KR900702562A - 패턴의 수정방법 - Google Patents
패턴의 수정방법Info
- Publication number
- KR900702562A KR900702562A KR1019900700538A KR900700538A KR900702562A KR 900702562 A KR900702562 A KR 900702562A KR 1019900700538 A KR1019900700538 A KR 1019900700538A KR 900700538 A KR900700538 A KR 900700538A KR 900702562 A KR900702562 A KR 900702562A
- Authority
- KR
- South Korea
- Prior art keywords
- modify
- pattern
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optical Filters (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63-282083 | 1988-11-08 | ||
| JP28208388 | 1988-11-08 | ||
| PCT/JP1989/001041 WO1990005326A1 (en) | 1988-11-08 | 1989-10-11 | Pattern correction method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR900702562A true KR900702562A (ko) | 1990-12-07 |
| KR0149497B1 KR0149497B1 (ko) | 1998-12-01 |
Family
ID=17647904
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019900700538A KR0149497B1 (ko) | 1988-11-08 | 1989-10-11 | 패턴의 수정방법 |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP0396768B1 (ko) |
| JP (1) | JP2794199B2 (ko) |
| KR (1) | KR0149497B1 (ko) |
| AU (1) | AU612286B2 (ko) |
| CA (1) | CA2001910A1 (ko) |
| DE (1) | DE68928200T2 (ko) |
| WO (1) | WO1990005326A1 (ko) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08114711A (ja) * | 1994-10-13 | 1996-05-07 | Shinto Paint Co Ltd | 平坦性が損なわれたカラーフィルターの修正方法、修正されたカラーフィルターおよびそのカラーフィルターを有する多色表示装置 |
| JP4930740B2 (ja) * | 2001-02-26 | 2012-05-16 | 大日本印刷株式会社 | カラーフィルタの欠陥修正方法 |
| JP4118082B2 (ja) * | 2002-05-08 | 2008-07-16 | 株式会社きもと | フォトマスク用保護膜修正方法 |
| JP2006258873A (ja) * | 2005-03-15 | 2006-09-28 | Toppan Printing Co Ltd | カラーフィルターの修正方法およびカラーフィルター |
| JP4617236B2 (ja) * | 2005-10-03 | 2011-01-19 | シャープ株式会社 | カラーフィルターの修正方法 |
| KR101536767B1 (ko) * | 2014-05-29 | 2015-07-15 | 주식회사 루미스탈 | 반도체 기판의 표면 상에 존재하는 결함의 선택적 커버링 방법 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4200668A (en) * | 1978-09-05 | 1980-04-29 | Western Electric Company, Inc. | Method of repairing a defective photomask |
| JPS61122605A (ja) * | 1984-11-20 | 1986-06-10 | Canon Inc | カラ−フイルタ−の修復方法 |
| JPS63313158A (ja) * | 1987-06-16 | 1988-12-21 | Nec Corp | レチクルの修正方法 |
-
1989
- 1989-07-11 JP JP17849189A patent/JP2794199B2/ja not_active Expired - Fee Related
- 1989-10-11 WO PCT/JP1989/001041 patent/WO1990005326A1/ja active IP Right Grant
- 1989-10-11 KR KR1019900700538A patent/KR0149497B1/ko not_active IP Right Cessation
- 1989-10-11 EP EP89911406A patent/EP0396768B1/en not_active Expired - Lifetime
- 1989-10-11 AU AU43491/89A patent/AU612286B2/en not_active Ceased
- 1989-10-11 DE DE68928200T patent/DE68928200T2/de not_active Expired - Fee Related
- 1989-10-31 CA CA002001910A patent/CA2001910A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| CA2001910A1 (en) | 1990-05-08 |
| EP0396768B1 (en) | 1997-07-23 |
| EP0396768A4 (en) | 1991-07-17 |
| JPH02262603A (ja) | 1990-10-25 |
| DE68928200D1 (de) | 1997-09-04 |
| WO1990005326A1 (en) | 1990-05-17 |
| AU4349189A (en) | 1990-05-28 |
| EP0396768A1 (en) | 1990-11-14 |
| AU612286B2 (en) | 1991-07-04 |
| JP2794199B2 (ja) | 1998-09-03 |
| KR0149497B1 (ko) | 1998-12-01 |
| DE68928200T2 (de) | 1997-11-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E701 | Decision to grant or registration of patent right | ||
| GRNT | Written decision to grant | ||
| FPAY | Annual fee payment |
Payment date: 20030522 Year of fee payment: 6 |
|
| LAPS | Lapse due to unpaid annual fee |