KR910009649A - 테트라히드로나프탈렌 유도체 및 이의 제조방법 - Google Patents

테트라히드로나프탈렌 유도체 및 이의 제조방법 Download PDF

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KR910009649A
KR910009649A KR1019900018603A KR900018603A KR910009649A KR 910009649 A KR910009649 A KR 910009649A KR 1019900018603 A KR1019900018603 A KR 1019900018603A KR 900018603 A KR900018603 A KR 900018603A KR 910009649 A KR910009649 A KR 910009649A
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히데오 나까이
도요하루 야마시따
하루미찌 고오노
야스히꼬 사사끼
아끼오 오다와라
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지바따 이찌로
다나베세이야꾸 가부시끼가이샤
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    • C07C311/22Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound oxygen atoms
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    • C07C311/15Sulfonamides having sulfur atoms of sulfonamide groups bound to carbon atoms of six-membered aromatic rings
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    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
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    • C07D333/26Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
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    • C07C2602/04One of the condensed rings being a six-membered aromatic ring
    • C07C2602/10One of the condensed rings being a six-membered aromatic ring the other ring being six-membered, e.g. tetraline

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Abstract

내용 없음

Description

테트라히드로나프탈렌 유도체 및 이의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (15)

  1. 일반식 (I)의 테트라히드로나프탈렌 유도체 또는 그의 약제학적 허용염
    상기식에서, R1은 치환되었거나 치환되지 않은 페닐기, 나프탈기, 황-또는 질소-함유 헤테로고리기, 저급 알칼기 또는 시클로알킬기이고 R2는 히드록시메틸기, 카르복실기, 저급알콕시카르보닐기 또는 일반식(식에서, R3는 수소 원자 또는 저급 알킬기이고 R4는 저급 알콕시카르보닐-페닐기, 카르복시-페닐기, 저급알킬기, 저급알콕시카르보닐-저급 알킬기 또는 카르복시-저급알킬기이다)이며 m과 n은 서로 다르며 1 또는 2이다.
  2. 제1항에 있어서, R1이 페닐기, 저급알킬페닐기, 저급알콕시페닐기, 할로게노페닐기, 나프탈기, 황-또는 질소-함유 5-또는 6-원 헤테로모노고리기, 저급알킬기 또는 탄소수 3 내지 6의 시클로알킬기인 화합물.
  3. 제2항에 있어서, R2가 히드록시메틸기, 카르복실기 또는 일반식(식에서, R3은 수소 원자이고, R4는 카르복시-저급알킬기이다)인 화합물.
  4. 제1항에 있어서, m이 1이고 n이 2인 화합물.
  5. 제3항에 있어서, m이 1이고 n이 2인 화합물.
