤의 액화점 이상의 온도로 냉각시켜서 상기 불순물을 스트림으로부터 분리해내는 방법.
  6. 제5항에 있어서, 상기 불순물이 물, CO2및 탄화수소인 방법.
  7. 제5항에 있어서, 상기 가압된 기체 아르곤을 함유한 스트림의 압력이 약 20psig 내지 690psig인 방법.
  8. 제7항에 있어서, 상기 예비-냉각을 약 190°F 내지 -300°F의 온도에서 수행하는 방법.
  9. 제5항에 있어서, 상기 가압된 기체 아르곤을 함유한 스트림의 압력이 약 20psig 내지 100psig인 방법.
  10. 제9항에 있어서, 상기 예비-냉각을 약 250°F내지-300°F의 온도에서 수행하는 방법.
  11. 제1항에 있어서, 상기 임핀징 에어로졸을 상기 표면과 에어로졸 방향이 예각을 이루도록 상기 표면에 분사시키는 방법.
  12. 제11항에 있어서, 상기 예각이 약 45°인 방법.
  13. 제1항에 있어서, 오염물 입자/또는 필름을 제거한 후, 상기 표면을 가압하에서 아르곤의 액화온도 이상으로 가온시키는 방법.
  14. 제1항에 있어서, 오염물 입자 및/또는 필름을 제거한 후, 상기 표면을 가압하에서 물의 액화 온도 이상으로 가온시키는 방법.
  15. 제1항에 있어서, 상기 표면이 가스 분해 시스템 부품, 마이크로 전자 공학 기긱 및 실리콘 웨이퍼로 구성된 군에서 선택되는 방법.
  16. 제1항에 있어서, 10,000 Å이하의 입자들이 상기 표면으로 부터 제거되는 방법.
  17. 질소 담체가스중 고체 아르곤 입자의 임핀징 에에로졸 스트림을 사용하여 입자 및/또는 필름을 표면으로부터 오염물 입자 및 필름을 제거하는 방법으로서, 응축 가능한 불순물을 응축하기에 충분한 온도로 아르곤 및 질소의 기체 혼합물을 냉각시키는 단계, 그 기체 혼합물로 부터 응축 가능한 불순물을 분리시키는 단계, 약 20 내지 100psig인 압력 및 아르곤의 액화점 이상의 온도인 기체 혼합물을 진공 상태내로 급속히 팽창시키는 단계, 상기 에어로졸 스트림을 제조하기 위해 팽창에 의해 수득한 것을 냉각 시킴으로써 상기 기체 혼합물중의 고체 아르곤 입자를 형성시키는 단계 및 오염물 입자 및/또는 필름을 제거하기 위해 표면에 상기 에어로졸 스트림을 분사시키는 단계를 포함하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910009142A 1990-06-05 1991-06-03 오염 입자의 제거방법 KR940001024B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/534,810 US5062898A (en) 1990-06-05 1990-06-05 Surface cleaning using a cryogenic aerosol
US07/534810 1990-06-05

Publications (2)

Publication Number Publication Date
KR920000394A true KR920000394A (ko) 1992-01-29
KR940001024B1 KR940001024B1 (ko) 1994-02-08

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US (1) US5062898A (ko)
EP (1) EP0461476B1 (ko)
JP (1) JPH081900B2 (ko)
KR (1) KR940001024B1 (ko)
CA (1) CA2043445C (ko)
DE (1) DE69112913T2 (ko)
IE (1) IE70238B1 (ko)

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