  6. 제5항에 있어서, R1의 황-또는 질소-함유 5- 또는 6-원 헤테로모노고리기가 티에닐기 또는 피리딜기인 화합물.
  7. 제5항에 있어서, R1이 페닐기, 메틸페닐기, 메톡시페닐기, 클로로페닐기, 티에닐기, 메틸기, 또는 시클로헥실기이고 R2가 카르복실기 또는 일반식(식에서 R3는 수소원자이고 R4는 카르복시 에틸기 또는 카르복시프로필기이다)인 화합물.
  8. 제7항에 있어서, R1이 클로로페닐기이고 R2가 일반식(식에서 R3는 수소원자이고 R4는 카르복시 에틸기 또는 카르복시프로필기이다)인 화합물.
  9. 4-{[6-(4-클로로페닐)술포닐아미노-5,6,7,8-테트라히드로나프탈렌-2-일]아세틸아미노}-n-부티르산 또는 그의 약제학적 허용염.
  10. 일반식(Ⅱ)의 아미노테트라히드로나프탈렌 유도체 또는 그의 염을 일반식(Ⅲ)의 술폰산 화합물 또는 그의 반응성 유도체와 축합 시키고, 화합물(I)이 유리형이면, 생성물을 그의 약제학적 허용염으로 추가로 전환시킬수 있음을 특징으로 하는 일반식(I)의 테트라히드로나프탈렌 유도체 또는 그의 약제학적 혀용염의 제조방법.
    상기식에서, R1은 치환되었거나 치환되지 않은 페닐기, 나프탈기, 황-또는 질소-함유 헤테로고리기, 저급 알칼기 또는 시클로알킬기이고 R2는 히드록시메틸기, 카르복실기, 저급알콕시카르보닐기 또는 일반식(식에서, R3는 수소 원자 또는 저급 알킬기이고 R3는 저급 알콕시카르보닐-페닐기, 카르복시-페닐기, 저급알킬기, 저급알콕시카르보닐-저급 알킬기 또는 카르복시-저급알킬기이다)이며 m과 n은 서로 다르며 1 또는 2이다.
  11. 일반식(I-b)의 화합물을 환원 시킴을 특징으로 하는 일반식 (I-a)의 테트라히드로나프탈렌 유도체의 제조방법.
    상기식에서, R1은 치환되었거나 치환되지 않은 페닐기, 나프탈기, 황-또는 질소-함유 헤테로고리기, 저급 알칼기 또는 시클로알킬기이고 m과 n은 서로 다르며 1 또는 2이다.
  12. 일반식 (I-b)의 화합물 또는 그으 카르복실기에서의 반응성 유도체를 일반식(Ⅳ)의 아민 화합물 또는 그의 염과 축합시키고, 화합물(I-c)가 유리형이면, 그 생성물을 그의 약제학적 허용염으로 추가로 전환시킬수 있음을 특징으로 하는 일반식(I-c)의 테트라히드로나프탈렌 유도체 또는 그의 약제학적 허용염의 제조방법.
    상기식에서, R1은 치환되었거나 치환되지 않은 페닐기, 나프탈기, 황-또는 질소-함유 헤테로고리기, 저급 알칼기 또는 시클로알킬기이고 R3는 수소 원자 또는 저급 알킬기이며 R4는 저급 알콕시카르보닐-페닐기, 카르복시-페닐기, 저급알킬기, 저급알콕시카르보닐-저급알킬기 또는 카르복시-저급알킬기이고 m과 n은 서로 다르며 1 또는 2이다.
  13. 일반식(I-e)의 화합물은 가수분해 시키고, 화합물 (I-d)가 유리형이며, 그 생성물을 그의 약제학적 허용염으로 추가로 전환시킬 수 있음을 특징으로 하는 일반식 (I-d)의 테트라히드로나프탈렌 유도체 또는 그의 약제학적 허용염의 제조방법.
    상기식에서, R1은 치환되었거나 치환되지 않은 페닐기, 나프탈기, 황-또는 질소-함유 헤테로고리기, 저급 알칼기 또는 시클로알킬기이고 R3는 수소 원자 또는 저급 알킬기이며 R5는 카르복시-페닐기 또는 카르복시-저급알킬기이고 m과 n은 서로 다르며 1 또는 2이고 R6은 저급알콕시카르보닐-페닐기 또는 저급알콕시카르보닐-저급알킬기이다.
  14. 제1항에 있어서 청구한 화합물의 유효량 및 이에 대한 약제학적 허용 캐리어를 함유함을 특징으로 하는 약제학적 조성물.
  15. 일반식(Ⅱ)의 아미노테트라히드로나프탈렌 유도체 또는 그의 염.
    상기식에서, R2는 히드록시메틸기, 카르복실기, 저급알콕시카르보닐기 또는 일반식 (식에서, R3은 수소원자 또는 저급알킬기이고, R4는 저급알콕시카르보닐-페닐기, 카르복시-페닐기, 저급알킬기, 저급 알콕시카르보닐-저급알킬기 또는 카르복시-저급알킬기이다)이며 m과 n은 서로 다르고 1 또는 2이다.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900018603A 1989-11-16 1990-11-16 테트라히드로나프탈렌 유도체 및 이의 제조방법 KR910009649A (ko)

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US5206428A (en) * 1989-11-16 1993-04-27 Tanabe Seiyaku Co., Ltd. Tetrahydronaphthalene derivatives and preparation thereof
EP0499755A1 (fr) * 1991-02-18 1992-08-26 MIDY S.p.A. Nouvelles phényléthanolaminotétralines, procédé pour leur préparation, intermédiaires dans ce procédé et compositions pharmaceutiques les contenant
US6448269B1 (en) 1993-07-22 2002-09-10 Eli Lilly And Company Glycoprotein IIb/IIIa antagonists
IL110172A (en) * 1993-07-22 2001-10-31 Lilly Co Eli Bicycle compounds and pharmaceuticals containing them
US6137002A (en) * 1993-07-22 2000-10-24 Eli Lilly And Company Glycoprotein IIb/IIIa antagonists
US5731324A (en) * 1993-07-22 1998-03-24 Eli Lilly And Company Glycoprotein IIb/IIIa antagonists
FR2711139B1 (fr) * 1993-10-15 1995-12-01 Adir Nouveaux dérivés de 1,2,3,4-tétrahydronaphtalène, leur procédé de préparation et les compositions pharmaceutiques qui les contiennent.
US6653331B2 (en) * 1996-07-03 2003-11-25 Pharmacia & Upjohn Company Targeted drug delivery using sulfonamide derivatives
JP2007508303A (ja) 2003-10-01 2007-04-05 ザ プロクター アンド ギャンブル カンパニー メラニン凝集ホルモン拮抗物質

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DE3623941A1 (de) * 1986-07-16 1988-01-28 Bayer Ag Substituierte amino-5,6,7,8-tetrahydronaphthyl-oxyessigsaeuren, verfahren zu deren herstellung sowie die verwendung als arzneimittel
DE3623944A1 (de) * 1986-07-16 1988-02-11 Thomae Gmbh Dr K Neue benzolsulfonamido-indanylverbindungen, diese verbindungen enthaltende arzneimittel und verfahren zu ihrer herstellung
DE3642105A1 (de) * 1986-12-10 1988-06-16 Bayer Ag Substituierte aminomethyl-5,6,7,8-tetrahydronaphtyl-oxyessigsaeuren, neue zwischenprodukte, verfahren zu ihrer herstellung sowie ihre verwendung in arzneimitteln
IL88314A (en) * 1987-11-18 1994-05-30 Tanabe Seiyaku Co History of sulfonylamino indane, their preparation and pharmaceutical preparations containing them
JPH02231464A (ja) * 1988-02-26 1990-09-13 Tanabe Seiyaku Co Ltd インダンオキシ酢酸誘導体
US5206428A (en) * 1989-11-16 1993-04-27 Tanabe Seiyaku Co., Ltd. Tetrahydronaphthalene derivatives and preparation thereof

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DE69010158D1 (de) 1994-07-28
IE64515B1 (en) 1995-08-09
EP0430459A1 (en) 1991-06-05
CA2030004A1 (en) 1991-05-17
US5206428A (en) 1993-04-27
HUT56340A (en) 1991-08-28
IL96198A0 (en) 1991-07-18
JPH03218346A (ja) 1991-09-25
AU6572790A (en) 1991-06-20
AU631023B2 (en) 1992-11-12
FI905655A0 (fi) 1990-11-15
ATE107629T1 (de) 1994-07-15
CN1023938C (zh) 1994-03-09
CN1052112A (zh) 1991-06-12
JPH0649677B2 (ja) 1994-06-29
IE904133A1 (en) 1991-05-22
DK0430459T3 (da) 1994-07-25
ES2058817T3 (es) 1994-11-01
HU907177D0 (en) 1991-05-28
FI95368B (fi) 1995-10-13
EP0430459B1 (en) 1994-06-22
FI95368C (fi) 1996-01-25
FI905655A (fi) 1991-05-17
DE69010158T2 (de) 1994-10-06

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